Abstract: There is described a method of verifying a time-of-flight based ranging result in a UWB ranging device, the method comprising: exchanging a sequence of messages between the UWB ranging device and a further UWB ranging device as part of a double-sided ranging process to obtain round times and response times at both the UWB ranging device and the further UWB ranging device; estimating a time-of-flight value based on the round times and response times; and verifying the ranging result by performing a consistency check based on the estimated time-of-flight value and one or more predetermined parameter values. Furthermore, a UWB ranging device and a UWB ranging system are described.

Abstract: A method of determining a distance between a first device and a second device. The method comprises: performing an initial-ranging-operation, by exchanging two multi-frame ranging cycles between the first device and the second device, to calculate a clock ratio and a multi-frame-cycle-ToF. The method further comprises performing a plurality of single-message ranging cycles, wherein each single-message ranging cycle comprises: at a predetermined first-device-cycle-time after an earlier message is sent from the first device to the second device, the first device sending a single-ranging-message to the second device; determining a second-device-cycle-time as the time between the second device receiving the single-ranging-message and the earlier message being received by the second device; determining a current-message-ToF based on: the previous-message-ToF, the first-device-cycle-time, the clock ratio, and the second-device-cycle-time.

Abstract: There is described a method of verifying a time-of-flight based ranging result in a UWB ranging device, the method comprising: exchanging a sequence of messages between the UWB ranging device and a further UWB ranging device as part of a double-sided ranging process to obtain round times and response times at both the UWB ranging device and the further UWB ranging device; estimating a time-of-flight value based on the round times and response times; and verifying the ranging result by performing a consistency check based on the estimated time-of-flight value and one or more predetermined parameter values. Furthermore, a UWB ranging device and a UWB ranging system are described.

Abstract: A method of determining a distance between a first device and a second device. The method comprises: performing an initial-ranging-operation, by exchanging two multi-frame ranging cycles between the first device and the second device, to calculate a clock ratio and a multi-frame-cycle-ToF. The method further comprises performing a plurality of single-message ranging cycles, wherein each single-message ranging cycle comprises: at a predetermined first-device-cycle-time after an earlier message is sent from the first device to the second device, the first device sending a single-ranging-message to the second device; determining a second-device-cycle-time as the time between the second device receiving the single-ranging-message and the earlier message being received by the second device; determining a current-message-ToF based on: the previous-message-ToF, the first-device-cycle-time, the clock ratio, and the second-device-cycle-time.

Abstract: A method for optimizing power of a ranging sequence includes counting at least one cycle of a first clock during a Crystal Oscillator (XO)-mode to generate a first cycle count. A second clock is activated at an end of the XO-mode. The first cycle count is converted into a fractional correction value by multiplying the first cycle count by a ratio of a second period of the second clock divided by a first period of the first clock. A first alignment of the first clock to the second clock is determined at a beginning of the XO-mode. A second alignment of the first clock to the second clock is determined at the end of the XO-mode. An adjusted cycle count is determined by summating the fractional correction value with a summation of the first alignment and the second alignment divided by the first period.

Abstract: A modeling technique is provided. The modeling technique includes inputting tool parameters into a model and inputting basic model parameters into the model. The technique further includes generating a simulated, corrected reticle design using the tool parameters and the basic model parameters. An image of test patterns is compared against the simulated, corrected reticle design. A determination is made as to whether ?1<?1, wherein ?1 represents model vs. exposure difference and ?1 represents predetermined criteria. The technique further includes completing the model when ?1<?1.

Abstract: A modeling technique is provided. The modeling technique includes inputting tool parameters into a model and inputting basic model parameters into the model. The technique further includes generating a simulated, corrected reticle design using the tool parameters and the basic model parameters. An image of test patterns is compared against the simulated, corrected reticle design. A determination is made as to whether ?1<?1, wherein ?1 represents model vs. exposure difference and ?1 represents predetermined criteria. The technique further includes completing the model when ?1<?1.

Abstract: A modeling technique is provided. The modeling technique includes inputting tool parameters into a model and inputting basic model parameters into the model. The technique further includes generating a simulated, corrected reticle design using the tool parameters and the basic model parameters. An image of test patterns is compared against the simulated, corrected reticle design. A determination is made as to whether ?1<?1, wherein ?1 represents model vs. exposure difference and ?1 represents predetermined criteria. The technique further includes completing the model when ?1<?1.

Abstract: A modeling technique is provided. The modeling technique includes inputting tool parameters into a model and inputting basic model parameters into the model. The technique further includes generating a simulated, corrected reticle design using the tool parameters and the basic model parameters. An image of test patterns is compared against the simulated, corrected reticle design. A determination is made as to whether ?1<?1, wherein ?1 represents model vs. exposure difference and ?1 represents predetermined criteria. The technique further includes completing the model when ?1<?1.

Abstract: A modeling technique is provided. The modeling technique includes inputting tool parameters into a model and inputting basic model parameters into the model. The technique further includes generating a simulated, corrected reticle design using the tool parameters and the basic model parameters. An image of test patterns is compared against the simulated, corrected reticle design. A determination is made as to whether ?1<?1, wherein ?1 represents model vs. exposure difference and ?1 represents predetermined criteria. The technique further includes completing the model when ?1<?1.

Abstract: A modeling technique is provided. The modeling technique includes inputting tool parameters into a model and inputting basic model parameters into the model. The technique further includes generating a simulated, corrected reticle design using the tool parameters and the basic model parameters. An image of test patterns is compared against the simulated, corrected reticle design. A determination is made as to whether ?1<?1, wherein ?1 represents model vs. exposure difference and ?1 represents predetermined criteria. The technique further includes completing the model when ?1<?1.

Abstract: A modeling technique is provided. The modeling technique includes inputting tool parameters into a model and inputting basic model parameters into the model. The technique further includes generating a simulated, corrected reticle design using the tool parameters and the basic model parameters. An image of test patterns for an integrated circuit is compared against the simulated, corrected reticle design. A determination is made as to whether a difference between the simulated, corrected reticle design and exposure results of the image of the test patterns (?1) is less than a predetermined criteria (?1). The technique further includes completing the model the difference between the simulated, corrected reticle design and the exposure results of the image of the test patterns is less than the predetermined criteria.

Abstract: A modeling technique is provided. The modeling technique includes inputting tool parameters into a model and inputting basic model parameters into the model. The technique further includes generating a simulated, corrected reticle design using the tool parameters and the basic model parameters. An image of test patterns is compared against the simulated, corrected reticle design. A determination is made as to whether ?1<?-1, wherein ?1 represents model vs. exposure difference and ?-1 represents predetermined criteria. The technique further includes completing the model when ?1<?-1.