Patents by Inventor Jack Chao-Hsu CHANG

Jack Chao-Hsu CHANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Feature etching using varying supply of power pulses
    Patent number: 9401263
    Abstract: Etching a feature of a structure by an etch system is facilitated by varying supply of radio frequency (RF) power pulses to the etch system. The varying provides at least one RF power pulse, of the supplied RF power pulses, that deviates from one or more other RF power pulses, of the supplied RF power pulses, by at least one characteristic.
    Type: Grant
    Filed: September 19, 2013
    Date of Patent: July 26, 2016
    Assignee: GLOBALFOUNDRIES Inc.
    Inventors: Xiang Hu, Gabriel Padron Wells, Jack Chao-Hsu Chang, Mingmei Wang, Taejoon Han
  • FEATURE ETCHING USING VARYING SUPPLY OF POWER PULSES
    Publication number: 20150076111
    Abstract: Etching a feature of a structure by an etch system is facilitated by varying supply of radio frequency (RF) power pulses to the etch system. The varying provides at least one RF power pulse, of the supplied RF power pulses, that deviates from one or more other RF power pulses, of the supplied RF power pulses, by at least one characteristic.
    Type: Application
    Filed: September 19, 2013
    Publication date: March 19, 2015
    Applicant: GLOBALFOUNDRIES Inc.
    Inventors: Xiang HU, Gabriel PADRON WELLS, Jack Chao-Hsu CHANG, Mingmei WANG, Taejoon HAN