Abstract: With the above in mind, embodiments of the present invention are related to a method including the steps of: providing a graphical user interface to a medical provider, wherein the graphical user interface displays a first dashboard or a second dashboard based on a criteria, wherein the graphical user interface automatically displays the first dashboard having a patient rounding list when a device is located within a hospital geofence and automatically displays the second dashboard having remote monitoring data when the device is located outside the hospital geofence; sending a secure clinical message to the medical provider when a trigger is met; forming a care team by automatically and dynamically selecting a plurality of care team members from a user database based on a location of each user, shift data of each user, and role data of each user; sending a discharge notification to the provider; and remotely monitoring the patient after discharge via at least one remote monitoring device and patient feedback

Abstract: A virtual care system can include a location module configured to receive location information associated with a device from the device, and a graphical user interface (GUI) module configured to generate a medical provider user interface accessible via the device. The medical provider user interface can be contextually generated based on the location information and includes interface characteristics associated with the location information.

Abstract: A system can include a location data module configured to receive location data, the location data including patient location information associated with a plurality patients and care team member location information associated with one or more care team members, and a route module operatively connected to the location data module and configured to determine a visitation route for each of the one or more care team members to visit the plurality of patients based on the location data.

Abstract: A virtual care system can include a location module configured to receive location information associated with a device from the device, and a graphical user interface (GUI) module configured to generate a medical provider user interface accessible via the device. The medical provider user interface can be contextually generated based on the location information and includes interface characteristics associated with the location information.

Abstract: A vacuum variable capacitor includes a pre-vacuum enclosure for reducing a pressure differential across the bellows. The vacuum force load on the drive system can thereby be reduced, allowing faster movement of the movable electrode, faster capacitance adjustment of the vacuum variable capacitor and longer lifetimes of the device.

Abstract: A vacuum variable capacitor includes a pre-vacuum enclosure for reducing a pressure differential across the bellows, wherein a drive is disposed outside the enclosures of the vacuum variable capacitor. The vacuum force load on the drive system can thereby be reduced, allowing faster movement of the movable electrode, faster capacitance adjustment of the vacuum variable capacitor and longer lifetimes of the device.

Abstract: A vacuum variable capacitor includes a pre-vacuum enclosure for reducing a pressure differential across the bellows. The vacuum force load on the drive system can thereby be reduced, allowing faster movement of the movable electrode, faster capacitance adjustment of the vacuum variable capacitor and longer lifetimes of the device.

Abstract: A vacuum variable vapacitor includes a pre-vacuum enclosure for reducing a pressure differential across the bellows, wherein a drive is disposed outside the enclosures of the vacuum variable capacitor. The vacuum force load on the drive system can thereby be reduced, allowing faster movement of the movable electrode, faster capacitance adjustment of the vacuum variable capacitor and longer lifetimes of the device.

Abstract: A plasma processing system may include a radio frequency (RF) generator configured to supply a pulsing process signal to a target in a plasma processing chamber via a RF matching network. A phase and magnitude detector circuit is coupled to the RF generator and configured to sense the pulsing process signal and output a magnitude error signal and a phase error signal. A pulse tracking circuit is electrically coupled to the phase and magnitude detector circuit and configured to receive the magnitude error signal and the phase error signal and output a tracked magnitude signal and a tracked phase signal. A match controller is electrically coupled to the pulse tracking circuit and the RF matching network and configured to receive the tracked magnitude signal and the tracked phase signal and vary an impedance of the RF matching network in response to the tracked magnitude and phase signals.

Abstract: A plasma processing system may include a radio frequency (RF) generator configured to supply a pulsing process signal to a target in a plasma processing chamber via a RF matching network. A phase and magnitude detector circuit is coupled to the RF generator and configured to sense the pulsing process signal and output a magnitude error signal and a phase error signal. A pulse tracking circuit is electrically coupled to the phase and magnitude detector circuit and configured to receive the magnitude error signal and the phase error signal and output a tracked magnitude signal and a tracked phase signal. A match controller is electrically coupled to the pulse tracking circuit and the RF matching network and configured to receive the tracked magnitude signal and the tracked phase signal and vary an impedance of the RF matching network in response to the tracked magnitude and phase signals.

Abstract: A processing system having a processing chamber that includes a substrate holder and an electrode. The processing system can include a pressure control system, gas supply system, and monitoring system. A multi-frequency RF source is coupled to the electrode using a reduced-element matching network having a single variable element. The multi-frequency RF source is set to a first frequency to ignite a plasma and to a second frequency to maintain the plasma.