Patents by Inventor Jack I. Raffel
Jack I. Raffel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6695668Abstract: This invention relates to an inexpensive toy track vehicle with optical sensors for use on a printed track, and a method for controlling the vehicle on a printed track.Type: GrantFiled: January 29, 2002Date of Patent: February 24, 2004Inventors: Kevin Gerard Donahue, Jack I. Raffel, Robert John Caldicott
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Publication number: 20020102910Abstract: This invention relates to an inexpensive toy track vehicle with optical sensors for use on a printed track, and a method for controlling the vehicle on a printed track.Type: ApplicationFiled: January 29, 2002Publication date: August 1, 2002Inventors: Kevin Gerard Donahue, Jack I. Raffel, Robert John Caldicott
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Patent number: 5641703Abstract: Methods and systems are discussed for fabricating electrically programmable link structures by fabricating a first metal conductor of a refractory conductive material, composite, or an aluminum alloy which has been modified with a refractory material, then fabricating an insulating link material over the first conductor, and subsequently, depositing a second conductor over the link material. In use, an electrical path can be formed between the first and second conductors by applying a voltage between such conductors across at least one selected region of the insulator, such that the insulating link material is transformed in the region and rendered conductive to form an electrical signal path.Type: GrantFiled: April 28, 1995Date of Patent: June 24, 1997Assignee: Massachusetts Institute of TechnologyInventors: Simon S. Cohen, Jack I. Raffel, Peter W. Wyatt
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Patent number: 5390141Abstract: An electrical path can be formed through a transformable insulator between first and second conductors by applying a voltage between such conductors across at least one selected region of the insulator. Much of the current required to complete the link is provided from parasitic capacitance of the writing circuit or from capacitance which is removable from the circuit during normal operations. As a result, small transistors of less than 100 microamps may be used in the writing circuit which applies the programming voltage.Type: GrantFiled: July 7, 1993Date of Patent: February 14, 1995Assignee: Massachusetts Institute of TechnologyInventors: Simon S. Cohen, Jack I. Raffel
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Patent number: 5345365Abstract: An interconnection system for high performance electronic hybrids employs micro-machined features on a substrate to connect directly to miniature electronic components, such as integrated circuits. The micro-machined features may include posts for connecting to bonding pads of standard components and may also include rails for alignment of components and connections to specially made components.Type: GrantFiled: May 5, 1992Date of Patent: September 6, 1994Assignee: Massachusetts Institute of TechnologyInventors: Terry O. Herndon, Jack I. Raffel
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Patent number: 4937475Abstract: A laser programmable integrated circuit chip has a plurality of logic modules organized as rows and columns. The modules and other chip components are connected by a grid-like array of conductors. The conductors are initially unattached. Customization occurs by fusing laser diffuseable links and severing cut points on the conductors. The modules have continuous conductor lines running through them. These conductor lines aid in testing and are useful in routing and error avoidance. The chip also contains test registers to test the array of logic modules, the input/output blocks, and the conductors.Type: GrantFiled: September 19, 1988Date of Patent: June 26, 1990Assignee: Massachusetts Institute of TechnologyInventors: F. Matthew Rhodes, Jack I. Raffel
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Patent number: 4810663Abstract: An integrated circuit device including a link point for electrically connecting a plurality of metal layers, comprising a first metal layer, a link insulating layer and a second metal layer. Diffusion barrier may be employed between the link insulator layer and each of the first metal layer and the second metal layer. The metal layers are connected by exposing the link point to a low-power laser for a relatively long pulse width.Type: GrantFiled: May 6, 1986Date of Patent: March 7, 1989Assignee: Massachusetts Institute of TechnologyInventors: Jack I. Raffel, John A. Yasaitis, Glenn H. Chapman, Mark L. Naiman, James A. Burns
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Patent number: 4636404Abstract: A method and apparatus for reliably forming low resistance links between two aluminum conductors deposited on an insulating polysilicon or amorphous silicon layer, employ a laser to bridge a lateral gap between the conductors. The apparatus and method are ideally suited for implementing defect avoidance using redundancy in large random access memories and in complex VLSI circuits. Only a single level of metal is employed and leads to both higher density and lower capacitance in comparison to prior techniques. Resistances in the range of one to ten ohms can be achieved for gap widths of approximately two to three microns.Type: GrantFiled: September 17, 1984Date of Patent: January 13, 1987Assignee: Mass. Institute of TechnologyInventors: Jack I. Raffel, John A. Yasaitis, Glenn H. Chapman
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Patent number: 4585490Abstract: An integrated circuit device including a link point for electrically connecting a plurality of metal layers, comprising a first metal layer, a link insulating layer, a second metal layer and diffusion barrier layers between the link insulator layer and each of the first metal layer and the second metal layer. The metal layers are connected by exposing the link point to a low-power laser for a relatively long pulse width.Type: GrantFiled: October 3, 1984Date of Patent: April 29, 1986Assignee: Massachusetts Institute of TechnologyInventors: Jack I. Raffel, John A. Yasaitis, Glenn H. Chapman, Mark L. Naiman
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Patent number: 4384299Abstract: An improved metal dual insulator semiconductor capacitor memory is disclosed. The memory contains a plurality of capacitor cells, each cell comprising a semiconductor substrate layer and a high conductivity layer sandwiching two insulator layers. The substrate is doped to provide avalanche breakdown in a surface depletion layer at a voltage comparable to the write voltage in the accumulation direction. The invention also provides a method of reading stored information without disturbing adjacent cells. A small variable voltage is applied across a "flat-band" portion of the hysteresis loop describing the voltage-capacitance relationship for the capacitor memory. A change or the absence of a change in the current through the capacitor indicates the state of the capacitor cell. Methods to fabricate the memory are also disclosed.Type: GrantFiled: January 4, 1982Date of Patent: May 17, 1983Assignee: Massachusetts Institute of TechnologyInventors: Jack I. Raffel, John A. Yasaitis
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Patent number: 4242736Abstract: An improved metal dual insulator semiconductor capacitor memory is disclosed. The memory contains a plurality of capacitor cells, each cell comprising a semiconductor substrate layer and a high conductivity layer sandwiching two insulator layers. The substrate is doped to provide avalanche breakdown in a surface depletion layer at a voltage comparable to the write voltage in the accumulation direction. The invention also provides a method of reading stored information without disturbing adjacent cells. A small variable voltage is applied across a "flat-band" portion of the hysteresis loop describing the voltage-capacitance relationship for the capacitor memory. A change or the absence of a change in the current through the capacitor indicates the state of the capacitor cell. Methods to fabricate the memory are also disclosed.Type: GrantFiled: February 1, 1979Date of Patent: December 30, 1980Assignee: Massachusetts Institute of TechnologyInventors: Jack I. Raffel, John A. Yasaitis
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Patent number: 4231819Abstract: A process is described which combines polycrystalline isolation of collectors and shallow oxide isolation of bases. This approach is capable of providing deep dielectric isolation, surface planarity and the high density of walled emitter geometries, a combination heretofore unobtainable by any other means.This isolation scheme has been used to fabricate ECL gate chains. The transistors were located in 2.5 micron thick n epi islands surrounded by 5.times.10.sup.5 ohm-cm polysilicon selectively oxidized with silicon nitride masking to a thickness of one micron. The oxide "bump" at the nitride mask was typically 3000 A and the epi-poly step height was as small as 2600 A. The circuits have polysilicon resistors and were fabricated using both thermal diffusion and ion implantation. The power-delay product of these circuits was approximately one-half that of junction isolated circuits.Type: GrantFiled: July 27, 1979Date of Patent: November 4, 1980Assignee: Massachusetts Institute of TechnologyInventors: Jack I. Raffel, Stephen E. Bernacki
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Patent number: 4184172Abstract: A process is described which combines polycrystalline isolation of collectors and shallow oxide isolation of bases. This approach is capable of providing deep dielectric isolation, surface planarity and the high density of walled emitter geometries, a combination heretofore unobtainable by any other means.This isolation scheme has been used to fabricate ECL gate chains. The transistors were located in 2.5 micron thick n-epi islands surrounded by 5.times.10.sup.5 ohm-cm polysilicon selectively oxidized with silicon nitride masking to a thickness of one micron. The oxide "bump" at the nitride mask was typically 3000 A and the epi-poly step height was as small as 2600 A. The circuits have polysilicon resistors and were fabricated using both thermal diffusion and ion implantation. The power-delay product of these circuits was approximately one-half that of junction isolated circuits.Type: GrantFiled: February 28, 1977Date of Patent: January 15, 1980Assignee: Massachusetts Institute of TechnologyInventors: Jack I. Raffel, Stephen E. Bernacki
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Patent number: 4127900Abstract: An improved method for reading metal dual insulator semiconductor capacitor memories is disclosed. The memory contains a plurality of capacitor cells, each cell comprising a semiconductor substrate layer and a high conductivity layer sandwiching two insulator layers. The substrate is doped to provide avalanche breakdown in a surface depletion layer at a voltage comparable to the write voltage in the accumulation direction. According to the invention, a small variable voltage is applied across a selected cell or cells. The range of voltage includes a "flat-band" portion of the hysteresis loop describing the voltage-capacitance relationship for the capacitor memory. The unselected cells are maintained in a depletion state in which their capacitance is a minimum. A change or the absence of a change in the current through the capacitor indicates the state of the capacitor cell.Type: GrantFiled: June 20, 1977Date of Patent: November 28, 1978Assignee: Massachusetts Institute of TechnologyInventors: Jack I. Raffel, John A. Yasaitis
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Patent number: 4027383Abstract: Lead connections and packaging for integrated circuits are formed by processing elongated ribbon arrays of integrated circuit dice in groups prior to cutting the ribbon along its length to free the discrete integrated circuit products. The ribbon is adhered to the base of an elongated channel having at least one leg containing implanted lead-in conductors arranged therein as an axial series of axial arrays of conductors. The axial arrays are aligned with the circuits on the ribbons and interconnections therebetween are formed as photolithographically defined conductive coatings on a top surface of the ribbon extending from bonding pads of the integrated circuit to exposed conductor ends at a top end(s) of the leg(s). The channel ribbon assembly is cut into discrete circuits after forming such interconnections for all the circuits of the ribbon as a group.Type: GrantFiled: July 16, 1975Date of Patent: June 7, 1977Assignee: Massachusetts Institute of TechnologyInventors: Terry O. Herndon, Jack I. Raffel