Patents by Inventor Jack N. Cox

Jack N. Cox has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • UV-vis characteristic writing in silicon nitride and oxynitride films
    Patent number: 4933206
    Abstract: ArF excimer laser process is used to selectively dehydrogenate patterns on heavily hydrogenated silicon nitride and silicon oxynitride thin films. Excitation at 193 nm with a repetition rate of 100 Hz for 30 seconds duration, with a pulse energy on the order of 100 mJ/cm.sup.2, produces a selective dehydrogenation mechanism, opening a UV transparent window. A selective window opening allows a semiconductor device that is sensitive to UV radiation to be passively programmed, dependant on the locations of the windows opened.
    Type: Grant
    Filed: August 17, 1988
    Date of Patent: June 12, 1990
    Assignee: Intel Corporation
    Inventor: Jack N. Cox