Patents by Inventor Jacob J. Orbon, Jr.

Jacob J. Orbon, Jr. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Design-based method for grouping systematic defects in lithography pattern writing system
    Patent number: 7760347
    Abstract: Methods and apparatus for categorizing defects on workpieces, such as semiconductor wafers and masks used in lithographically writing patterns into such wafers are provided. For some embodiments, by analyzing the layout in the neighborhood of the defect, and matching it to similar defected neighborhoods in different locations across the die, defects may be categorized by common structures in which they occur.
    Type: Grant
    Filed: May 15, 2006
    Date of Patent: July 20, 2010
    Assignee: Applied Materials, Inc.
    Inventors: Youval Nehmadi, Ofer Bokobza, Ariel Ben-Porath, Erez Ravid, Rinat Shishi, Vicky Svidenko, Gilad Almogy, Jacob J. Orbon, Jr.