Patents by Inventor Jacob Kleijn

Jacob Kleijn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Optical element mount for lithographic apparatus
    Patent number: 9335641
    Abstract: A mount configured to mount an optical element in a module for a lithographic apparatus. The mount includes a plurality of resilient members constructed and arranged to circumferentially support the optical element. Each resilient member includes a plurality of resilient subsections that are configured to engage the optical element around a perimeter thereof. Each resilient subsection is configured to flex independent of another resilient subsection.
    Type: Grant
    Filed: July 16, 2009
    Date of Patent: May 10, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Henricus Gerardus Tegenbosch, Alexander Matthijs Struycken, Jacob Kleijn, Ruud Antonius Catharina Maria Beerens, Ivo Vanderhallen
  • Lithographic apparatus, composite material and manufacturing method
    Patent number: 8848169
    Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device. The patterning device may be capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes a substrate table constructed to hold a substrate and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus may be provided with a composite material wherein a layer of carbon fiber and a layer of titanium is provided within the composite.
    Type: Grant
    Filed: May 15, 2009
    Date of Patent: September 30, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Mark Scholten, Jacob Kleijn, Stephan Christiaan Quintus Libourel, Mark Petrus Ubbink
  • LITHOGRAPHIC APPARATUS, COMPOSITE MATERIAL AND MANUFACTURING METHOD
    Publication number: 20090310114
    Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device. The patterning device may be capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes a substrate table constructed to hold a substrate and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus may be provided with a composite material wherein a layer of carbon fiber and a layer of titanium is provided within the composite.
    Type: Application
    Filed: May 15, 2009
    Publication date: December 17, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Mark Scholten, Jacob Kleijn, Stephan Christiaan Quintus Libourel, Mark Petrus Ubbink
  • Lithographic apparatus and device manufacturing method
    Patent number: 7307262
    Abstract: A lithographic apparatus includes a projection system including a movable optical element. The movable optical element is capable, by a displacement thereof to influence a position quantity of a radiation beam projected by the projection system. A control device is provided to drive the optical element actuator to influence a position quantity of the movable optical element, thereby influencing a position quantity of the radiation beam as projected by the projection system. The control device is adapted to move the movable optical element to position the radiation beam as projected by the projection system with respect to the substrate, or to correct a position quantity of the radiation beam as projected by the projection system caused by any type of disturbance on the projection system.
    Type: Grant
    Filed: December 23, 2004
    Date of Patent: December 11, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Antonius Johannes Josephus Van Dijsseldonk, Dominicus Jacobus Petrus Adrianus Franken, Robertus Johannes Marinus De Jongh, Jacob Kleijn, Bastiaan S H Jansen, Marc Van Der Wijst
  • Lithographic apparatus and device manufacturing method
    Publication number: 20060139598
    Abstract: A lithographic apparatus includes a projection system including a movable optical element. The movable optical element is capable, by a displacement thereof to influence a position quantity of a radiation beam projected by the projection system. A control device is provided to drive the optical element actuator to influence a position quantity of the movable optical element, thereby influencing a position quantity of the radiation beam as projected by the projection system. The control device is adapted to move the movable optical element to position the radiation beam as projected by the projection system with respect to the substrate, or to correct a position quantity of the radiation beam as projected by the projection system caused by any type of disturbance on the projection system.
    Type: Application
    Filed: December 23, 2004
    Publication date: June 29, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Antonius Van Dijsseldonk, Dominicus Jacobus Adrianus Franken, Robertus De Jongh, Jacob Kleijn, Bastiaan Jansen, Marc Van Der Wijst