Patents by Inventor Jacob Kramer

Jacob Kramer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110080567
    Abstract: A cleaning liquid supply system is disclosed. The cleaning liquid supply system may supply an emulsified cleaning liquid to clean an immersion lithographic apparatus. A lithographic apparatus is also disclosed.
    Type: Application
    Filed: September 29, 2010
    Publication date: April 7, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Kornelis Tijmen HOEKERD, Roelof Frederik De Graaf, Hans Jansen, Martinus Hendrikus Antonius Leenders, Antonius Johannus Van Der Net, Pieter Jacob Kramer, Anthonie Kuijper, Arjan Hubrecht Josef Anna Martens, Sandra Van Der Graaf, Alexandre Viktorovych Padiy
  • Publication number: 20110017724
    Abstract: Fluid temperature control and sensor calibration is disclosed. In an embodiment, a fluid temperature control unit includes a heater configured to heat a first fluid in a first fluid path, a first temperature sensor configured to measure a temperature of the first fluid in the first fluid path, a second temperature sensor configured to measure a temperature of a second fluid in a second fluid path, and a controller configured to control the heater on the basis of the temperature sensed by the first sensor and the temperature sensed by the second sensor.
    Type: Application
    Filed: July 26, 2010
    Publication date: January 27, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Arjan Hubrecht Josef Anna Martens, Pieter Jacob Kramer
  • Publication number: 20110013159
    Abstract: A lithographic apparatus is disclosed that includes a conduit for two phase flow therethrough. A flow separator is provided to separate the two phase flow into a gas flow and a liquid flow. A flow meter measures the flow rate of fluid in the gas flow or the liquid flow.
    Type: Application
    Filed: June 22, 2010
    Publication date: January 20, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Pieter Jacob Kramer, Antonius Johannus Van Der Net, Erik Henricus Egidius Catharina Eummelen, Anthonie Kuijper
  • Publication number: 20100328634
    Abstract: A method of cleaning an immersion lithographic apparatus is disclosed in which a cleaner is added to immersion liquid for use during exposure of a substrate. The cleaner may be a combination of a soap and a solvent. The cleaner maybe present at a concentration of less than 300 ppb.
    Type: Application
    Filed: May 12, 2010
    Publication date: December 30, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Bauke Jansen, Richard Joseph Bruls, Hans Jansen, Antonius Johannus Van der Net, Pieter Jacob Kramer, Anthonie Kuijper, Arjan Hubrecht Josef Anna Martens, Eric Willem Felix Casimiri
  • Publication number: 20100208221
    Abstract: A fluid supply system for a lithographic apparatus, includes a controller configured to vary fluid flow rate to a first component from a fluid source while maintaining total flow resistance to fluid downstream of the fluid source substantially constant.
    Type: Application
    Filed: February 16, 2010
    Publication date: August 19, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Pieter Jacob Kramer, Anthonie Kuijper, Arjan Hubrecht Josef Anna Martens
  • Publication number: 20100045951
    Abstract: A temperature sensor is provided to measure the temperature of immersion liquid at a position where the immersion liquid is supplied. The reading of this temperature sensor is used to control the magnitude of heat input to the immersion liquid using a heater and/or cooler. A controller is used to calculate the calibration error of the temperature sensor relative to a temperature sensor that is provided upstream. The controller uses readings of the temperature difference between the two temperature sensors at one or more mass flow rates in order to estimate the temperature difference between the two temperature sensors at an infinite mass flow rate. The temperature difference at this infinite mass flow rate is estimated to be the temperature calibration error of the temperature sensor to measure the temperature of immersion liquid at a position where the immersion liquid is supplied relative to the upstream temperature sensor.
    Type: Application
    Filed: August 20, 2009
    Publication date: February 25, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Arjan Hubrecht Josef Anna MARTENS, Martinus Cornelis Maria Verhagen, Pieter Jacob Kramer, Hubertus Leonardus Franciscus Heusschen