Abstract: A method for monitoring a surface condition of a component includes providing thermal energy to a component, determining a thermal response of the heater in response to providing the thermal energy, and determining a thermal characteristic of the component based on a reference thermal response and the thermal response. The method includes predicting the surface condition of the component based on the thermal characteristic and a predictive analytic model, where the predictive analytic model correlates the thermal characteristic of the component to an estimated surface condition of the component.

Abstract: A method of controlling a thermal system of an industrial process includes monitoring intermediate data, associating the intermediate data with correlation data, wherein the correlation data includes an internal process control input, an external heater control input, the output control, or a combination thereof. The method further includes generating a model that defines a relationship between the intermediate data and the correlation data, identifying a state of the heater system based on the model, and selectively performing a corrective action based on the identified state of the heater system.

Abstract: A method for controlling a heated process of an electric heater includes obtaining a setpoint variable indicating a target temperature of the heater. The method includes identifying an energy profile for the heater based on the setpoint variable. The energy profile provides a defined magnitude of initial electrical energy to be applied to the heater to have a temperature of the heated process reach the target temperature. The method includes obtaining a process variable indicating a performance characteristic of the heated process. The method includes providing electrical energy to the heater based on at least one of the energy profile and the process variable.

Abstract: A method of monitoring a condition of a dynamic system includes installing a vibration signal acquisition device at a predetermined location of the dynamic system, acquiring vibration signals by the vibration signal acquisition device, analyzing the vibration signals in a frequency domain, and predicting a change in the condition of the dynamic system based on the vibration signals in the frequency domain. A system is also provided, and a condition of the dynamic system includes clogging.

Abstract: A method includes providing thermal energy to a component, determining a thermal response of the component in response to providing the thermal energy, and determining a thermal characteristic of the component based on a reference thermal response and the thermal response. The method includes predicting a surface condition of the component based on the thermal characteristic and a predictive analytic model, where the predictive analytic model correlates the thermal characteristic of the component to an estimated surface condition of the component.

Abstract: A fluid control system is provided that in one form includes a first flow channel, a second flow channel, a heater disposed in the second flow channel, and a fluid control device disposed upstream from the first and second flow channels. When the heater is turned on, the fluid control device changes a fluid flow rate through at least one of the first flow channel and the second flow channel. In another form, the fluid control system includes a bypass conduit, a heater disposed within the bypass conduit, and a fluid control device disposed near the inlet and outlet of the bypass conduit. In still another form, the fluid control system includes a regeneration device disposed downstream from at least one exhaust aftertreatment system and closes an outlet of the exhaust pipe.

Abstract: An exhaust system is provided that includes an exhaust aftertreatment unit, first and second exhaust pathway in communication with and upstream of the exhaust aftertreatment unit, a thermally activated flow control device operable in a first and second mode, and a thermal storage device. In the first mode, the flow control device permits exhaust to flow to the aftertreatment unit through the first pathway and inhibits flow through the second pathway. In the second mode, the flow control device permits exhaust flow to the aftertreatment unit through the second pathway and inhibits flow through the first pathway. The flow control device may switch between the first and second modes based on a change of temperature. The thermal storage device is within the second pathway, stores thermal mass, and provides thermal insulation to enable a catalyst of the aftertreatment unit to maintain a predetermined temperature for a predetermined time.

Abstract: A heater system is provided that includes a base functional layer having at least one functional zone. A substrate is secured to the functional member, and a tuning layer is secured to the substrate opposite the base functional layer. The tuning layer includes a plurality of zones that is greater in number than the zones of the base functional layer, and the tuning layer provides lower power than the base functional layer. A component is secured to the tuning layer opposite the substrate, and the substrate defines a thermal conductivity to absorb and dissipate a requisite amount of power from the base functional layer. A control system is also provided that has a plurality of addressable control elements in electrical communication with power lines and with the tuning layer, the control elements providing selective control of the tuning layer zones.

Abstract: The present disclosure provides a thermal system that includes an array of heating resistor circuits having first termination ends and second termination ends, and a plurality of nodes connected to the heating resistor circuits at the first and second termination ends. The thermal system further includes power wires to provide power to the heating resistor circuits and signal wires to sense a temperature of each of the heating resistor circuits. Each node is connected to a power wire and to a signal wire, and a number of heating resistor circuits is greater than or equal to a number of power wires and to a number of the signal wires.

Abstract: An exhaust system is provided that includes an exhaust aftertreatment unit, first and second exhaust pathway in communication with and upstream of the exhaust aftertreatment unit, a thermally activated flow control device operable in a first and second mode, and a thermal storage device. In the first mode, the flow control device permits exhaust to flow to the aftertreatment unit through the first pathway and inhibits flow through the second pathway. In the second mode, the flow control device permits exhaust flow to the aftertreatment unit through the second pathway and inhibits flow through the first pathway. The flow control device may switch between the first and second modes based on a change of temperature. The thermal storage device is within the second pathway, stores thermal mass, and provides thermal insulation to enable a catalyst of the aftertreatment unit to maintain a predetermined temperature for a predetermined time.

Abstract: An apparatus is provided, by way of example, a heater for use in semiconductor processing equipment, that includes a base functional layer having at least one functional zone. A substrate is secured to the base functional layer, and a tuning layer is secured to the substrate opposite the base functional layer. The tuning layer includes a plurality of zones that is greater in number than the zones of the base functional layer, and the tuning layer has lower power than the base functional layer. Further, a component, such as a chuck by way of example, is secured to the tuning layer opposite the substrate. The substrate defines a thermal conductivity to dissipate a requisite amount of power from the base functional layer.

Abstract: A thermal system includes a plurality of resistor circuits that define a number of resistor circuits Rn. The thermal system also has a plurality of nodes that connect the plurality of resistor circuits and define a number of nodes Nn. A plurality of power wires are connected to each of the plurality of nodes, and the plurality of power wires define a number of power wires Pn. A plurality of signal wires connect to each of the plurality of nodes to sense the temperature of each of the resistor circuits, and the plurality of signal wires define a number of signal wires Sn. The number of power wires Pn and the number of signal wires Sn is equal to the number of nodes Nn, and the number of resistor circuits Rn is greater than or equal to the number of nodes Nn.

Abstract: A fluid control system is provided that in one form includes a first flow channel, a second flow channel, a heater disposed in the second flow channel, and a fluid control device disposed upstream from the first and second flow channels. When the heater is turned on, the fluid control device changes a fluid flow rate through at least one of the first flow channel and the second flow channel. In another form, the fluid control system includes a bypass conduit, a heater disposed within the bypass conduit, and a fluid control device disposed near the inlet and outlet of the bypass conduit. In still another form, the fluid control system includes a regeneration device disposed downstream from at least one exhaust aftertreatment system and closes an outlet of the exhaust pipe.

Abstract: A thermal system includes a plurality of resistor circuits that define a number of resistor circuits Rn. The thermal system also has a plurality of nodes that connect the plurality of resistor circuits and define a number of nodes Nn. A plurality of power wires are connected to each of the plurality of nodes, and the plurality of power wires define a number of power wires Pn. A plurality of signal wires connect to each of the plurality of nodes to sense the temperature of each of the resistor circuits, and the plurality of signal wires define a number of signal wires Sn. The number of power wires Pn and the number of signal wires Sn is equal to the number of nodes Nn, and the number of resistor circuits Rn is greater than or equal to the number of nodes Nn.

Abstract: A heater system is provided that includes a base functional layer having at least one functional zone. A substrate is secured to the functional member, and a tuning layer is secured to the substrate opposite the base functional layer. The tuning layer includes a plurality of zones that is greater in number than the zones of the base functional layer, and the tuning layer provides lower power than the base functional layer. A component is secured to the tuning layer opposite the substrate, and the substrate defines a thermal conductivity to absorb and dissipate a requisite amount of power from the base functional layer. A control system is also provided that has a plurality of addressable control elements in electrical communication with power lines and with the tuning layer, the control elements providing selective control of the tuning layer zones.

Abstract: An apparatus is provided, by way of example, a heater for use in semiconductor processing equipment, that includes a base functional layer having at least one functional zone. A substrate is secured to the base functional layer, and a tuning layer is secured to the substrate opposite the base functional layer. The tuning layer includes a plurality of zones that is greater in number than the zones of the base functional layer, and the tuning layer has lower power than the base functional layer. Further, a component, such as a chuck by way of example, is secured to the tuning layer opposite the substrate. The substrate defines a thermal conductivity to dissipate a requisite amount of power from the base functional layer.

Abstract: An apparatus for determining and controlling characteristics of a fluid is provided that includes a substrate, a heating circuit, and a sensing circuit applied on the substrate by a layered process. A control module is in communication with the heating circuit and the sensing circuit for determining, for example, type, concentration, liquid level, and temperature of the fluid, which in one form is a urea solution.

Abstract: A heater system is provided that includes a hybrid insulation cover that has a first cover disposed around hinged carrier members and heat trace sections, and a second cover operatively engaged with the first cover and adapted for detachable placement around a heating target and its varying geometries. A flexible insulation jacket having a similar construction as the second cover is also provided for use with connector assemblies. Furthermore, a heater system is provided that includes at least one heat trace section encapsulated within adjacent insulating members for use with heating gaslines and pumplines of semiconductor processing systems.

Abstract: An apparatus is provided, by way of example, a heater for use in semiconductor processing equipment that includes a base functional layer having at least one functional zone. A substrate is secured to the base functional layer, and a tuning layer is secured to the substrate opposite the base functional layer. The tuning layer includes a plurality of zones that is greater in number than the zones of the base functional layer, and the tuning layer has lower power than the base functional layer. Further, a component, such as a chuck by way of example, is secured to the tuning layer opposite the substrate. The substrate defines a thermal conductivity to dissipate a requisite amount of power from the base functional layer.

Abstract: An apparatus for determining and controlling characteristics of a fluid is provided that includes a substrate, a heating circuit, and a sensing circuit applied on the substrate by a layered process. A control module is in communication with the heating circuit and the sensing circuit for determining, for example, type, concentration, liquid level, and temperature of the fluid, which in one form is a urea solution.