Patents by Inventor Jacob Retallick

Jacob Retallick has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11635450
    Abstract: A method for the patterning and control of single electrons on a surface is provided that includes implementing scanning tunneling microscopy hydrogen lithography with a scanning probe microscope to form charge structures with one or more confined charges; performing a series of field-free atomic force microscopy measurements on the charge structures with different tip heights, where interaction between the tip and the confined charge are elucidated; and adjusting tip heights to controllably position charges within the structures to write a given charge state. The present disclose also provides a Gibb's distribution machine formed with the method for the patterning and control of single electrons on a surface. A multi bit true random number generator and neural network learning hardware formed with the above described method are also provided.
    Type: Grant
    Filed: June 29, 2021
    Date of Patent: April 25, 2023
    Assignees: Quantum Silicon inc., National Research Council of Canada
    Inventors: Robert Wolkow, Mohammad Rashidi, Wyatt Vine, Thomas Dienel, Lucian Livadaru, Taleana Huff, Jacob Retallick, Konrad Walus, Jason Pitters, Roshan Achal
  • Publication number: 20210325429
    Abstract: A method for the patterning and control of single electrons on a surface is provided that includes implementing scanning tunneling microscopy hydrogen lithography with a scanning probe microscope to form charge structures with one or more confined charges; performing a series of field-free atomic force microscopy measurements on the charge structures with different tip heights, where interaction between the tip and the confined charge are elucidated; and adjusting tip heights to controllably position charges within the structures to write a given charge state. The present disclose also provides a Gibb's distribution machine formed with the method for the patterning and control of single electrons on a surface. A multi bit true random number generator and neural network learning hardware formed with the above described method are also provided.
    Type: Application
    Filed: June 29, 2021
    Publication date: October 21, 2021
    Applicants: Quantum Silicon Inc., National Research Council of Canada, The University of British Columbia
    Inventors: Robert Wolkow, Mohammad Rashidi, Wyatt Vine, Thomas Dienel, Lucian Livadaru, Taleana Huff, Jacob Retallick, Konrad Walus, Jason Pitters, Roshan Achal
  • Patent number: 11047877
    Abstract: A method for the patterning and control of single electrons on a surface is provided that includes implementing scanning tunneling microscopy hydrogen lithography with a scanning probe microscope to form charge structures with one or more confined charges; performing a series of field-free atomic force microscopy measurements on the charge structures with different tip heights, where interaction between the tip and the confined charge are elucidated; and adjusting tip heights to controllably position charges within the structures to write a given charge state. The present disclose also provides a Gibb's distribution machine formed with the method for the patterning and control of single electrons on a surface. A multi bit true random number generator and neural network learning hardware formed with the above described method are also provided.
    Type: Grant
    Filed: September 28, 2018
    Date of Patent: June 29, 2021
    Assignee: Quantum Silicon Inc.
    Inventors: Robert Wolkow, Mohammad Rashidi, Wyatt Vine, Thomas Dienel, Lucian Livadaru, Taleana Huff, Jacob Retallick, Konrad Walus
  • Publication number: 20200249256
    Abstract: A method for the patterning and control of single electrons on a surface is provided that includes implementing scanning tunneling microscopy hydrogen lithography with a scanning probe microscope to form charge structures with one or more confined charges; performing a series of field-free atomic force microscopy measurements on the charge structures with different tip heights, where interaction between the tip and the confined charge are elucidated; and adjusting tip heights to controllably position charges within the structures to write a given charge state. The present disclose also provides a Gibb's distribution machine formed with the method for the patterning and control of single electrons on a surface. A multi bit true random number generator and neural network learning hardware formed with the above described method are also provided.
    Type: Application
    Filed: September 28, 2018
    Publication date: August 6, 2020
    Applicant: Quantum Silicon Inc.
    Inventors: Robert Wolkow, Mohammad Rashidi, Wyatt Vine, Thomas Dienel, Lucian Livadaru, Taleana Huff, Jacob Retallick, Konrad Walus