Patents by Inventor Jacobus Burghoom

Jacobus Burghoom has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 7385675
    Abstract: A lithographic apparatus in which alignment marks on the substrate are inspected during the exposure of the substrate to optimize the exposure conditions.
    Type: Grant
    Filed: May 26, 2004
    Date of Patent: June 10, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Richard Alexander George, Cheng-Qun Gui, Pieter Willem Herman de Jager, Robbert Edgar Van Leeuwen, Jacobus Burghoom
  • Lithographic apparatus and device manufacturing method
    Publication number: 20050007572
    Abstract: A lithographic apparatus in which alignment marks on the substrate are inspected during the exposure of the substrate to optimize the exposure conditions.
    Type: Application
    Filed: May 26, 2004
    Publication date: January 13, 2005
    Inventors: Richard George, Cheng-Qun Gui, Pieter Willem Jager, Robbert Edgar Leeuwen, Jacobus Burghoom
  • Abbe arm calibration system for use in lithographic apparatus
    Patent number: 6730920
    Abstract: In a lithographic apparatus, a reference grating 11 mounted on the wafer table WT is illuminated with a measurement beam 20 incident in a direction independent of wafer table tilt. The diffraction orders are detected by detector 30 and used to determine the lateral shift in the wafer table resulting from a non-zero Abbe arm, and hence the Abbe arm, for calibration purposes. The detector 30 may be a detector also used for off-axis alignment of the wafer and wafer table.
    Type: Grant
    Filed: January 12, 2001
    Date of Patent: May 4, 2004
    Assignee: ASML Netherlands B.V.
    Inventors: Rogier H. M. Groeneveld, Erik R. Loopstra, Jacobus Burghoom, Leon M. Levasier, Alexander Straaijer
  • Abbe arm calibration system for use in lithographic apparatus
    Publication number: 20010008273
    Abstract: In a lithographic apparatus, a reference grating 11 mounted on the wafer table WT is illuminated with a measurement beam 20 incident in a direction independent of wafer table tilt. The diffraction orders are detected by detector 30 and used to determine the lateral shift in the wafer table resulting from a non-zero Abbe arm, and hence the Abbe arm, for calibration purposes. The detector 30 may be a detector also used for off-axis alignment of the wafer and wafer table.
    Type: Application
    Filed: January 12, 2001
    Publication date: July 19, 2001
    Inventors: Rogier H.M. Groeneveld, Erik R. Loopstra, Jacobus Burghoom, Leon M. Levasier, Alexander Straaijer