Patents by Inventor Jacobus Burghoorn
Jacobus Burghoorn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8675175Abstract: A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.Type: GrantFiled: March 8, 2013Date of Patent: March 18, 2014Assignee: ASML Netherlands B.V.Inventors: Richard Alexander George, Cheng-Qun Gui, Pieter Willem Herman De Jager, Robbert Edgar Van Leeuwen, Jacobus Burghoorn
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Patent number: 8395755Abstract: A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.Type: GrantFiled: July 21, 2009Date of Patent: March 12, 2013Assignee: ASML Netherlands B.V.Inventors: Richard Alexander George, Cheng-Qun Gui, Pieter Willem Herman De Jager, Robbert Edgar Van Leeuwen, Jacobus Burghoorn
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Method for producing a marker on a substrate, lithographic apparatus and device manufacturing method
Patent number: 8264664Abstract: A method of producing a marker on a substrate includes projecting a patterned beam on a layer of resist disposed on a substrate in a lithographic apparatus to create a latent marker; and locally heating the substrate at the marker location in the lithographic apparatus to transform the latent marker into a detectable marker.Type: GrantFiled: November 12, 2008Date of Patent: September 11, 2012Assignee: ASML Netherlands B.V.Inventors: Maurits Van Der Schaar, Jacobus Burghoorn, Richard Johannes Franciscus Van Haren, Everhardus Cornelis Mos, Rene Monshouwer -
Patent number: 8139217Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.Type: GrantFiled: December 23, 2010Date of Patent: March 20, 2012Assignee: ASML Netherlands B.V.Inventors: Franciscus Bernardus Maria Van Bilsen, Jacobus Burghoorn, Richard Johannes Franciscus Van Haren, Paul Christiaan Hinnen, Hermanus Gerardus Van Horssen, Jeroen Huijbregtse, Andre Bernardus Jeunink, Henry Megens, Ramon Navarro Y Koren, Hoite Pieter Theodoor Tolsma, Hubertus Johannes Gertrudus Simons, Johny Rutger Schuurhuis, Sicco Ian Schets, Brian Young Bok Lee, Allan Reuben Dunbar
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Publication number: 20110128520Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.Type: ApplicationFiled: December 23, 2010Publication date: June 2, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Franciscus Bernardus Maria Van Bilsen, Jacobus Burghoorn, Richard Johannes Franciscus Van Haren, Paul Christiaan Hinnen, Hermanus Gerardus Van Horssen, Jeroen Huijbregtse, Andre Bernardus Jeunink, Henry Megens, Ramon Navarro Y Koren, Hoite Pieter Theodoor Tolsma, Hubertus Johannes Gertrudus Simons, Johny Rutger Schuurhuis, Sicco Ian Schets, Brian Young Bok Lee, Allan Reuben Dunbar
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Patent number: 7879682Abstract: The invention includes a lithographic system having a first source for generating radiation with a first wavelength and an alignment system with a second source for generating radiation with a second wavelength. The second wavelength is larger than the first wavelength. A marker structure is provided having a first layer and a second layer. The second layer is present either directly or indirectly on top of said first layer. The first layer has a first periodic structure and the second layer has a second periodic structure. At least one of the periodic structures has a plurality of features in at least one direction with a dimension smaller than 400 nm. Additionally, a combination of the first and second periodic structure forms a diffractive structure arranged to be illuminated by radiation with the second wavelength.Type: GrantFiled: November 3, 2009Date of Patent: February 1, 2011Assignee: ASML Netherlands B.V.Inventors: Richard Johannes Franciscus Van Haren, Arie Jeffrey Den Boef, Jacobus Burghoorn, Maurits Van Der Schaar, Bart Rijpers
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Patent number: 7880880Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.Type: GrantFiled: December 6, 2005Date of Patent: February 1, 2011Assignee: ASML Netherlands B.V.Inventors: Franciscus Bernardus Maria Van Bilsen, Jacobus Burghoorn, Richard Johannes Franciscus Van Haren, Paul Christiaan Hinnen, Hermanus Gerardus Van Horssen, Jeroen Huijbregtse, Andre Bernardus Jeunink, Henry Megens, Ramon Navarro Y Koren, Hoite Pieter Theodoor Tolsma, Hubertus Johannes Gertrudus Simons, Johny Rutger Schuurhuis, Sicco Ian Schets, Brian Young Bok Lee, Allan Reuben Dunbar
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Patent number: 7834975Abstract: A method for performing a tilted focus test includes the steps of providing a target object, providing a projection beam of radiation using a radiation source, providing a reflective device to introduce a projected projection beam of radiation onto the target portion, introducing a first projected projection beam of radiation onto the target object using the reflective device in a first orientation, using a tilting device for tilting the reflective device to a second orientation to provide a second projection beam with a tilt relative to said first projection beam, introducing a second projected projection beam of radiation onto the target object, and determining a lateral shift of the first and second projected projection beams on the target object and determining from said lateral shift a defocus of the target object with respect to the projected projection beam.Type: GrantFiled: May 26, 2006Date of Patent: November 16, 2010Assignee: ASML Netherlands B.V.Inventors: Jacobus Burghoorn, Jan Hauschild, Arie Jeffrey Den Boef, Martinus Hendrikus Antonius Leenders, Uwe Mickan, Roeland Nicolaas Maria Vanneer
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Publication number: 20100068830Abstract: The invention includes a lithographic system having a first source for generating radiation with a first wavelength and an alignment system with a second source for generating radiation with a second wavelength. The second wavelength is larger than the first wavelength. A marker structure is provided having a first layer and a second layer. The second layer is present either directly or indirectly on top of said first layer. The first layer has a first periodic structure and the second layer has a second periodic structure. At least one of the periodic structures has a plurality of features in at least one direction with a dimension smaller than 400 nm. Additionally, a combination of the first and second periodic structure forms a diffractive structure arranged to be illuminated by radiation with the second wavelength.Type: ApplicationFiled: November 3, 2009Publication date: March 18, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Richard Johannes Franciscus VAN HAREN, Arie Jeffrey Den Boef, Jacobus Burghoorn, Maurits Van Der Schaar, Bartolomeus Petrus Rijpers
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Patent number: 7629697Abstract: The invention includes a lithographic system having a first source for generating radiation with a first wavelength and an alignment system with a second source for generating radiation with a second wavelength. The second wavelength is larger than the first wavelength. A marker structure is provided having a first layer and a second layer. The second layer is present either directly or indirectly on top of said first layer. The first layer has a first periodic structure and the second layer has a second periodic structure. At least one of the periodic structures has a plurality of features in at least one direction with a dimension smaller than 400 nm. Additionally, a combination of the first and second periodic structure forms a diffractive structure arranged to be illuminated by radiation with the second wavelength.Type: GrantFiled: November 12, 2004Date of Patent: December 8, 2009Assignee: ASML Netherlands B.V.Inventors: Richard Johannes Franciscus Van Haren, Arie Jeffrey Den Boef, Jacobus Burghoorn, Maurits Van Der Schaar, Bartolomeus Petrus Rijpers
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Publication number: 20090284720Abstract: A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.Type: ApplicationFiled: July 21, 2009Publication date: November 19, 2009Applicant: ASML Netherlands B.V.Inventors: Richard Alexander George, Cheng-Qun Gui, Pieter Willem Herman De Jager, Robbert Edgar Van Leeuwen, Jacobus Burghoorn
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Patent number: 7576834Abstract: A lithographic apparatus is provided. The lithographic apparatus includes a radiation source configured to provide radiation, an array of optical light engines, and a substrate table that supports a substrate. Each of the optical light engines includes an array of individually controllable elements arranged and constructed to receive and to pattern the radiation and projection optics configured to receive the patterned radiation and to project the patterned radiation onto the substrate. The substrate table is arranged and constructed to move relative to the array of optical light engines during exposure of the substrate to the patterned radiation.Type: GrantFiled: May 1, 2008Date of Patent: August 18, 2009Assignee: ASML Netherlands B.V.Inventors: Richard Alexander George, Cheng-Qun Gui, Pieter Willem Herman de Jager, Robbert Edgar Van Leeuwen, Jacobus Burghoorn
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Patent number: 7518706Abstract: The present invention relates to an exposure apparatus that includes an illumination system for providing a projection beam of radiation, a support structure for supporting a device provided with a pattern, the device serving to impart the projection beam with a pattern in its cross-section; a table for holding a target object, a projection system for projecting the patterned beam onto the target object and a tilting device for providing the projection beam with a tilt. The tilting device is provided substantially in a pupil plane of the projection system.Type: GrantFiled: December 27, 2004Date of Patent: April 14, 2009Assignee: ASML Netherlands B.V.Inventors: Jan Hauschild, Arie Jeffrey Den Boef, Martinus Hendrikus Antonius Leenders, Uwe Mickan, Roeland Nicolaas Maria Vanneer, Jacobus Burghoorn
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METHOD FOR PRODUCING A MARKER ON A SUBSTRATE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
Publication number: 20090066921Abstract: A method of producing a marker on a substrate includes projecting a patterned beam on a layer of resist disposed on a substrate in a lithographic apparatus to create a latent marker; and locally heating the substrate at the marker location in the lithographic apparatus to transform the latent marker into a detectable marker.Type: ApplicationFiled: November 12, 2008Publication date: March 12, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Maurits Van Der Schaar, Jacobus Burghoorn, Richard Johannes Franciscus Van Haren, Everhardus Cornelis Mos, Rene Monshouwer -
Method for producing a marker on a substrate, lithographic apparatus and device manufacturing method
Patent number: 7476490Abstract: A method of producing a marker on a substrate includes projecting a patterned beam on a layer of resist disposed on a substrate in a lithographic apparatus to create a latent marker; and locally heating the substrate at the marker location in the lithographic apparatus to transform the latent marker into a detectable marker.Type: GrantFiled: June 25, 2004Date of Patent: January 13, 2009Assignee: ASML Netherlands B.V.Inventors: Maurits Van Der Schaar, Jacobus Burghoorn, Richard Johannes Franciscus Van Haren, Everhardus Cornelis Mos, Rene Monshouwer -
Patent number: 7439531Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.Type: GrantFiled: December 22, 2006Date of Patent: October 21, 2008Assignee: ASML Netherlands B.V.Inventors: Franciscus Bernardus Maria Van Bilsen, Jacobus Burghoorn, Richard Johannes Franciscus Van Haren, Paul Christiaan Hinnen, Hermanus Gerardus Van Horssen, Jeroen Huijbregtse, Andre Bernardus Jeunink, Henry Megens, Ramon Navarro Y Koren, Hoite Pieter Theodoor Tolsma, Hubertus Johannes Gertrudus Simons, Johny Rutger Schuurhuis, Sicco Ian Schets, Brian Young Bok Lee, Allan Reuben Dunbar
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Publication number: 20080218718Abstract: A lithographic apparatus is provided. The lithographic apparatus includes a radiation source configured to provide radiation, an array of optical light engines, and a substrate table that supports a substrate. Each of the optical light engines includes an array of individually controllable elements arranged and constructed to receive and to pattern the radiation and projection optics configured to receive the patterned radiation and to project the patterned radiation onto the substrate. The substrate table is arranged and constructed to move relative to the array of optical light engines during exposure of the substrate to the patterned radiation.Type: ApplicationFiled: May 1, 2008Publication date: September 11, 2008Applicant: ASML Netherlands B.V.Inventors: Richard Alexander George, Cheng-Qun Gui, Pieter Willem Herman de Jager, Robbert Edgar Van Leeuwen, Jacobus Burghoorn
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Patent number: 7332732Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.Type: GrantFiled: September 22, 2003Date of Patent: February 19, 2008Assignee: ASML Netherlands, B.V.Inventors: Franciscus Bernardus Maria Van Bilsen, Jacobus Burghoorn, Richard Johannes Franciscus Van Haren, Paul Christiaan Hinnen, Hermanus Gerardus Van Horssen, Jeroen Huijbregtse, Andre Bernardus Jeunink, Henry Megens, Ramon Navarro Y Koren, Hoite Pieter Theodoor Tolsma, Hubertus Johannes Gertrudus Simons, Johny Rutger Schuurhuis, Sicco Ian Schets, Brian Young Bok Lee, Allan Reuben Dunbar
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Patent number: 7329888Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.Type: GrantFiled: December 6, 2005Date of Patent: February 12, 2008Assignee: ASML Netherlands B.V.Inventors: Franciscus Bernardus Maria Van Bilsen, Jacobus Burghoorn, Richard Johannes Franciscus Van Haren, Paul Christiaan Hinnen, Hermanus Gerardus Van Horssen, Jeroen Huijbregtse, Andre Bernardus Jeunink, Henry Megens, Ramon Navarro Y Koren, Hoite Pieter Theodoor Tolsma, Hubertus Johannes Gertrudus Simons, Johny Rutger Schuurhuis, Sicco Ian Schets, Brian Young Bok Lee, Allan Reuben Dunbar
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Patent number: 7297971Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.Type: GrantFiled: December 6, 2005Date of Patent: November 20, 2007Assignee: ASML Netherlands B.V.Inventors: Franciscus Bernardus Maria Van Bilsen, Jacobus Burghoorn, Richard Johannes Franciscus Van Haren, Paul Christiaan Hinnen, Hermanus Gerardus Van Horssen, Jeroen Huijbregtse, Andre Bernardus Jeunink, Henry Megens, Ramon Navarro Y Koren, Hoite Pieter Theodoor Tolsma, Hubertus Johannes Gertrudus Simons, Johny Rutger Schuurhuis, Sicco Ian Schets, Brian Young Bok Lee, Allan Reuben Dunbar