Patents by Inventor Jacobus Gemen

Jacobus Gemen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Off-axis leveling in lithographic projection apparatus
    Patent number: 7019815
    Abstract: In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.
    Type: Grant
    Filed: October 29, 2004
    Date of Patent: March 28, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes C. M. Jasper, Erik R. Loopstra, Theodorus M. Modderman, Gerrit J. Nijmeijer, Nicolaas A. A. J. van Asten, Frederik T. E. Heuts, Jacobus Gemen, Richard J. H. Du Croo de Jongh, Marcus E. J. Boonman, Jacob F. F. Klinkhamer, Thomas J. M. Castenmiller
  • Off-axis levelling in lithographic projection apparatus
    Publication number: 20050157281
    Abstract: In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.
    Type: Application
    Filed: August 16, 2004
    Publication date: July 21, 2005
    Applicant: ASML Netherlands B.V.
    Inventors: Johannes Jasper, Erik Loopstra, Theodorus Modderman, Gerrit Nijmeijer, Nicholaas Van Asten, Frederik Heuts, Jacobus Gemen, Richard Du Croo De Jongh, Marcus Boonman, Jacob Klinkhamer, Thomas Castenmiller
  • Off-axis levelling in lithographic projection apparatus
    Publication number: 20040080737
    Abstract: In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.
    Type: Application
    Filed: October 17, 2003
    Publication date: April 29, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johannes Christiaan Maria Jasper, Erik Roelof Loopstra, Theodorus Marinus Modderman, Gerrit Johannes Nijmeijer, Nicholaas Antonius Allegondus Johannes Van Asten, Frederik Theodorus Elisabeth Heuts, Jacobus Gemen, Richard Johan Hendrik Du Croo De Jongh, Marcus Emile Joannes Boonman, Jacob Frederik Friso Klinkhamer, Thomas Josephus Maria Castenmiller
  • Off-axis levelling in lithographic projection apparatus
    Patent number: 6674510
    Abstract: In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.
    Type: Grant
    Filed: March 6, 2000
    Date of Patent: January 6, 2004
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes C. M. Jasper, Erik R. Loopstra, Theodorus M. Modderman, Gerrit J. Nijmeijer, Nicolaas A. A. J. van Asten, Frederik T. E. Heuts, Jacobus Gemen, Richard J. H. Du Croo de Jongh, Marcus E. J. Boonman, Jacob F. F. Klinkhamer, Thomas J. M. Castenmiller