Patents by Inventor Jacobus Johannus Leonardus Verspay

Jacobus Johannus Leonardus Verspay has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060186057
    Abstract: A method for filtering a fluid to obtain a fluid having a known purity is described. The fluid is filtered with a filtration system, and upstream of a final filtration stage of the filtration system, a purity of the fluid is measured. A purity of the fluid filtered by the filtration system is determined by correcting the measured purity with a filtration behavior of the final filtration stage. In an embodiment, the fluid comprises an ultra pure water for use as an immersion liquid in a lithographic apparatus.
    Type: Application
    Filed: February 22, 2005
    Publication date: August 24, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Martinus Verhagen, Roelof De Graaf, Johannes Henricus Jacobs, Hans Jansen, Marco Stavenga, Jacobus Johannus Leonardus Verspay
  • Publication number: 20060082746
    Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
    Type: Application
    Filed: October 18, 2004
    Publication date: April 20, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jeroen Johannes Mertens, Sjoerd Nicolaas Donders, Roelof De Graaf, Christiaan Hoogendam, Antonius Van Der Net, Franciscus Johannes Teunissen, Patricius Aloysius Tinnemans, Martinus Cornelis Verhagen, Jacobus Johannus Leonardus Verspay, Edwin Van Gompel
  • Publication number: 20050036121
    Abstract: In a lithographic projection apparatus, there is provided a liquid supply system comprising a container at least partly defining a space between the projection system and the substrate, the container having a selectively openable and closeable aperture therein, and a closure configured to selectively close and open the aperture. In an embodiment, the shutter may comprise a channel in a surface of the shutter facing the aperture and/or the shutter may be displaced from the liquid supply system when connected to the liquid supply system. Further, in a lithographic apparatus, there is provided a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between a projection system and a substrate and a controller configured to control application to the projection system of a force related to a weight transfer attributable to a member of the liquid supply system.
    Type: Application
    Filed: April 26, 2004
    Publication date: February 17, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Christiaan Hoogendam, Sjoerd Donders, Hans Jansen, Jacobus Johannus Leonardus Verspay, Antonius Theodorus Derksen, Joeri Lof, Erik Loopstra, Johannes Catharinus Mulkens, Alexander Straaijer, Bob Streefkerk