Patents by Inventor Jacobus Johannus Verspay

Jacobus Johannus Verspay has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Publication number: 20060119809
    Abstract: A lithographic apparatus is disclosed wherein a liquid supply system is configured to at least partly fill a region between a substrate and a projection system of the lithographic apparatus with a liquid and having a liquid confinement structure fixed in a plane substantially perpendicular to an optical axis of the projection system and configured to cooperate with a substrate table configured to hold the substrate in order to restrict the liquid to a region above an upper surface of the substrate table so that a side of the substrate to be exposed is substantially covered in the liquid during exposure.
    Type: Application
    Filed: December 7, 2004
    Publication date: June 8, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Martinus Cornelis Maria Verhagen, Hans Jansen, Marco Stavenga, Jacobus Johannus Verspay