Patents by Inventor Jacque E. Ludman

Jacque E. Ludman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5416587
    Abstract: The Index Interferometric Instrument is a highly accurate instrument which can be utilized to measure the index of refraction, the dispersion, and the index profile of materials. The instrument provides the data necessary to measure the index of refraction of materials to five significant figures. The index profile can be measured at any chosen wavelength without any sample preparation. The instrument utilizes a 10 nm to a 400 nm bandwidth light source and a light source with a bandwidth of less than 10 nm in combination with an interferometer. Each light source creates interference patterns from the sample and a reference mirror which can be used to accurately calculate the index of refraction of an entire sample at any given point on the sample.
    Type: Grant
    Filed: July 9, 1993
    Date of Patent: May 16, 1995
    Assignee: Northeast Photosciences
    Inventors: Juanita R. Riccobono, Jacque E. Ludman