Patents by Inventor Jacqueline Fidanza

Jacqueline Fidanza has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9499578
    Abstract: Methods for fabricating dense arrays of polymeric molecules in a highly multiplexed manner are provided using semiconductor-processing-derived lithographic methods. Advantageously, the methods are adaptable to the synthesis of a variety of polymeric compounds. For example, arrays of branched peptides and polymers joined by peptide bonds may be fabricated in a highly multiplexed manner.
    Type: Grant
    Filed: June 4, 2008
    Date of Patent: November 22, 2016
    Assignee: Intel Corporation
    Inventors: John J. Rajasekaran, Edelmira Cabezas, Jacqueline A. Fidanza, Gunjan Tiwari
  • Patent number: 8366973
    Abstract: An ink for forming CIGS photovoltaic cell active layers is disclosed along with methods for making the ink, methods for making the active layers and a solar cell made with the active layer. The ink contains a mixture of nanoparticles of elements of groups IB, IIIA and (optionally) VIA. The particles are in a desired particle size range of between about 1 nm and about 500 nm in diameter, where a majority of the mass of the particles comprises particles ranging in size from no more than about 40% above or below an average particle size or, if the average particle size is less than about 5 nanometers, from no more than about 2 nanometers above or below the average particle size. The use of such ink avoids the need to expose the material to an H2Se gas during the construction of a photovoltaic cell and allows more uniform melting during film annealing, more uniform intermixing of nanoparticles, and allows higher quality absorber films to be formed.
    Type: Grant
    Filed: October 31, 2007
    Date of Patent: February 5, 2013
    Assignee: Nanosolar, Inc
    Inventors: Dong Yu, Jacqueline Fidanza, Brian M. Sager
  • Patent number: 8257788
    Abstract: Nanostructured layers with 10 nm to 50 nm pores spaced 10-50 nm apart, a method for making such nanostructured layers, optoelectronic devices having such nanostructured layers and uses for such nanostructured layers are disclosed. The nanostructured layer can be formed using precursor sol, which generally includes one or more covalent metal complexes, one or more surfactants, a solvent, one or more optional condensation inhibitors, and (optionally) water. Evaporating the solvent from the precursor sol forms a surfactant-templated film. Covalently crosslinking the surfactant-templated film forms a nanostructured porous layer. Pore size is controlled, e.g., by appropriate solvent concentration, choice of surfactant, use of chelating agents, use of swelling agents or combinations of these.
    Type: Grant
    Filed: December 21, 2009
    Date of Patent: September 4, 2012
    Assignee: Nanosolar, Inc.
    Inventors: Jacqueline Fidanza, Brian M. Sager, Martin R. Roscheisen, Dong Yu, Gina J. Gerritzen
  • Patent number: 8206616
    Abstract: An ink for forming CIGS photovoltaic cell active layers is disclosed along with methods for making the ink, methods for making the active layers and a solar cell made with the active layer. The ink contains a mixture of nanoparticles of elements of groups IB, IIIA and (optionally) VIA. The particles are in a desired particle size range of between about 1 nm and about 500 nm in diameter, where a majority of the mass of the particles comprises particles ranging in size from no more than about 40% above or below an average particle size or, if the average particle size is less than about 5 nanometers, from no more than about 2 nanometers above or below the average particle size. The use of such ink avoids the need to expose the material to an H2Se gas during the construction of a photovoltaic cell and allows more uniform melting during film annealing, more uniform intermixing of nanoparticles, and allows higher quality absorber films to be formed.
    Type: Grant
    Filed: October 31, 2007
    Date of Patent: June 26, 2012
    Assignee: Nanosolar, Inc.
    Inventors: Dong Yu, Jacqueline Fidanza, Brian M. Sager
  • Patent number: 8182721
    Abstract: An ink for forming CIGS photovoltaic cell active layers is disclosed along with methods for making the ink, methods for making the active layers and a solar cell made with the active layer. The ink contains a mixture of nanoparticles of elements of groups IB, IIIA and (optionally) VIA. The particles are in a desired particle size range of between about 1 nm and about 500 nm in diameter, where a majority of the mass of the particles comprises particles ranging in size from no more than about 40% above or below an average particle size or, if the average particle size is less than about 5 nanometers, from no more than about 2 nanometers above or below the average particle size. The use of such ink avoids the need to expose the material to an H2Se gas during the construction of a photovoltaic cell and allows more uniform melting during film annealing, more uniform intermixing of nanoparticles, and allows higher quality absorber films to be formed.
    Type: Grant
    Filed: October 31, 2007
    Date of Patent: May 22, 2012
    Assignee: Nanosolar, Inc.
    Inventors: Dong Yu, Jacqueline Fidanza, Brian M. Sager
  • Patent number: 8182720
    Abstract: An ink for forming CIGS photovoltaic cell active layers is disclosed along with methods for making the ink, methods for making the active layers and a solar cell made with the active layer. The ink contains a mixture of nanoparticles of elements of groups IB, IIIA and (optionally) VIA. The particles are in a desired particle size range of between about 1 nm and about 500 nm in diameter, where a majority of the mass of the particles comprises particles ranging in size from no more than about 40% above or below an average particle size or, if the average particle size is less than about 5 nanometers, from no more than about 2 nanometers above or below the average particle size. The use of such ink avoids the need to expose the material to an H2Se gas during the construction of a photovoltaic cell and allows more uniform melting during film annealing, more uniform intermixing of nanoparticles, and allows higher quality absorber films to be formed.
    Type: Grant
    Filed: October 31, 2007
    Date of Patent: May 22, 2012
    Assignee: Nanosolar, Inc.
    Inventors: Dong Yu, Jacqueline Fidanza, Brian M. Sager
  • Patent number: 8178384
    Abstract: An optoelectronic apparatus, a method for making the apparatus, and the use of the apparatus in an optoelectronic device are disclosed. The apparatus may include an active layer having a nanostructured network layer with a network of regularly spaced structures with spaces between neighboring structures. One or more network-filling materials are disposed in the spaces. At least one of the network-filling materials has complementary charge transfer properties with respect to the nanostructured network layer. An interfacial layer, configured to enhance an efficiency of the active layer, is disposed between the nanostructured network layer and the network-filling materials. The interfacial layer may be configured to provide (a) charge transfer between the two materials that exhibits different rates for forward versus backward transport; (b) differential light absorption to extend a range of wavelengths that the active layer can absorb; or (c) enhanced light absorption, which may be coupled with charge injection.
    Type: Grant
    Filed: March 10, 2009
    Date of Patent: May 15, 2012
    Assignee: Nanosolar, Inc.
    Inventors: Martin R. Roscheisen, Brian M. Sager, Klaus Petritsch, Jacqueline Fidanza
  • Patent number: 8168089
    Abstract: An ink for forming CIGS photovoltaic cell active layers is disclosed along with methods for making the ink, methods for making the active layers and a solar cell made with the active layer. The ink contains a mixture of nanoparticles of elements of groups IB, IIIA and (optionally) VIA. The particles are in a desired particle size range of between about 1 nm and about 500 nm in diameter, where a majority of the mass of the particles comprises particles ranging in size from no more than about 40% above or below an average particle size or, if the average particle size is less than about 5 nanometers, from no more than about 2 nanometers above or below the average particle size. The use of such ink avoids the need to expose the material to an H2Se gas during the construction of a photovoltaic cell and allows more uniform melting during film annealing, more uniform intermixing of nanoparticles, and allows higher quality absorber films to be formed.
    Type: Grant
    Filed: October 31, 2007
    Date of Patent: May 1, 2012
    Assignee: Nanosolar, Inc.
    Inventors: Dong Yu, Jacqueline Fidanza, Brian M. Sager
  • Patent number: 8088309
    Abstract: An ink for forming CIGS photovoltaic cell active layers is disclosed along with methods for making the ink, methods for making the active layers and a solar cell made with the active layer. The ink contains a mixture of nanoparticles of elements of groups IB, IIIA and (optionally) VIA. The particles are in a desired particle size range of between about 1 nm and about 500 nm in diameter, where a majority of the mass of the particles comprises particles ranging in size from no more than about 40% above or below an average particle size or, if the average particle size is less than about 5 nanometers, from no more than about 2 nanometers above or below the average particle size. The use of such ink avoids the need to expose the material to an H2Se gas during the construction of a photovoltaic cell and allows more uniform melting during film annealing, more uniform intermixing of nanoparticles, and allows higher quality absorber films to be formed.
    Type: Grant
    Filed: October 31, 2007
    Date of Patent: January 3, 2012
    Assignee: Nanosolar, Inc.
    Inventors: Dong Yu, Jacqueline Fidanza, Brian M. Sager
  • Patent number: 8038909
    Abstract: An ink for forming CIGS photovoltaic cell active layers is disclosed along with methods for making the ink, methods for making the active layers and a solar cell made with the active layer. The ink contains a mixture of nanoparticles of elements of groups IB, IIIA and (optionally) VIA. The particles are in a desired particle size range of between about 1 nm and about 500 nm in diameter, where a majority of the mass of the particles comprises particles ranging in size from no more than about 40% above or below an average particle size or, if the average particle size is less than about 5 nanometers, from no more than about 2 nanometers above or below the average particle size. The use of such ink avoids the need to expose the material to an H2Se gas during the construction of a photovoltaic cell and allows more uniform melting during film annealing, more uniform intermixing of nanoparticles, and allows higher quality absorber films to be formed.
    Type: Grant
    Filed: October 31, 2007
    Date of Patent: October 18, 2011
    Assignee: Nanosolar, Inc.
    Inventors: Dong Yu, Jacqueline Fidanza, Brian M. Sager
  • Publication number: 20100267189
    Abstract: An ink for forming CIGS photovoltaic cell active layers is disclosed along with methods for making the ink, methods for making the active layers and a solar cell made with the active layer. The ink contains a mixture of nanoparticles of elements of groups IB, IIIA and (optionally) VIA. The particles are in a desired particle size range of between about 1 nm and about 500 nm in diameter, where a majority of the mass of the particles comprises particles ranging in size from no more than about 40% above or below an average particle size or, if the average particle size is less than about 5 nanometers, from no more than about 2 nanometers above or below the average particle size. The use of such ink avoids the need to expose the material to an H2Se gas during the construction of a photovoltaic cell and allows more uniform melting during film annealing, more uniform intermixing of nanoparticles, and allows higher quality absorber films to be formed.
    Type: Application
    Filed: February 15, 2010
    Publication date: October 21, 2010
    Inventors: Dong Yu, Jacqueline Fidanza, Brian M. Sager
  • Publication number: 20100166954
    Abstract: Nanostructured layers with 10 nm to 50 nm pores spaced 10-50 nm apart, a method for making such nanostructured layers, optoelectronic devices having such nanostructured layers and uses for such nanostructured layers are disclosed. The nanostructured layer can be formed using precursor sol, which generally includes one or more covalent metal complexes, one or more surfactants, a solvent, one or more optional condensation inhibitors, and (optionally) water. Evaporating the solvent from the precursor sol forms a surfactant-templated film. Covalently crosslinking the surfactant-templated film forms a nanostructured porous layer. Pore size is controlled, e.g., by appropriate solvent concentration, choice of surfactant, use of chelating agents, use of swelling agents or combinations of these.
    Type: Application
    Filed: December 21, 2009
    Publication date: July 1, 2010
    Inventors: Jacqueline Fidanza, Brian M. Sager, Martin R. Roscheisen, Dong Yu, Gina J. Gerritzen
  • Patent number: 7663057
    Abstract: An ink for forming CIGS photovoltaic cell active layers is disclosed along with methods for making the ink, methods for making the active layers and a solar cell made with the active layer. The ink contains a mixture of nanoparticles of elements of groups IB, IIIA and (optionally) VIA. The particles are in a desired particle size range of between about 1 nm and about 500 nm in diameter, where a majority of the mass of the particles comprises particles ranging in size from no more than about 40% above or below an average particle size or, if the average particle size is less than about 5 nanometers, from no more than about 2 nanometers above or below the average particle size. The use of such ink avoids the need to expose the material to an H2Se gas during the construction of a photovoltaic cell and allows more uniform melting during film annealing, more uniform intermixing of nanoparticles, and allows higher quality absorber films to be formed.
    Type: Grant
    Filed: February 19, 2004
    Date of Patent: February 16, 2010
    Assignee: Nanosolar, Inc.
    Inventors: Dong Yu, Jacqueline Fidanza, Martin R. Roscheisen, Brian M. Sager
  • Patent number: 7645934
    Abstract: Nanostructured layers with 10 nm to 50 nm pores spaced 10-50 nm apart, a method for making such nanostructured layers, optoelectronic devices having such nanostructured layers and uses for such nanostructured layers are disclosed. The nanostructured layer can be formed using precursor sol, which generally includes one or more covalent metal complexes, one or more surfactants, a solvent, one or more optional condensation inhibitors, and (optionally) water. Evaporating the solvent from the precursor sol forms a surfactant-templated film. Covalently crosslinking the surfactant-templated film forms a nanostructured porous layer. Pore size is controlled, e.g., by appropriate solvent concentration, choice of surfactant, use of chelating agents, use of swelling agents or combinations of these.
    Type: Grant
    Filed: April 29, 2003
    Date of Patent: January 12, 2010
    Assignee: Nanosolar, Inc.
    Inventors: Jacqueline Fidanza, Brian M. Sager, Martin R. Roscheisen, Dong Yu, Gina J. Gerritzen
  • Publication number: 20090258796
    Abstract: Methods for fabricating dense arrays of polymeric molecules in a highly multiplexed manner are provided using semiconductor-processing-derived lithographic methods. Advantageously, the methods are adaptable to the synthesis of a variety of polymeric compounds. For example, arrays of branched peptides and polymers joined by peptide bonds may be fabricated in a highly multiplexed manner.
    Type: Application
    Filed: June 4, 2008
    Publication date: October 15, 2009
    Inventors: John J. Rajasekaran, Edelmira Cabezas, Jacqueline A. Fidanza, Gunjan Tiwari
  • Patent number: 7511217
    Abstract: An optoelectronic apparatus, a method for making the apparatus, and the use of the apparatus in an optoelectronic device are disclosed. The apparatus may include an active layer having a nanostructured network layer with a network of regularly spaced structures with spaces between neighboring structures. One or more network-filling materials are disposed in the spaces. At least one of the network-filling materials has complementary charge transfer properties with respect to the nanostructured network layer. An interfacial layer, configured to enhance an efficiency of the active layer, is disposed between the nanostructured network layer and the network-filling materials. The interfacial layer may be configured to provide (a) charge transfer between the two materials that exhibits different rates for forward versus backward transport; (b) differential light absorption to extend a range of wavelengths that the active layer can absorb; or (c) enhanced light absorption, which may be coupled with charge injection.
    Type: Grant
    Filed: April 19, 2003
    Date of Patent: March 31, 2009
    Assignee: Nanosolar, Inc.
    Inventors: Martin R. Roscheisen, Brian M. Sager, Klaus Petritsch, Jacqueline Fidanza
  • Publication number: 20080318808
    Abstract: Methods for fabricating dense arrays of polymeric molecules in a highly multiplexed manner are provided using semiconductor-processing-derived lithographic methods. Advantageously, the methods are adaptable to the synthesis of a variety of polymeric compounds. For example, arrays of branched peptides and polymers joined by peptide bonds may be fabricated in a highly multiplexed manner.
    Type: Application
    Filed: June 4, 2008
    Publication date: December 25, 2008
    Inventors: John J. Rajasekaran, Edelmira Cabezas, Jacqueline Fidanza, Gunjan Tiwari
  • Publication number: 20080242561
    Abstract: Methods for fabricating dense arrays of polymeric molecules in a highly multiplexed manner are provided using semiconductor-processing-derived lithographic methods. Advantageously, the methods are adaptable to the synthesis of a variety of polymeric compounds. For example, arrays of branched peptides and polymers joined by peptide bonds may be fabricated in a highly multiplexed manner.
    Type: Application
    Filed: June 4, 2008
    Publication date: October 2, 2008
    Inventors: John J. Rajasekaran, Edelmira Cabezas, Jacqueline A. Fidanza, Gunjan Tiwari
  • Publication number: 20080213467
    Abstract: An ink for forming CIGS photovoltaic cell active layers is disclosed along with methods for making the ink, methods for making the active layers and a solar cell made with the active layer. The ink contains a mixture of nanoparticles of elements of groups IB, IIIA and (optionally) VIA. The particles are in a desired particle size range of between about 1 nm and about 500 nm in diameter, where a majority of the mass of the particles comprises particles ranging in size from no more than about 40% above or below an average particle size or, if the average particle size is less than about 5 nanometers, from no more than about 2 nanometers above or below the average particle size. The use of such ink avoids the need to expose the material to an H2Se gas during the construction of a photovoltaic cell and allows more uniform melting during film annealing, more uniform intermixing of nanoparticles, and allows higher quality absorber films to be formed.
    Type: Application
    Filed: October 31, 2007
    Publication date: September 4, 2008
    Inventors: Dong Yu, Jacqueline Fidanza, Brian M. Sager
  • Publication number: 20080161202
    Abstract: A method for selective regulation of a background surface property of an array by adding a first building block molecule capable of forming a nucleotide or an amino acid bond on the spot and the background surface, adding a first protecting group to protect the first building block molecule on the spot and adding a second protecting group to protect the first building block molecule on the background surface, wherein the first protecting group is different from the second protecting group is disclosed. An array comprising a substrate comprising a substrate surface comprising a branched molecule wherein one end of branched molecule is attached to the substrate surface and the other end has many branches, further comprising a spacer in the branches to spread the branches and fluorophore molecules attached to the branches such that an average spacing between two fluorophore molecules is greater than 10 nm is disclosed.
    Type: Application
    Filed: December 29, 2006
    Publication date: July 3, 2008
    Inventors: Edelmira Cabezas, Gunjan Tiwari, Jacqueline A. Fidanza, Yuan Gao