Abstract: The disclosure includes a coaxial microwave applicator for plasma production, including a coaxial tube formed by a central core and an outer conductor separated from the central core by an annular space allowing propagation of microwaves. The applicator includes: a cylindrical permanent magnet disposed at the end of the central core; and at least one annular permanent magnet disposed at the end of the outer conductor, all of the magnets disposed at the end of the coaxial tube having the same direction of magnetization. The magnetization of the magnets forms a magnetic field suitable for generating, in a zone away from the end of the applicator, an electronic cyclotronic resonance coupling with the electric microwave field of the applicator. The external radius and the magnetization of the annular magnet are selected such that the magnetic field lines generated by the magnets pass through the coupling zone in a direction substantially parallel to the axis of the applicator.

Abstract: The disclosure includes a glow-discharge lamp including: an elongate casing transparent to illuminating radiation and containing a plasma gas; a device for applying an electric field for maintaining a plasma in the so-called positive column region of the casing, the device including two electrodes forming an anode and a cathode located in the casing at each end thereof; and a radio-frequency or microwave cathode plasma source arranged in the casing in relation to the cathode-forming electrode, such as to generate a high-frequency discharge located on the surface of the electrode in order to generate the plasma. The disclosure also includes a lighting method of such a glow-discharge lamp.

Abstract: The disclosure includes a coaxial microwave applicator for plasma production, including a coaxial tube formed by a central core and an outer conductor separated from the central core by an annular space allowing propagation of microwaves. The applicator includes: a cylindrical permanent magnet disposed at the end of the central core; and at least one annular permanent magnet disposed at the end of the outer conductor, all of the magnets disposed at the end of the coaxial tube having the same direction of magnetisation. The magnetisation of the magnets forms a magnetic field suitable for generating, in a zone away from the end of the applicator, an electronic cyclotronic resonance coupling with the electric microwave field of the applicator. The external radius and the magnetisation of the annular magnet are selected such that the magnetic field lines generated by the magnets pass through the coupling zone in a direction substantially parallel to the axis of the applicator.

Abstract: The disclosure includes a glow-discharge lamp including: an elongate casing transparent to illuminating radiation and containing a plasma gas; a device for applying an electric field for maintaining a plasma in the so-called positive column region of the casing, the device including two electrodes forming an anode and a cathode located in the casing at each end thereof; and a radio-frequency or microwave cathode plasma source arranged in the casing in relation to the cathode-forming electrode, such as to generate a high-frequency discharge located on the surface of the electrode in order to generate the plasma. The disclosure also includes a lighting method of such a glow-discharge lamp.

Abstract: The invention relates to a device for producing and/or confining a plasma, said device comprising a chamber in the space of which the plasma is produced and/or confined, said chamber including a wall defining a housing inside the chamber and encompassing said space, wherein said device is characterized in that it comprises at least one assembly for producing and/or confining plasma, each assembly being composed of magnets having only an axial magnetization direction and being recessed in the wall defining the housing, so that the magnetization direction of all the magnets defining each assembly is substantially perpendicular to the housing defined by the wall and so that the assembly is substantially symmetrical to the housing, wherein the magnetic field lines do not extend through the wall of the chamber. The invention also relates to a method for producing and/or confining a plasma.

Abstract: The invention concerns a device for producing and/or confining a plasma (10), comprising a recipient (13) within the volume of which the plasma is produced or confined, wherein said recipient comprises a wall (1) defining a lining (15) at the inside of the recipient and encompassing the volume, characterized in that it comprises at least one annular magnet (30), centered around a normal (14) with respect to the lining, having radial magnetization direction, such that the magnetization direction is significantly perpendicular to said normal to the lining. The invention also concerns a method for producing and/or confining a plasma.

Abstract: The invention relates to a device for producing and/or confining a plasma (10), said device comprising a chamber (13) in the space of which the plasma is produced and/or confined, said chamber (13) including a wall (1) defining a housing (15) inside the chamber (15) and encompassing said space, wherein said device is characterised in that it comprises at least one assembly (30) for producing and/or confining plasma, each assembly (30) being composed of magnets (3) having only an axial magnetisation direction and being recessed in the wall (1) defining the housing, so that the magnetisation direction of all the magnets (3) defining each assembly (30) is substantially perpendicular to the housing (15) defined by the wall (1) and so that the assembly (30) is substantially symmetrical to the housing, wherein the magnetic field lines (5) do not extend through the wall (1) of the chamber. The invention also relates to a method for producing and/or confining a plasma.

Abstract: The invention concerns a source supplying an adjustable energy electron beam, comprising a plasma chamber (P) consisting of an enclosure (1) having an inner surface of a first value (S1) and an extraction gate (2) having a surface of a second value (S2), the gate potential being different from that of the enclosure and adjustable. The invention is characterized in that the plasma is excited and confined in multipolar or multidipolar magnetic structures, the ratio of the second value (S2) over the first value (S1) being close to: D=1/? ?2?me/mi exp (?½), wherein: ? is the proportion of electrons of the plasma P, me the electron mass, and mi is the mass of positively charged ions.

Abstract: The invention concerns a device for producing and/or confining a plasma (10), comprising a recipient (13) within the volume of which the plasma is produced or confined, wherein said recipient comprises a wall (1) defining a lining (15) at the inside of the recipient and encompassing the volume, characterized in that it comprises at least one annular magnet (30), centered around a normal (14) with respect to the lining, having radial magnetization direction, such that the magnetization direction is significantly perpendicular to said normal to the lining. The invention also concerns a method for producing and/or confining a plasma.

Abstract: The method comprises the following steps: preparing a sheet having thickness of 5 ?m to a few tens of micrometers, suitable for being etched by a lithographic operation; making a mask on a face of the sheet, the mask presenting etching selectivity S of at least 5; depositing a layer of photosensitive resin on the mask; making through holes in the layer of resin by photolithography; etching through the mask via the pores in the layer of resin; and anisotropically etching through the sheet from the pores in the mask in order to make pores in the sheet having an aspect ratio greater than 5. The invention is applicable to fabricating micron and sub-micron filters.

Abstract: The invention relates to a device for the production of a plasma (16) within a housing comprising means for the generation of energy in the microwave spectrum, for the excitation of the plasma, said means comprise at least one basic plasma excitation device with a coaxial applicator (4) of microwave energy, one of the ends of which is connected to a production source (7) of microwave energy, the other end (8) of which is directed to the gas to be excited within the housing. The device is characterised in that each basic plasma excitation device is arranged in the wall (3) of the housing, each applicator (4) having a central core (5) which is essentially flush with the wall of the housing. The central core and the thickness of the wall (3) of the housing are separated by a space (6) coaxial to the central core, said space being totally filled, at least at the end of each applicator, by a dielectric material (14), such that said material is essentially flush with the level of the wall of the housing.

Abstract: A device of a plasma (5) for confinement of a plasma within a housing (1), comprising creation means for creating a magnetic field, said means being a series of permanent magnets (3) for creation of a magnetic field presenting an alternating multi-polar magnetic structure to the plasma and the magnets (3) restrict the plasma to a large volume, the magnets begin distributed in a discontinuous around the volume end said magnets (3) arc discharge, a distance within the housing at a separation from the walls of the housing by means of support shafts (4). The changes above have been provided to improve the clarification of the claim language and claims have been amended to correct a typographical error. Since the changes are minor and are intended merely to improve the legibility of the claims, obtaining authorization from application was not viewed as necessary.

Abstract: The method comprises the following steps: preparing a sheet having thickness of 5 ?m to a few tens of micrometers, suitable for being etched by a lithographic operation; making a mask on a face of the sheet, the mask presenting etching selectivity S of at least 5; depositing a layer of photosensitive resin on the mask; making through holes in the layer of resin by photolithography; etching through the mask via the pores in the layer of resin; and anisotropically etching through the sheet from the pores in the mask in order to make pores in the sheet having an aspect ratio greater than 5. The invention is applicable to fabricating micron and sub-micron filters.

Abstract: The invention relates to a device for the production of a plasma (16) within a housing comprising means for the generation of energy in the microwave spectrum, for the excitation of the plasma, said means comprise at least one basic plasma excitation device with a coaxial applicator (4) of microwave energy, one of the ends of which is connected to a production source (7) of microwave energy, the other end (8) of which is directed to the gas to be excited within the housing. The device is characterised in that each basic plasma excitation device is arranged in the wall (3) of the housing, each applicator (4) having a central core (5) which is essentially flush with the wall of the housing. The central core and the thickness of the wall (3) of the housing are separated by a space (6) coaxial to the central core, said space being totally filled, at least at the end of each applicator, by a dielectric material (14), such that said material is essentially flush with the level of the wall of the housing.

Abstract: A spent anode is replaced with a new anode in an electrolysis cell having an anode bus bar and an anode rod contacting the bus bar. A desired distance (D4) from the bus bar to a reference point on or adjacent to an anode rod for the new anode is calculated, the spent anode is replaced with a new anode so that the reference point on the new anode rod is spaced from the bus bar by an actual distance (D5), and the actual distance (D5) is measured at least once by means of a vision system. The actual distance (D5) is preferably adjusted using a feedback control loop in a computer so that D5 approaches the desired distance (D4).

Abstract: The invention relates to a device for confinement of a plasma (5) within a housing (1), comprising means for creating a magnetic field, said means being a series of permanent magnets (3) for creation of a magnetic field presenting an alternating multi-polar magnetic structure to the plasma. The invention is characterised in that the magnets (3) restrict the plasma to a large volume, the magnets begin distributed in a discontinuous manner around the volume and said magnets (3) are arranged within the housing at a separation from the walls of the housing by means of support shafts (4).

Abstract: The invention concerns a plasma display device-comprising in a screen a chamber (17) containing a discharge gas capable of being excited to generate, alone or in combination with luminophor means (18) themselves designed to be excited by a radiation emitted by said gas, a visible light. The device comprises means for generating on one side of said chamber (17) a uniformly distributed electric field (E) designed to ignite a plasma in the gas, as well as a matrix of controllable elements (19) and means controlling said elements (19) so that they modulate individually the electric field (E) or the radiation emitted by the plasma or the generated visible light thereby generating selectively luminous zones on the screen.

Abstract: The invention concerns a source supplying an adjustable energy electron beam, comprising a plasma chamber (P) consisting of an enclosure (1) having an inner surface of a first value (S1) and an extraction gate (2) having a surface of a second value (S2), the gate potential being different from that of the enclosure and adjustable. The invention is characterized in that the plasma is excited and confined in multipolar or multidipolar magnetic structures, the ratio of the second value (S2) over the first value (S1) being close to: D=1/? {square root}2?cme/mi exp (?½), wherein: ? is the proportion of electrons of the plasma P, me the electron mass, and mi is the mass of positively charged ions.

Abstract: A spent anode is replaced with a new anode in an electrolysis cell having an anode bus bar and an anode rod contacting the bus bar. A desired distance (D4) from the bus bar to a reference point on or adjacent to an anode rod for the new anode is calculated, the spent anode is replaced with a new anode so that the reference point on the new anode rod is spaced from the bus bar by an actual distance (D5), and the actual distance (D5) is measured at least once by means of a vision system. The actual distance (D5) is preferably adjusted using a feedback control loop in a computer so that D5 approaches the desired distance (D4).

Abstract: The invention concerns a system including a microwave generator and a rectangular guide connected with the generator. The system is adapted to operate in fundamental (H10) or transverse electrical (TE10) mode, and associated with means providing a standing wave pattern. The system also includes many power connectors arranged in the guide at zones of maximum amplitude for one of the components of the electromagnetic field for splitting the generator power. The power connectors are adjusted so that the sum of their reduced admittance levels brought to the splitter input formed by the guide is in a single unit and many sources, respectively connected to a connector of the guide, via insulating means ensuring a power transmission of the connector to the source without reflecting towards the connector and a device adapting impedance of each source, located downstream of the insulating means, between the latter and associated source.