Abstract: An integrated self-firing thyristor structure which comprises a main thyristor having a first emitter portion, a main base, a first inhibition base provided with a bore, a second emitter portion, an auxiliary thyristor using said first emitter portion and said main base and having a second inhibition base which extends in said bore and is insulated therefrom, and a third emitter portion, a conductive element connecting said first inhibition base to said third emitter portion and switching means connected between said conductive element, said second emitter portion and said second inhibition base so that the self-switching-on function of the integrated thyristor can be inhibited by said switching means.

Abstract: The channel region and gate region of a junction-type field-effect transistor have substantially the same outline and can be produced by successive implantation through the same mask. A highly doped contact zone ensures an ohmic connection between this gate region and the other portion of the gate formed by the part of the layer situated below the channel region. Such a transistor may have a low threshold voltage while being comparatively easy to manufacture, for example, in an integrated circuit with bipolar transistors. The contact zone may be formed simultaneously with a bipolar transistor emitter zone.