Abstract: A processing apparatus comprising a chamber including a process space therein, a lower electrode disposed inside the chamber, an upper electrode structure disposed above the lower electrode to face the lower electrode, and an annular baffle plate disposed to surround the process space, wherein the annular baffle plate includes a first arc region and a second arc region which are disposed adjacent to each other along an annular arc and do not overlap each other, the first arc region includes a plurality of first slots, and the second arc region includes a plurality of second slots, and a first aperture ratio occupied by the first slots in the first arc region is different from a second aperture ratio occupied by the second slots in the second arc region.

Abstract: A universal sideshield attachment for eyeglasses which comprises a central supporting member attachable to the eyeglasses by clips which fit over the bridge of the eyeglasses and engage the lenses thereof. First and second telescoping members are slidably received in first and second passage ways located within the central supporting member. First and second sideshields are respectively connected to the first and second telescoping members. The first and second telescoping members are movable within the respective passageways so that the distance between the eye shields can be adjusted to the width between the temples of the eyeglasses. Each sideshield is pivotably attached to its respective telescoping member to enable a more optimum fit between the sideshields and the temples to be achieved.