Patents by Inventor Jae Boo KIM

Jae Boo KIM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230278685
    Abstract: The present invention relates to a controllable pitch propeller capable of changing a blade pitch according to the sailing conditions of a ship and, specifically, to a controllable pitch propeller having an optimal hub-to-tip diameter ratio, the propeller being capable of reducing the size of a hub so as to have a high efficiency that is close to the propulsion efficiency of a fixed pitch propeller (FPP). In order to accomplish the aforementioned objective, the present invention relates a controllable pitch propeller which comprises a hub mounted at the propelling shaft of a ship, and a blade that is mounted at the circumference of the hub and that has a variable pitch, and which is technically characterized by a H/D ratio, of diameter (H) of the propeller and diameter (D) of the hub, of 0.170-0.2.
    Type: Application
    Filed: May 17, 2021
    Publication date: September 7, 2023
    Applicants: Korea Shipbuilding & Offshore Engineering Co., Ltd., Hyundai Heavy Industries Co., Ltd.
    Inventors: Jae Boo Kim, Chan Kyu Choi, Sung Hoon Kim, Kil Hwan Moon, Do Wan Kim, Gwan Hee Son
  • Patent number: 10892171
    Abstract: A removal apparatus for removing residual gases and a substrate treating facility for removing residual gases is disclosed. The residual gas removal apparatus includes a housing, a gas supply for providing a non-reactive gas into the housing, a supporting member provided to support a substrate and positioned in the housing, a heat radiating member spaced apart from the supporting member and positioned in the housing, and a heating unit for providing heat toward the supporting member and positioned between the heat radiating member and the supporting member.
    Type: Grant
    Filed: December 30, 2017
    Date of Patent: January 12, 2021
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Heokjae Lee, Hahn Park, Jae Boo Kim, Dongil Yoon, MinYoung Hwang, Se Un Park, Kang-Min Park, Yongjoon Hong, Sung Baek Kim, Woo Jin Park
  • Publication number: 20180247836
    Abstract: A removal apparatus for removing residual gases and a substrate treating facility for removing residual gases is disclosed. The residual gas removal apparatus includes a housing, a gas supply for providing a non-reactive gas into the housing, a supporting member provided to support a substrate and positioned in the housing, a heat radiating member spaced apart from the supporting member and positioned in the housing, and a heating unit for providing heat toward the supporting member and positioned between the heat radiating member and the supporting member.
    Type: Application
    Filed: December 30, 2017
    Publication date: August 30, 2018
    Inventors: Heokjae LEE, Hahn PARK, Jae Boo KIM, Dongil YOON, MinYoung HWANG, Se Un PARK, Kang-Min PARK, Yongjoon HONG, Sung Baek KIM, Woo Jin PARK