Patents by Inventor Jae Chang Chung

Jae Chang Chung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Solution composition for removing a remaining photoresist resin
    Patent number: 7056872
    Abstract: Cleaning solutions for removing photoresist resins remaining on the underlying layer patterns formed by photolithography process using the photoresist patterns as etching mask. The cleaning solution for removing photoresist comprises H2O as solvent, amine compounds, hydrazine hydrate, transition metal-removing material and alkali metal-removing material. Photoresist coated on the top portion of underlying layers can be rapidly and effectively removed by the disclosed cleaning solution. In addition, the cleaning solution is environment-friendly because H2O is used as the solvent, and has little effect on metal layers when underlying layers are formed of metals.
    Type: Grant
    Filed: September 23, 2002
    Date of Patent: June 6, 2006
    Assignee: Hynix Semiconductor Inc.
    Inventors: Geun Su Lee, Jae Chang Chung, Ki Soo Shin, Kee Joon Oh
  • Solution composition for removing a remaining photoresist resin
    Publication number: 20030060382
    Abstract: Cleaning solutions for removing photoresist resins remaining on the underlying layer patterns formed by photolithography process using the photoresist patterns as etching mask. The cleaning solution for removing photoresist comprises H2O as solvent, amine compounds, hydrazine hydrate, transition metal-removing material and alkali metal-removing material. Photoresist coated on the top portion of underlying layers can be rapidly and effectively removed by the disclosed cleaning solution. In addition, the cleaning solution is environment-friendly because H2O is used as the solvent, and has little effect on metal layers when underlying layers are formed of metals.
    Type: Application
    Filed: September 23, 2002
    Publication date: March 27, 2003
    Applicant: HYNIX SEMICONDUCTOR INC.
    Inventors: Geun Su Lee, Jae Chang Chung, Ki Soo Shin, Kee Joon Oh