Abstract: Provided is a method for synthesizing bipyridine that includes performing a dimerization reaction of a reactant including a piperidine-based compound, a pyridine-based compound, or a mixture thereof in the presence of a catalyst in which an active metal is supported on a composite metal oxide support including silica (SiO2) and alumina (Al2O3).

Abstract: An anomaly data detecting method performed by a computing device having at least one processor includes acquiring first time-series data, dividing the first time-series data into a plurality of sub time-series data, adjusting scales of variable values included in at least one sub time-series data among the plurality of sub time-series data and determining whether the first time-series data is abnormal by inputting scaled first time-series data to a neural network based detection model.

Abstract: An anomaly data detecting method performed by a computing device having at least one processor includes acquiring first time-series data, dividing the first time-series data into a plurality of sub time-series data, adjusting scales of variable values included in at least one sub time-series data among the plurality of sub time-series data and determining whether the first time-series data is abnormal by inputting scaled first time-series data to a neural network based detection model.

Abstract: Provided herein are chemical mechanical polishing (CMP) slurries and methods for producing the same. Embodiments of the invention include CMP slurries that include (a) a metal oxide; (b) a pH-adjusting agent; (c) a fluorinated surfactant; and (d) a quaternary ammonium surfactant. In some embodiments, the fluorinated surfactant is a non-ionic perfluoroalkyl sulfonyl compound. Also provided herein are methods of polishing a polycrystalline silicon surface, including providing a slurry composition according to an embodiment of the invention to a polycrystalline silicon surface and performing a CMP process to polish the polycrystalline silicon surface.

Abstract: Provided herein are chemical mechanical polishing (CMP) slurries and methods for producing the same. Embodiments of the invention include CMP slurries that include (a) a metal oxide; (b) a quaternary ammonium base; and (c) a fluorinated surfactant. In some embodiments, the fluorinated surfactant is a non-ionic perfluoroalkyl sulfonyl compound. Also provided herein are methods of polishing a polycrystalline silicon surface, including providing a slurry composition according to an embodiment of the invention to a polycrystalline silicon surface and performing a CMP process to polish the polycrystalline silicon surface.

Abstract: An electric motor driven toothbrush is provided. The brush head of the toothbrush of the current application oscillates latitude to the body of the toothbrush. One end of a specially designed shaft, with an annular portion developed at that end, is connected to an electric motor via gears. A replaceable brush is attached to the other end. The circular portion at one end of the shaft is an annular plate that has at least two protrusions developed perpendicular to the circular plane. The two protrusions may be in a rectangular form or arc form developed along the perimeter of the circular portion developed on the shaft. A circular plate attached, with a predetermined angle, to a gear that vertically penetrates the annular portion enables a latitude oscillation movement of the brush head. With the toothbrush of the current application, a user can automatically scrub his/her teeth longitudinally along the length.