Patents by Inventor Jae-Chul SHIN

Jae-Chul SHIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Gas supply unit and thin film deposition apparatus including the same
    Patent number: 10526706
    Abstract: A gas supply unit includes a base plate, a plurality of gas supply regions protruding from the base plate and arranged on the base plate in a circumferential direction, and a plurality of sidewall trenches alternating with the gas supply regions on the base plate. A distance between opposing surfaces of the base plate increases in a radial direction from a center of the base plate in each of the plurality of sidewall trenches, so each of the plurality of sidewall trenches has a depth that decreases in the radial direction from the center of the base plate.
    Type: Grant
    Filed: April 12, 2017
    Date of Patent: January 7, 2020
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Suk Jin Chung, Jong Cheol Lee, Jae chul Shin, Min Hwa Jung, Jin Pil Heo
  • GAS SUPPLY UNIT AND THIN FILM DEPOSITION APPARATUS INCLUDING THE SAME
    Publication number: 20180002808
    Abstract: A gas supply unit includes a base plate, a plurality of gas supply regions protruding from the base plate, the plurality of gas supply regions being arranged on the base plate in a circumferential direction, and a plurality of sidewall trenches defined by facing sidewalls of adjacent gas supply regions of the plurality of gas supply regions, wherein each of the plurality of sidewall trenches has a depth that decreases in a radial direction from a center of the base plate.
    Type: Application
    Filed: April 12, 2017
    Publication date: January 4, 2018
    Inventors: Suk Jin CHUNG, Jong Cheol LEE, Jae chul SHIN, Min Hwa JUNG, Jin Pil HEO
  • METHOD AND APPARATUS FOR MANUFACTURING A SEMICONDUCTOR DEVICE
    Publication number: 20170092480
    Abstract: Provided are gas injection apparatuses, thin-film deposition equipment, and methods for manufacturing a semiconductor device.
    Type: Application
    Filed: January 18, 2016
    Publication date: March 30, 2017
    Inventors: In-Sun YI, Ki-Chul KIM, Jong-Cheol LEE, Kyu-Hee HAN, Jae-Chul SHIN, Min-Hwa JUNG, Yu-Ho Won, Seung-Han LEE, Jin-Pil HEO