Patents by Inventor Jae Eock Cho

Jae Eock Cho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11542577
    Abstract: A magnesium alloy sheet according to an embodiment of the present invention includes greater than 3 wt % and less than or equal to 5 wt % of Al, 0.5 wt % to 1.5 wt % of Zn, 0.1 wt % to 0.5 wt % of Mn, 0.001 wt % to 0.01 wt % of B, 0.1 wt % to 0.5 wt % of Y, a balance amount of magnesium, and other inevitable impurities on the basis of a total of 100 wt %.
    Type: Grant
    Filed: December 3, 2018
    Date of Patent: January 3, 2023
    Assignee: POSCO HOLDINGS INC.
    Inventors: Jae Sin Park, Taek Geun Lee, Dae Hwan Choi, Bae Mun Seo, Hye Ji Kim, Jonggeol Kim, Hye Jeong Kim, Yoonsuk Oh, Jae Eock Cho, Dong Kyun Choo
  • Publication number: 20210140017
    Abstract: A magnesium alloy sheet according to an embodiment of the present invention includes greater than 3 wt % and less than or equal to 5 wt % of Al, 0.5 wt % to 1.5 wt % of Zn, 0.1 wt % to 0.5 wt % of Mn, 0.001 wt % to 0.01 wt % of B, 0.1 wt % to 0.5 wt % of Y, a balance amount of magnesium, and other inevitable impurities on the basis of a total of 100 wt %.
    Type: Application
    Filed: December 3, 2018
    Publication date: May 13, 2021
    Inventors: Jae Sin Park, Taek Geun Lee, Dae Hwan Choi, Bae Mun Seo, Hye Ji Kim, Jonggeol Kim, Hye Jeong Kim, Yoonsuk Oh, Jae Eock Cho, Dong Kyun Choo
  • Patent number: 9666734
    Abstract: The present invention relates to an emitter wrap-through solar cell and a method for preparing the same. The solar cell according to the present invention has a structure that may minimize generation of leakage current and minimize energy conversion efficiency measurement error. And, the preparation method of a solar cell according to the present invention may easily confirm the alignment state of the electrode, and thus, provide more improved productivity.
    Type: Grant
    Filed: May 14, 2013
    Date of Patent: May 30, 2017
    Assignee: Hanwha Chemical Corporation
    Inventors: Woo-Won Jung, Jae Eock Cho, Hong Gu Lee, Deoc Hwan Hyun, Yong Hwa Lee
  • Patent number: 9093580
    Abstract: Provided is a method of manufacturing a solar cell, wherein a solar cell is manufactured by combining a damage removal etching process, a texturing process and an edge isolation process. The method is advantageous in that RIE and DRE are conducted, and then DRE/PSG and/or an edge isolation removal process are simultaneously conducted, so that the movement of a substrate (that is, a wafer) is minimized, thereby reducing the damage rate of the substrate.
    Type: Grant
    Filed: February 24, 2012
    Date of Patent: July 28, 2015
    Assignee: HANWHA CHEMICAL CORPORATION
    Inventors: Deoc Hwan Hyun, Jae Eock Cho, Dong Ho Lee, Gui Ryong Ahn, Hyun Cheol Ryu, Yong Hwa Lee, Gang II Kim
  • Publication number: 20150129026
    Abstract: The present invention relates to an emitter wrap-through solar cell and a method for preparing the same. The solar cell according to the present invention has a structure that may minimize generation of leakage current and minimize energy conversion efficiency measurement error. And, the preparation method of a solar cell according to the present invention may easily confirm the alignment state of the electrode, and thus, provide more improved productivity.
    Type: Application
    Filed: May 14, 2013
    Publication date: May 14, 2015
    Applicant: Hanwha Chemical Corporation
    Inventors: Woo-Won Jung, Jae Eock Cho, Hong Gu Lee, Deoc Hwan Hyun, Yong Hwa Lee
  • Publication number: 20140069498
    Abstract: Provided is a solar cell, including: a semiconductor substrate having a p-n junction; an antireflection film formed on at least one side of the semiconductor substrate; first electrodes formed on the antireflection film; and second electrodes covering the first electrodes, wherein only the first electrodes selectively penetrate the antireflection film and is thus connected with the semiconductor substrate by a punch through process.
    Type: Application
    Filed: March 13, 2012
    Publication date: March 13, 2014
    Applicant: HANWHA CHEMICAL CORPORATION
    Inventors: Jae Eock Cho, Yong Hwa Lee, Dong Ho Lee, Hyun Cheol Ryu, Gang Il Kim, Deoc Hwan Hyun
  • Publication number: 20140014173
    Abstract: Provided are a solar cell and a method for manufacturing the same, and more particularly, a solar cell for forming a selective emitter structure and a surface texture using dry plasma etching at the same time, and a method for manufacturing the same. The solar cell includes a silicon semiconductor substrate; an emitter doping layer having a surface, which is textured by a texturing process on an upper portion of the silicon semiconductor substrate and selectively doped; an anti-reflective film layer formed on a front of the substrate; a front electrode accessing to the emitter doping layer by penetrating the anti-reflective film layer; and a rear electrode accessing to a rear of the silicon semiconductor substrate.
    Type: Application
    Filed: February 23, 2012
    Publication date: January 16, 2014
    Applicant: HANWHA CHEMICAL CORPORATION
    Inventors: Deoc Hwan Hyun, Jae Eock Cho, Dong Ho Lee, Hyun Cheol Ryu, Yong Hwa Lee, Gang Il Kim, Gui Ryong Ahn
  • Publication number: 20140017847
    Abstract: Provided is a method of manufacturing a solar cell, wherein a solar cell is manufactured by combining a damage removal etching process, a texturing process and an edge isolation process. The method is advantageous in that RIE and DRE are conducted, and then DRE/PSG and/or an edge isolation removal process are simultaneously conducted, so that the movement of a substrate (that is, a wafer) is minimized, thereby reducing the damage rate of the substrate.
    Type: Application
    Filed: February 24, 2012
    Publication date: January 16, 2014
    Applicant: Hanwha Chemical Corporation
    Inventors: Deoc Hwan Hyun, Jae Eock Cho, Dong Ho Lee, Gui Ryong Ahn, Hyun Cheol Ryu, Yong Hwa Lee, Gang Il Kim
  • Publication number: 20090117381
    Abstract: Disclosed herein are acryl microbeads having a narrow particle size distribution and a method of preparing the same. In a method of preparing acryl microbeads through polymerization by stirring a polymerization composition containing vinyl acrylate monomers, an initiator and a dispersion stabilizer at a high speed to form microdroplets and increasing a reaction temperature to induce the polymerization reaction of the monomers within the microdroplets, a low molecular weight seed particle capable of absorbing vinyl acrylate monomers dissolved in a reaction medium outside the microdroplets is supplied at the time of the polymerization reaction, and thus the acryl microbeads have a narrow particle size distribution. The microbeads, which are almost completely free of fine and coarse particles and thus need no sorting process, which range in size from 1 to 50 ?m, and which have a narrow particle size distribution can be prepared at a high yield without using a polymerization inhibitor.
    Type: Application
    Filed: August 31, 2006
    Publication date: May 7, 2009
    Inventors: Jae Eock Cho, Se Jin Oh, Seok Heon Oh