Abstract: The present exemplary embodiments relates to a negative electrode for a lithium secondary battery, a manufacturing method thereof, and a lithium secondary battery comprising the same. An exemplary embodiment may provide a negative electrode for a lithium secondary battery comprising current collector and a negative active material layer positioned on at least one surface of the current collector, and comprising a lithium metal layer, wherein the negative active material layer comprising the lithium metal layer, comprises a coating layer positioned on the current collector and comprising a metal seed, and a lithium metal layer positioned on the coating layer.

Abstract: Provided is an organic light-emitting display apparatus including a hybrid protective film. The organic light-emitting display apparatus includes a substrate, a display unit disposed on the substrate and including an organic light-emitting device (OLED), and an encapsulation unit encapsulating the display unit and including the hybrid protective film. The hybrid protective film includes an inorganic part layer where carbon is removed, an organic part layer where carbon is contained in a predetermined amount, and a gradient part layer disposed between the inorganic part layer and the organic part layer and increasing an amount of carbon as being more contiguous to the organic part layer.

Abstract: Provided are a gas barrier film that is simply and economically manufactured, and has high hardness and strength, excellent gas blocking properties, controllable refraction index and transparency, and a compositionally gradient structure, and a method of producing the same. The gas barrier film includes a base material; and an organic/inorganic hybrid gas barrier layer that is formed on the base material and has a composition-gradient structure. The organic/inorganic hybrid gas barrier layer has a network structure having —O—Si—O— linkages. The network structure contains an organic functional group having a carbon atom directly linked to a silicon atom of the —O—Si—O— linkages, and other element that exists in an oxide form in the interstitial location of the network structure or that is linked to an oxygen atom of the —O—Si—O— linkages, wherein the other element comprises at least one selected from alkali metal, alkaline earth metal, transition metal, post transition metal, metalloid, boron, and phosphorous.

Abstract: The present invention relates to a method of fabricating a transparent gas barrier film by using plasma surface treatment and a transparent gas barrier film fabricated according to such method which has an organic/inorganic gradient interface structure at the interface between an organic/inorganic hybrid layer and an inorganic layer. Since the method of the present invention is capable of fabricating a gas barrier film by plasma surface treatment instead of deposition under high vacuum, it can mass-produce a transparent gas barrier film with excellent gas barrier properties in an economical and simple manner. Further, since the transparent gas barrier film fabricated according to the method of the present invention shows excellent gas barrier properties and is free of crack formation and layer-peeling phenomenon, it can be effectively used in the manufacture of a variety of display panels.