Abstract: A linear evaporation source and a deposition apparatus having the same are disclosed. In one aspect, the linear evaporation source includes i) a crucible being open on one side thereof and configured to store a deposition material and ii) a plurality of partitions dividing an internal space of the crucible, wherein each of the partitions has at least one opening in a lower portion thereof. The source further includes i) a nozzle section located on the open side of the crucible and comprising a plurality of nozzles, ii) a heater configured to heat the crucible and iii) a housing configured to accommodate the crucible, the nozzle section, and the heater.

Abstract: An apparatus includes: a display unit; a communication unit configured to communicate with a plurality of devices external to the apparatus; and a processor configured to control the display unit to display a first user interface (UI) image including a list of content files stored in a first device of the plurality of devices and a second UI image including a list of applications stored in a second device of the plurality of devices, and, in response to receiving a first user input selecting a content file from the list of content files in the first UI image and a second user input selecting an application from the list of applications in the second UI image, to control the selected content file to be processed by the selected application in the second device.

Abstract: A linear evaporation source and a deposition apparatus having the same are disclosed. In one aspect, the linear evaporation source includes i) a crucible being open on one side thereof and configured to store a deposition material and ii) a plurality of partitions dividing an internal space of the crucible, wherein each of the partitions has at least one opening in a lower portion thereof. The source further includes i) a nozzle section located on the open side of the crucible and comprising a plurality of nozzles, ii) a heater configured to heat the crucible and iii) a housing configured to accommodate the crucible, the nozzle section, and the heater.

Abstract: A linear evaporation source and a deposition apparatus having the same are disclosed. In one aspect, the linear evaporation source includes i) a crucible being open on one side thereof and configured to store a deposition material and ii) a plurality of partitions dividing an internal space of the crucible, wherein each of the partitions has at least one opening in a lower portion thereof. The source further includes i) a nozzle section located on the open side of the crucible and comprising a plurality of nozzles, ii) a heater configured to heat the crucible and iii) a housing configured to accommodate the crucible, the nozzle section, and the heater.

Abstract: A linear evaporation source and a deposition apparatus having the same are disclosed. In one embodiment, the linear evaporation source includes i) a crucible being open on one side thereof and configured to store a deposition material and ii) a plurality of partitions dividing an internal space of the crucible, wherein each of the partitions has at least one opening in a lower portion thereof. The source further includes i) a nozzle section located on the open side of the crucible and comprising a plurality of nozzles, ii) a heater configured to heat the crucible and iii) a housing configured to accommodate the crucible, the nozzle section, and the heater.

Abstract: A linear evaporation source and a deposition apparatus having the same are disclosed. In one aspect, the linear evaporation source includes i) a crucible being open on one side thereof and configured to store a deposition material and ii) a plurality of partitions dividing an internal space of the crucible, wherein each of the partitions has at least one opening in a lower portion thereof. The source further includes i) a nozzle section located on the open side of the crucible and comprising a plurality of nozzles, ii) a heater configured to heat the crucible and iii) a housing configured to accommodate the crucible, the nozzle section, and the heater.

Abstract: An apparatus includes: a display unit; a communication unit configured to communicate with a plurality of devices external to the apparatus; and a processor configured to control the display unit to display a first user interface (UI) image including a list of content files stored in a first device of the plurality of devices and a second UI image including a list of applications stored in a second device of the plurality of devices, and, in response to receiving a first user input selecting a content file from the list of content files in the first UI image and a second user input selecting an application from the list of applications in the second UI image, to control the selected content file to be processed by the selected application in the second device.

Abstract: The display apparatus includes: a display device; an image processor which processes an image to display the image on the display device; a communication unit which communicates with at least one first external device in which content data are stored and at least one second external device in which an application is installed to process the content data; and a controller which controls the image processor to communicate with the first and second external devices and display a user interface (UI) image corresponding to the content data and the application on the display device, and controls the processing operation of the application with respect to the content data through the UI image.

Abstract: A display apparatus includes a first recognition unit to recognize a gaze of a user; a second recognition unit to recognize a command from the user; a controller to determine whether the recognized gaze is within a predetermined recognition region, to control entry into an interactive mode upon determining that the recognized gaze is within the predetermined recognition region, and to selectively control a plurality of functions based on the recognized gaze and command; and a display unit to display an image corresponding to the interactive mode and an image corresponding to the selectively controlled function.

Abstract: A method for providing a playlist, a remote controller applying the same, and a multimedia system are provided. The method for providing a playlist includes displaying a plurality of content lists of a plurality of kinds of contents in which contents of a same kind are arranged together, the plurality of content lists being displayed on a first area of a screen, if at least two different kinds of contents are selected from the plurality of content lists in a selecting, collecting the selected contents of the at least two different kinds of contents, and generating and displaying a playlist including play information regarding the collected contents of the at least two different kinds of contents.

Abstract: A display apparatus including a recognition unit to recognize a gaze of a user, a controller to determine whether the recognized gaze is within a predetermined recognition region and to control entry into an interactive mode upon determining that the recognized gaze is within the predetermined recognition region, and a display unit to display an image corresponding to the interactive mode. A user's gaze is tracked to perform entry into an interactive mode, thereby easily achieving entry into the interactive mode and performing more intuitive interaction. In addition, a multi-modal interactive mode including a combination of face recognition, voice recognition, and gaze recognition is performed, thereby performing a more extended interactive mode and accurately determining a user command. As a result, functions are correctly performed, thereby improving user convenience.

Abstract: A display apparatus, a remote controller and a method for controlling applied thereto are provided. The display apparatus receives direction information regarding an orientation of the remote controller from the remote controller, and selects an area to be controlled by the remote controller from among a first area and a second area of a screen according to the direction information received from the remote controller. As a result, user is enabled to control different areas on the screen by appropriately moving the remote controller between different orientations.

Abstract: A thin film deposition apparatus includes a vacuum chamber, a substrate supporter disposed in the vacuum chamber to support a target substrate on which a thin film is deposited, and a deposition source that evaporates a deposition material and supplies the evaporated deposition material to the target substrate. The deposition source includes a crucible that includes a deposition material-containing portion to accommodate the deposition material and a first flange at an upper end of the deposition material-containing portion, a spray nozzle that includes a spray portion through which the evaporated deposition material is sprayed and a second flange at a lower end of the spray portion to make contact with the first flange, and a cooling member attached to an outer surface of the first flange and the second flange.

Abstract: A thin film deposition apparatus and method are disclosed. In one aspect, the deposition apparatus comprises a deposition source emitting a deposition material that is to be deposited on a surface of a substrate, a transfer unit moving the deposition source, a thickness measurement sensor measuring a thickness of the deposition material deposited on the surface of the substrate, and a transfer controller adjusting a moving speed of the transfer unit according to the thickness of the deposition material deposited on the surface of the substrate per unit of time.

Abstract: An apparatus for depositing an organic material and a depositing method thereof, wherein a deposition process is performed with respect to a second substrate while transfer and alignment processes are performed with respect to a first substrate in a chamber, so that loss of an organic material wasted in the transfer and alignment processes can be reduced, thereby maximizing material efficiency and minimizing a processing tack time. The apparatus includes a chamber having an interior divided into a first substrate deposition area and a second substrate deposition area, an organic material deposition source transferred to within ones of the first and second substrate deposition areas to spray particles of an organic material onto respective ones of first and second substrates and a first transferring unit to rotate the organic material deposition source in a first direction from one of the first and second substrate deposition areas to an other of the first and second substrate deposition areas.

Abstract: Provided is an evaporating apparatus that deposits a deposition material onto a treatment object. The evaporating apparatus includes a base, a deposition source, and first and second correction units. The deposition source deposits the deposition material onto the treatment object. The base is disposed separately from the treatment object. The deposition source is placed on a surface of the base. The first and second correction units located between the deposition source and the treatment object. The first and second correction units are disposed on outer regions of the deposition source and face each other. Each of the first and second correction units rotates to control the thickness of a layer formed by the deposition material deposited on the treatment object.

Abstract: A linear evaporation source and a deposition apparatus having the same are disclosed. In one embodiment, the linear evaporation source includes i) a crucible being open on one side thereof and configured to store a deposition material and ii) a plurality of partitions dividing an internal space of the crucible, wherein each of the partitions has at least one opening in a lower portion thereof. The source further includes i) a nozzle section located on the open side of the crucible and comprising a plurality of nozzles, ii) a heater configured to heat the crucible and iii) a housing configured to accommodate the crucible, the nozzle section, and the heater.

Abstract: A thin film deposition apparatus includes a vacuum chamber, a substrate supporter disposed in the vacuum chamber to support a target substrate on which a thin film is deposited, and a deposition source that evaporates a deposition material and supplies the evaporated deposition material to the target substrate. The deposition source includes a crucible that includes a deposition material-containing portion to accommodate the deposition material and a first flange at an upper end of the deposition material-containing portion, a spray nozzle that includes a spray portion through which the evaporated deposition material is sprayed and a second flange at a lower end of the spray portion to make contact with the first flange, and a cooling member attached to an outer surface of the first flange and the second flange.

Abstract: A linear evaporation source and a deposition apparatus having the same are disclosed. In one embodiment, the linear evaporation source includes i) a crucible being open on one side thereof and configured to store a deposition material and ii) a plurality of partitions dividing an internal space of the crucible, wherein each of the partitions has at least one opening in a lower portion thereof. The source further includes i) a nozzle section located on the open side of the crucible and comprising a plurality of nozzles, ii) a heater configured to heat the crucible and iii) a housing configured to accommodate to the crucible, the nozzle section, and the heater.

Abstract: A thin film deposition apparatus and method are disclosed. In one aspect, the deposition apparatus comprises a deposition source emitting a deposition material that is to be deposited on a surface of a substrate, a transfer unit moving the deposition source, a thickness measurement sensor measuring a thickness of the deposition material deposited on the surface of the substrate, and a transfer controller adjusting a moving speed of the transfer unit according to the thickness of the deposition material deposited on the surface of the substrate per unit of time.