Patents by Inventor Jaehwan Ma

Jaehwan Ma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11151786
    Abstract: A grading method and apparatus for garments including supplemental materials is provided. The grading method and apparatus calculates three-dimensional (3D) strain information between a 3D source avatar and a 3D target avatar, calculates two-dimensional (2D) strain information of a 2D pattern corresponding to source garments draped over the 3D source avatar based on the 3D strain information, determines grading information for grading the 2D pattern to correspond to the 3D target avatar based on the 2D strain information, identifies at least one supplemental material included in the source garments, extracts at least one polygon matching the at least one supplemental material among a plurality of polygons modeling the 2D pattern, and performs grading on the at least one supplemental material based on grading information of the at least one polygon.
    Type: Grant
    Filed: August 18, 2020
    Date of Patent: October 19, 2021
    Assignee: CLO VIRTUAL FASHION INC.
    Inventors: Seungwoo Oh, Jaehwan Ma, Bora Kim, Yeji Kim
  • Publication number: 20210227912
    Abstract: Sewing lines for sewing pattern pieces combined to form a garment is determined automatically using placement information and a graph. The placement information indicates at least matching relationships between at least the subset of the pattern pieces and placement points of an avatar onto which the garment is draped. The graph includes nodes and segments. The nodes are located on outlines of the pattern pieces. Each of the segments indicating a directed connection between adjacent ones of the nodes. Matching edges of at least the subset of the pattern pieces is determined by the placement information as sewing lines for at least the subset of the pattern pieces using the graph.
    Type: Application
    Filed: January 22, 2021
    Publication date: July 29, 2021
    Inventor: Jaehwan Ma
  • Publication number: 20210056755
    Abstract: A grading method and apparatus for garments including supplemental materials is provided. The grading method and apparatus calculates three-dimensional (3D) strain information between a 3D source avatar and a 3D target avatar, calculates two-dimensional (2D) strain information of a 2D pattern corresponding to source garments draped over the 3D source avatar based on the 3D strain information, determines grading information for grading the 2D pattern to correspond to the 3D target avatar based on the 2D strain information, identifies at least one supplemental material included in the source garments, extracts at least one polygon matching the at least one supplemental material among a plurality of polygons modeling the 2D pattern, and performs grading on the at least one supplemental material based on grading information of the at least one polygon.
    Type: Application
    Filed: August 18, 2020
    Publication date: February 25, 2021
    Inventors: Seungwoo OH, Jaehwan Ma, Bora Kim, Yeji Kim