Abstract: In one example, a semiconductor device can comprise a substrate, a device stack, first and second internal interconnects, and an encapsulant. The substrate can comprise a first and second substrate sides opposite each other, a substrate outer sidewall between the first substrate side and the second substrate side, and a substrate inner sidewall defining a cavity between the first substrate side and the second substrate side. The device stack can be in the cavity and can comprise a first electronic device, and a second electronic device stacked on the first electronic device. The first internal interconnect can be coupled to the substrate and the device stack. The encapsulant can cover the substrate inner sidewall and the device stack and can fill the cavity. Other examples and related methods are disclosed herein.

Abstract: Disclosed are a method and apparatus for reusing wastewater. The method for reusing wastewater disclosed herein includes: generating a mixed wastewater by mixing multiple types of wastewater (S20); performing a first purification by passing the mixed wastewater through a flocculation-sedimentation unit (S40); performing a second purification by passing an effluent of the flocculation-sedimentation unit through a membrane bioreactor (MBR) (S60); performing a third purification by passing an effluent of the MBR through a reverse-osmosis membrane unit (S80); and reusing an effluent of the reverse-osmosis membrane unit as cooling water or industrial water (S100).

Abstract: A raw material supply device that supplies a raw material into a flash smelting furnace and supplies first gas and second gas into the flash smelting furnace, includes: a first gas pathway that is provided in a lance and supplies the first gas into the flash smelting furnace; a raw material pathway that is provided out of the lance and supplies the raw material into the flash smelting furnace; a second gas pathway that is provided out of the raw material pathway and supplies the second gas into the flash smelting furnace; and a blade that is provided in the first gas pathway, has an inclined face with which the first gas is collided and revolves the first gas toward a lower side of the flash smelting furnace, the inclined face being inclined with respect to a flow direction of the first gas in the first gas pathway.

Abstract: A raw material supply device that supplies a raw material into a flash smelting furnace and supplies first gas and second gas into the flash smelting furnace, includes: a first gas pathway that is provided in a lance and supplies the first gas into the flash smelting furnace; a raw material pathway that is provided out of the lance and supplies the raw material into the flash smelting furnace; a second gas pathway that is provided out of the raw material pathway and supplies the second gas into the flash smelting furnace; and a blade that is provided in the first gas pathway, has an inclined face with which the first gas is collided and revolves the first gas toward a lower side of the flash smelting furnace, the inclined face being inclined with respect to a flow direction of the first gas in the first gas pathway.