Patents by Inventor Jae-Hyung Jung
Jae-Hyung Jung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11411391Abstract: An energy storage system (ESS) protection system includes: a battery monitoring system (BMS) configured to transmit a protection signal when an internal state or an external state of a battery cell is abnormal; a power conversion system (PCS) connected to the BMS through a hard wire, and configured to receive the protection signal through the hard wire; and an energy management system (EMS) connected between the BMS and the PCS through a universal communication line, and configured to receive the protection signal from the BMS and transmit the protection signal to the PCS. The PCS may be configured to perform an ESS shutdown when the PCS receives the protection signal through the hard wire or the universal communication line.Type: GrantFiled: December 30, 2020Date of Patent: August 9, 2022Assignee: Samsung SDI Co., Ltd.Inventors: Jae Hyung Jung, Suk Ki Kim, Dong Ki Hong
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Publication number: 20210249852Abstract: An energy storage system (ESS) protection system includes: a battery monitoring system (BMS) configured to transmit a protection signal when an internal state or an external state of a battery cell is abnormal; a power conversion system (PCS) connected to the BMS through a hard wire, and configured to receive the protection signal through the hard wire; and an energy management system (EMS) connected between the BMS and the PCS through a universal communication line, and configured to receive the protection signal from the BMS and transmit the protection signal to the PCS. The PCS may be configured to perform an ESS shutdown when the PCS receives the protection signal through the hard wire or the universal communication line.Type: ApplicationFiled: December 30, 2020Publication date: August 12, 2021Inventors: Jae Hyung JUNG, Suk Ki KIM, Dong Ki HONG
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Patent number: 7793671Abstract: An apparatus for cleaning substrates includes a substrate support that is configured to support a plurality of substrates horizontally as spaced regularly one above the other, a rotating device for rotating the substrate support and a liquid supply system for dispensing cleaning liquid onto the substrates. The substrate support has a base plate and support rods extending upright on the base plate. The support rods include fixed rods and at least one movable rod. The movable rods is movable between an open position to provide a passage that allows the substrates to be placed between the support rods, and a closed position at which the substrates are held by and between the support rods. Once the substrates are supported in this way, the substrates are rotated. Then, the cleaning liquid, such as a chemical solution(s) followed by a rinsing liquid, is dispensed onto all of the substrates as the substrates are being rotated.Type: GrantFiled: December 28, 2006Date of Patent: September 14, 2010Assignee: Samsung Electronics Co., Ltd.Inventor: Jae-Hyung Jung
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Patent number: 7398801Abstract: An apparatus and method for manufacturing semiconductor devices are disclosed. In accordance with the invention, a wafer transfer device for transferring wafers from wafer storage containers to wafer processing equipment includes a flow chamber designed to reduce the amount of contaminants that can enter the wafer container. The wafer transfer apparatus provide two gas inlets for allowing two gases to flow through the flow chamber of the transfer apparatus. This results in a reduced amount of contaminants able to enter the wafer container, which in turn results in manufacture of devices with more reliable performance characteristics as well as high manufacturing yield.Type: GrantFiled: December 2, 2005Date of Patent: July 15, 2008Assignee: Samsung Electronics Co., Ltd.Inventors: Kun-Hyung Lee, Soo-Woong Lee, Hyun-Ho Cho, Hee-Sun Chae, Jae-Hyung Jung, Sun-Yong Lee
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Patent number: 7343922Abstract: A wafer drying method includes submerging a wafer in a cleaning solution in a dry chamber. An organic liquid vapor from an organic liquid is supplied into the dry chamber at a first volumetric supply rate to form an organic liquid layer on a surface of the cleaning solution, the organic liquid layer having at least a prescribed concentration of the organic liquid. The organic liquid vapor is supplied into the dry chamber at a second volumetric supply rate that is lower than the first volumetric supply rate. During and/or following the supplying of the organic liquid vapor into the dry chamber, at least a portion of the wafer is removed from the cleaning solution through the organic liquid layer.Type: GrantFiled: April 12, 2005Date of Patent: March 18, 2008Assignee: Samsung Electronics Co., Ltd.Inventors: Jae-Hyung Jung, Young-Min Kwon, Jong-Jae Lee, Dong-Hoon Jung
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Publication number: 20070181164Abstract: An apparatus for cleaning substrates includes a substrate support that is configured to support a plurality of substrates horizontally as spaced regularly one above the other, a rotating device for rotating the substrate support and a liquid supply system for dispensing cleaning liquid onto the substrates. The substrate support has a base plate and support rods extending upright on the base plate. The support rods include fixed rods and at least one movable rod. The movable rods is movable between an open position to provide a passage that allows the substrates to be placed between the support rods, and a closed position at which the substrates are held by and between the support rods. Once the substrates are supported in this way, the substrates are rotated. Then, the cleaning liquid, such as a chemical solution(s) followed by a rinsing liquid, is dispensed onto all of the substrates as the substrates are being rotated.Type: ApplicationFiled: December 28, 2006Publication date: August 9, 2007Inventor: Jae-Hyung Jung
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Publication number: 20070181148Abstract: Embodiments of the invention provide a semiconductor wafer cleaning apparatus and a related method. In one embodiment, the invention provides a semiconductor wafer cleaning apparatus comprising a wafer stage adapted to support a wafer; a first cleaning unit adapted to spray a first cleaning solution onto the wafer to remove particles from the wafer, wherein the first cleaning solution prevents static electricity from being generated on the surface of the wafer; and a second cleaning unit adapted to provide a second cleaning solution onto the wafer and oscillate a quartz rod to remove particles from the wafer, wherein the second cleaning solution makes a surface of the wafer hydrophilic.Type: ApplicationFiled: December 21, 2006Publication date: August 9, 2007Inventors: Min-Sang Yun, Kwon Son, Jae-Hyung Jung, Hee-Chan Jung, Ki-Ryong Choi, Byung-Joo Park, Kang-Young Kim
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Publication number: 20060104750Abstract: An apparatus and method for manufacturing semiconductor devices are disclosed. In accordance with the invention, a wafer transfer device for transferring wafers from wafer storage containers to wafer processing equipment includes a flow chamber designed to reduce the amount of contaminants that can enter the wafer container. The wafer transfer apparatus provide two gas inlets for allowing two gases to flow through the flow chamber of the transfer apparatus. This results in a reduced amount of contaminants able to enter the wafer container, which in turn results in manufacture of devices with more reliable performance characteristics as well as high manufacturing yield.Type: ApplicationFiled: December 2, 2005Publication date: May 18, 2006Inventors: Kun-Hyung Lee, Soo-Woong Lee, Hyun-Ho Cho, Hee-Sun Chae, Jae-Hyung Jung, Sun-Yong Lee
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Publication number: 20050211266Abstract: A wafer drying method includes submerging a wafer in a cleaning solution in a dry chamber. An organic liquid vapor from an organic liquid is supplied into the dry chamber at a first volumetric supply rate to form an organic liquid layer on a surface of the cleaning solution, the organic liquid layer having at least a prescribed concentration of the organic liquid. The organic liquid vapor is supplied into the dry chamber at a second volumetric supply rate that is lower than the first volumetric supply rate. During and/or following the supplying of the organic liquid vapor into the dry chamber, at least a portion of the wafer is removed from the cleaning solution through the organic liquid layer.Type: ApplicationFiled: April 12, 2005Publication date: September 29, 2005Inventors: Jae-Hyung Jung, Young-Min Kwon, Jong-Jae Lee, Dong-Hoon Jung
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Patent number: 6896743Abstract: A wafer drying method includes submerging a wafer in a cleaning solution in a dry chamber. An organic liquid vapor from an organic liquid is supplied into the dry chamber at a first volumetric supply rate to form an organic liquid layer on a surface of the cleaning solution, the organic liquid layer having at least a prescribed concentration of the organic liquid. The organic liquid vapor is supplied into the dry chamber at a second volumetric supply rate that is lower than the first volumetric supply rate. During and/or following the supplying of the organic liquid vapor into the dry chamber, at least a portion of the wafer is removed from the cleaning solution through the organic liquid layer.Type: GrantFiled: January 8, 2002Date of Patent: May 24, 2005Assignee: Samsung Electronics Co., Ltd.Inventors: Jae-Hyung Jung, Young-Min Kwon, Jong-Jae Lee, Dong-Hoon Jung
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Publication number: 20040165973Abstract: An apparatus and method for manufacturing semiconductor devices are disclosed. In accordance with the invention, a wafer transfer device for transferring wafers from wafer storage containers to wafer processing equipment includes a flow chamber designed to reduce the amount of contaminants that can enter the wafer container. The wafer transfer apparatus provide two gas inlets for allowing two gases to flow through the flow chamber of the transfer apparatus. This results in a reduced amount of contaminants able to enter the wafer container, which in turn results in manufacture of devices with more reliable performance characteristics as well as high manufacturing yield.Type: ApplicationFiled: July 14, 2003Publication date: August 26, 2004Applicant: Samsung Electronics Co., Ltd.Inventors: Kun-Hyung Lee, Soo-Woong Lee, Hyun-Ho Cho, Hee-Sun Chae, Jae-Hyung Jung, Sun-Yong Lee
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Publication number: 20020195125Abstract: A wafer drying method includes submerging a wafer in a cleaning solution in a dry chamber. An organic liquid vapor from an organic liquid is supplied into the dry chamber at a first volumetric supply rate to form an organic liquid layer on a surface of the cleaning solution, the organic liquid layer having at least a prescribed concentration of the organic liquid. The organic liquid vapor is supplied into the dry chamber at a second volumetric supply rate that is lower than the first volumetric supply rate. During and/or following the supplying of the organic liquid vapor into the dry chamber, at least a portion of the wafer is removed from the cleaning solution through the organic liquid layer.Type: ApplicationFiled: January 8, 2002Publication date: December 26, 2002Inventors: Jae-Hyung Jung, Young-Min Kwon, Jong-Jae Lee, Dong-Hoon Jung
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Patent number: 6430840Abstract: A method of and an apparatus for drying a wafer using the Marangoni effect quickly forms an isopropyl alcohol layer on a cleaning liquid in which the wafer is submerged. The isopropyl alcohol is first heated and then supplied in a fluid state onto the cleaning liquid. The isopropyl alcohol liquid thus diffuses rapidly to form the isopropyl alcohol layer. The wafer is thoroughly dried by removing it from the cleaning liquid through the isopropyl alcohol while only supplying more of the heated nitrogen gas into the ambient above the cleaning liquid.Type: GrantFiled: March 9, 2001Date of Patent: August 13, 2002Assignee: Samsung Electronics Co., Ltd.Inventor: Jae-Hyung Jung
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Publication number: 20020032973Abstract: A method of and an apparatus for drying a wafer using the Marangoni effect quickly forms an isopropyl alcohol layer on a cleaning liquid in which the wafer is submerged. The isopropyl alcohol is first heated and then supplied in a fluid state onto the cleaning liquid. The isopropyl alcohol liquid thus diffuses rapidly to form the isopropyl alcohol layer. The wafer is thoroughly dried by removing it from the cleaning liquid through the isopropyl alcohol while only supplying more of the heated nitrogen gas into the ambient above the cleaning liquid.Type: ApplicationFiled: March 9, 2001Publication date: March 21, 2002Inventor: Jae-Hyung Jung
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Patent number: 6235147Abstract: There is provided a wet-etching facility for manufacturing semiconductor devices, wherein the etching process is performed for a wafer with its used surface facing downward so that the by-products from the etching process are completely removed from the etching groove of the wafer by gravity, and the impurities on the back side of the wafer are sank down, and are not touched to the used surface of the other wafer thereby producing good quality of wafers.Type: GrantFiled: September 28, 1999Date of Patent: May 22, 2001Assignee: Samsung Electronics Co. Ltd.Inventors: Seung-kun Lee, Jae-hyung Jung, Young-hwan Yun, Gyu-hwan Kwag
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Patent number: 6059986Abstract: A wet station apparatus used for cleaning and wet etching a semiconductor wafer includes a chemical container for holding a chemical solution, a temperature measuring device for measuring a temperature of the chemical solution, a temperature control unit for comparing the temperature measured by the temperature measuring device with a predetermined reference temperature value, and outputting the result as a control signal, a quartz heater for heating the chemical solution, a power supply controller for receiving the control signal and adjusting the power supplied to the quartz heater, and a power switch connected to the power supply controller, for receiving a heating initiation signal and switching power to the quartz heater, wherein a heater monitoring system is further provided for monitoring the operating states of the quartz heater and the power supply controller and notifying an operator of any problems.Type: GrantFiled: August 31, 1998Date of Patent: May 9, 2000Assignee: Samsung Electronics Co., Ltd.Inventors: Jae-hyung Jung, Young-hwan Yun, Se-jong Ko, Min-sang Yun
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Patent number: 5944939Abstract: A wet station apparatus used for cleaning and wet etching a semiconductor wafer includes a chemical container for holding a chemical solution, a temperature measuring device for measuring a temperature of the chemical solution, a temperature control unit for comparing the temperature measured by the temperature measuring device with a predetermined reference temperature value, and outputting the result as a control signal, a quartz heater for heating the chemical solution, a power supply controller for receiving the control signal and adjusting the power supplied to the quartz heater, and a power switch connected to the power supply controller, for receiving a heating initiation signal and switching power to the quartz heater, wherein a heater monitoring system is further provided for monitoring the operating states of the quartz heater and the power supply controller and notifying an operator of any problems.Type: GrantFiled: October 23, 1996Date of Patent: August 31, 1999Assignee: Samsung Electronics Co., Ltd.Inventors: Jae-hyung Jung, Young-hwan Yun, Se-jong Ko, Min-sang Yun
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Patent number: 5715851Abstract: A wafer cassette through which a sonic wave is evenly transferred to a substrate in a quartz bath, and a cleaning system adopting the wafer cassette are provided. In the wafer cassette, a hole for evenly transferring the sonic wave to the substrate is formed. The cleaning system includes a vibration plate for generating a sonic wave, placed at the lowest portion of the cleaning system, a sink placed on the vibration plate, a quartz bath placed in the sink and spaced from the bottom of the sink, in which a wafer cassette is placed, a plurality of water supplies for supplying a cleaning solution, placed in the bottom of the quartz bath and a water drain for draining the cleaning solution overflown from the quartz bath, placed on the bottom of the sink, opposite to the water supplies, wherein the vibration plate is placed between the water drain and the water supplies.Type: GrantFiled: July 26, 1995Date of Patent: February 10, 1998Assignee: Samsung Electronics Co., Ltd.Inventors: Jae-hyung Jung, Young-hwan Yun, Ho-seung Chang