Patents by Inventor Jae In

Jae In has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photomask having alignment marks
    Patent number: 5376482
    Abstract: A photo mask for detecting misalignment of stepper blades and undesirable pattern array on an wafer comprises: a number of highest limit alignment marks 5 to 8 located in the outside of a field pattern area for forming product dies on the wafer and indicating the highest limits in setting positions of the stepper blades respectively and a number of lowest alignment marks 9,10 and 11 located respectively in three corners of the said outside of the field pattern area and indicating the lowest limits in setting positions of the stepper blades respectively, and forming a predetermined geometrical shape together.
    Type: Grant
    Filed: May 20, 1993
    Date of Patent: December 27, 1994
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventors: Joon Hwang, Hyun G. Lee, Hong L. Kim, Young B. Yi, Jae In