Abstract: An antenna includes branches having substantially identical shapes. The branches are symmetrically disposed about a central point and extend along at least two concentric patterns whose geometric centers coincide with the central point. The branches each include pattern-forming portions that lie entirely within the concentric patterns, and at least one connecting portion extending between and connecting the pattern-forming portions. Input/output terminals for allowing a voltage to be impressed across the branches are provided at ends of each of the branches.

Abstract: An elementary plasma source for generating plasma is provided. In the elementary plasma source, first and second magnets are shaped like a hollow cylinder, and the second magnet surrounds the first magnet, for forming a magnetic trap between the first and second magnets. A guide provides microwaves to a space between the first and second magnets.

Abstract: An inductively coupled plasma (ICP) generating apparatus is provided. The apparatus includes an evacuated reaction chamber; an antenna system installed at an upper portion of the reaction chamber to induce an electric field for ionizing reaction gas supplied into the reaction chamber and generating plasma; and an RF power source connected to the antenna system to supply RF power to the antenna system. The antenna system includes a lower antenna installed adjacent to the upper portion of the reaction chamber, and an upper antenna installed a predetermined distance above the lower antenna. Further, the lower and the upper antennas respectively include an outside antenna placed to correspond to edge portions of a substrate within the reaction chamber, and an inside antenna placed inside the outside antenna with a predetermined space therebetween.

Abstract: An inductively coupled plasma (ICP) generating apparatus is provided. The apparatus includes an evacuated reaction chamber; an antenna system installed at an upper portion of the reaction chamber to induce an electric field for ionizing reaction gas supplied into the reaction chamber and generating plasma; and an RF power source connected to the antenna system to supply RF power to the antenna system. The antenna system includes a lower antenna installed adjacent to the upper portion of the reaction chamber, and an upper antenna installed a predetermined distance above the lower antenna. Further, the lower and the upper antennas respectively include an outside antenna placed to correspond to edge portions of a substrate within the reaction chamber, and an inside antenna placed inside the outside antenna with a predetermined space therebetween.

Abstract: Characteristics of a plasma contained in a reaction chamber of a plasma reactor are determined by first computing plasma characteristics for each of a plurality of cross-sections of the reaction chamber, and then generating a generalized model of the plasma from the computed plasma characteristics for the plurality of cross-sections, for example, by averaging the computed plasma characteristics for the cross-sections. The plasma reactor may comprise a plurality of magnets that move with respect to the reaction chamber, such as in a dipole ring magnet (DRM) plasma reactor, and each of the plurality of cross-sections may include an axis of rotation about which the magnets rotate. Plasma characteristics for each the cross-sections of the reaction chamber may be computed by computing electron density and temperature using a Monte Carlo computational procedure and computing ion and neutral species transmission phenomena from a plasma dynamics simulation, e.g.