Abstract: An array substrate for a liquid crystal display device includes a substrate, a gate line and a data line crossing each other to define a pixel region, a thin film transistor at a crossing of the gate and data lines, a metal pattern over the gate line, a passivation layer exposing the substrate in the pixel region, a part of the thin film transistor and a part of the metal pattern, and a pixel electrode in the pixel region. The pixel electrode is connected to the part of the thin film transistor and contacts the part of the metal pattern. The metal pattern has at least one curved portion in a side contacting the pixel electrode.

Abstract: A method of manufacturing an array substrate for a liquid crystal display device includes forming a first line on a substrate; the first line having one or more first holes; forming a first insulating layer on the first line; forming a second line on the first insulating layer, the second line crossing the first line; forming a second insulating layer on the second line, the second insulating layer including one or more second holes; and forming a conductive pattern in each of the second holes, wherein the first holes are formed at a crossing portion of the first and the second lines, and the second holes at the crossing portion are disposed in the first holes.

Abstract: An array substrate for a liquid crystal display device includes a substrate, a gate line and a data line crossing each other to define a pixel region, a thin film transistor at a crossing of the gate and data lines, a metal pattern over the gate line, a passivation layer exposing the substrate in the pixel region, a part of the thin film transistor and a part of the metal pattern, and a pixel electrode in the pixel region. The pixel electrode is connected to the part of the thin film transistor and contacts the part of the metal pattern. The metal pattern has at least one curved portion in a side contacting the pixel electrode.

Abstract: A method of manufacturing an array substrate for a liquid crystal display device includes forming a first line on a substrate; the first line having one or more first holes; forming a first insulating layer on the first line; forming a second line on the first insulating layer, the second line crossing the first line; forming a second insulating layer on the second line, the second insulating layer including one or more second holes; and forming a conductive pattern in each of the second holes, wherein the first holes are formed at a crossing portion of the first and the second lines, and the second holes at the crossing portion are disposed in the first holes.

Abstract: A method of fabricating a thin film transistor-liquid crystal display (TFT-LCD), which includes providing a substrate with a plurality of pixels. A thin film transistor (TFT) is formed in each of the plurality of pixels. A passivation layer is deposited over the substrate, and a pixel electrode is formed in each of the plurality of pixels. A TFT-LCD device, which includes a substrate having a plurality of pixels, a TFT in each of the plurality of pixels, and a first pixel electrode formed in each of the plurality of pixels. The first electrode pixel is connected with a drain electrode of the TFT. The TFT includes a gate electrode and an insulating layer on the substrate, an active layer formed on the insulating layer, source and drain electrodes formed over the gate electrode and at opposing ends of the active layer, and a passivation layer exposing a part of the drain electrode.