Patents by Inventor Jae-Jun Ryu

Jae-Jun Ryu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7081182
    Abstract: The present invention relates to a method and apparatus for automatically measuring the concentration of total organic carbon (TOC) in chemicals and ultra-pure water that are used in a wet etch process. The apparatus includes a sampling line extending from a processing bath, and a pump, for extracting a fluid sample from the processing bath, a buffer for filtering foreign material or air bubbles from the fluid, and an analyzer for analyzing the concentration of TOC in the fluid.
    Type: Grant
    Filed: July 26, 2002
    Date of Patent: July 25, 2006
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jae-Jun Ryu, Kyung-Dae Kim, June-Ing Gill, Yong-Woo Heo
  • Patent number: 6883248
    Abstract: An apparatus for drying a substrate using an isopropyl alcohol vapor includes a container for receiving an isopropyl alcohol vapor to dry a plurality of substrates wherein an opening is vertically formed through an upper portion of the container to permit the loading and unloading of the substrates; a supporting member for supporting the plurality of substrates in the container in a vertical direction and for supporting the substrates side by side in a horizontal direction, wherein the supporting member extends through the container and through the opening; and a cover for obstructing a flow of clean air from flowing directly from an air cleaner disposed over the container into the container through the opening. In addition, the apparatus may include an inert gas supplying member to supply an inert gas onto the substrates to prevent native oxide films from forming on the substrates.
    Type: Grant
    Filed: August 7, 2003
    Date of Patent: April 26, 2005
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yong-Kyun Ko, Jae-Jun Ryu, Hun-Jung Yi, Pil-Kwon Jun
  • Publication number: 20040060579
    Abstract: Cleaning solution is used to clean ceramic parts using the same. The cleaning solution includes about 5-30% by weight of fluoric salt, about 10-20% by weight of organic acid, about 30-50% by weight of organic solvent, and about 50% by weight of water. The ceramic parts may be portions of an etching apparatus on which plasma reaction by-products are adsorbed. Plasma reaction by-products are removed from the ceramic parts dipping the parts into the cleaning solution, followed by rinsing and heat treatment.
    Type: Application
    Filed: June 23, 2003
    Publication date: April 1, 2004
    Inventors: Jaung-Joo Kim, Jae-Jun Ryu, Pil-Kwon Jun, Dong-Jin Park, Jin-Sung Kim, Sang-Mun Chon
  • Publication number: 20040045188
    Abstract: An apparatus for drying a substrate using an isopropyl alcohol vapor includes a container for receiving an isopropyl alcohol vapor to dry a plurality of substrates wherein an opening is vertically formed through an upper portion of the container to permit the loading and unloading of the substrates; a supporting member for supporting the plurality of substrates in the container in a vertical direction and for supporting the substrates side by side in a horizontal direction, wherein the supporting member extends through the container and through the opening; and a cover for obstructing a flow of clean air from flowing directly from an air cleaner disposed over the container into the container through the opening. In addition, the apparatus may include an inert gas supplying member to supply an inert gas onto the substrates to prevent native oxide films from forming on the substrates.
    Type: Application
    Filed: August 7, 2003
    Publication date: March 11, 2004
    Inventors: Yong-Kyun Ko, Jae-Jun Ryu, Hun-Jung Yi, Pil-Kwon Jun
  • Publication number: 20030054576
    Abstract: The present invention relates to a method and apparatus for automatically measuring the concentration of total organic carbon (TOC) in chemicals and ultra-pure water that are used in a wet etch process. The apparatus includes a sampling line extending from a processing bath, and a pump, for extracting a fluid sample from the processing bath, a buffer for filtering foreign material or air bubbles from the fluid, and an analyzer for analyzing the concentration of TOC in the fluid.
    Type: Application
    Filed: July 26, 2002
    Publication date: March 20, 2003
    Inventors: Jae-Jun Ryu, Kyung-Dae Kim, June-Ing Gill, Yong-Woo Heo
  • Patent number: 5856623
    Abstract: A particle counter for counting a number of particles in an air sample includes a sampling probe connected to a counter body with an intake section of the sampling probe having an adjustable area. The intake section is constructed of a plurality of telescopically interconnected shaped pieces that slide within one another to permit lengthening and shortening. The degree of lengthening or shortening determines the adjustable area of the sampling probe, which corresponds to an air speed of the air sample to provide precise particle measurements.
    Type: Grant
    Filed: October 7, 1997
    Date of Patent: January 5, 1999
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yo-han Ahn, Tac-ho Kim, Jae-jun Ryu, Joung-sun Lee