Abstract: The present disclosure relates to: a composition for diagnosing aortic valve calcification diseases, comprising a preparation, which measures the protein level of inactivated IGF-1, wherein the composition is capable of diagnosing aortic valve calcification diseases involving calcification of aortic valves; a kit for diagnosing aortic valve calcification diseases, comprising the composition; a method for detecting inactivated IGF-1 so as to provide information necessary in the diagnosis of aortic valve calcification diseases; and a method for detecting inactivated IGF-1 so as to provide information necessary in the diagnosis of the progression level of aortic valve calcification diseases.

Abstract: There is provided a composition for prophylaxis or treatment of vascular or valvular calcification including a dipeptidylpeptidase-4 (DPP-4) inhibitor. The DPP-4 according to one exemplary embodiment of the present disclosure is expressed at an increased level when blood vessels and valves are calcified, and the calcification decreases remarkably upon administration of the DPP-4 inhibitor. Therefore, the DPP-4 inhibitor can be useful in treatment or prophylaxis of blood vessels or valves.

Abstract: There is provided a composition for prophylaxis or treatment of vascular or valvular calcification including a dipeptidylpeptidase-4 (DPP-4) inhibitor. The DPP-4 according to one exemplary embodiment of the present disclosure is expressed at an increased level when blood vessels and valves are calcified, and the calcification decreases remarkably upon administration of the DPP-4 inhibitor. Therefore, the DPP-4 inhibitor can be useful in treatment or prophylaxis of blood vessels or valves.

Abstract: A method of coating a wafer with photoresist includes steps of injecting solvent on a wafer, subsequently applying photoresist onto the wafer, rotating the wafer at a constant speed, and directing a laminar flow of air towards the wafer as it is rotating. Since the solvent is injected onto the wafer prior to the photoresist, the surface tension and viscosity of the photoresist are lowered. The laminar airflow suppresses turbulence at the surface of the wafer, which turbulence is otherwise created by the act of rotating the wafer. To this end, a cylinder is raised to form a chamber over the wafer, and filtered air is blown into the cylindrical chamber. These measures make it is possible for the photoresist film to be formed with a uniform thickness.

Abstract: A facility for manufacturing semiconductor devices is provided with a diagnosis system for easily monitoring the operation states of various fabrication systems, and controlling them in case of abnormal operation states by means of a sensing signal from the fabrication systems and a control signal from a control system. The fabrication system outputs a sensing signal showing the operation states of the fabrication processes such as temperature, time, pressure, concentration, power, etc. The control system outputs a control signal to the fabrication systems for controlling their operation states via transmit lines connected thereto according to the sensing signal from the fabrication systems or an input signal from a host computer. The diagnosis system analyzes the sensing signal from the fabrication systems and the control signal from the control system so as to assess the operation states of the fabrication systems.

Abstract: An apparatus for transmitting a signal which is capable of connecting an N-number of main lines and one auxiliary line using an N-number of transmission switches (N denotes 1, 2, 3, . . . , n), thus more effectively transmitting a signal, which includes first and second input terminals selectively connected to first and second output terminals in accordance with normal/error control signals, with transmission line signal being applied to the first input terminals of the SPDT transmission switches, and with an auxiliary line signal being applied to the second input terminal of the last SPDT transmission switch; first output terminals of the transmission switches connected to an input terminal of a combining terminal; first output terminals of the SPDT transmission switches connected to first input terminals of the SPDT transmission switches; and a load resistor connected to the second output terminal of the first SPDT transmission switch.

Abstract: An advanced exposure apparatus combines a quadrupole illumination system and an annular illumination system, and includes a light source, an adjusting portion comprising a filter to limit the light emitted from the light source, a refractive/diffractive portion for refracting and diffracting the light emitted from the adjusting portion and a focussing portion for focussing the light emitted from the refractive/diffractive portion onto a wafer, wherein the filter is provided with first group holes and second group holes comprising four holes, respectively. In an exposure method using such an apparatus, uniform light intensity distribution can be formed on an image formation plane (or wafer) while improved resolution is maintained. Since image formation information (i.e, light passing through a mask pattern) becomes uniform, a very nearly circular contact hole pattern can be formed, to reduce the proximity effect.