Abstract: Disclosed is a deposition apparatus for an organic light-emitting diode, which is capable of preventing a large piece of glass from sagging due to gravity. The deposition apparatus allows the glass to be adhered to the lower surface of a planar electrostatic chuck from the center portion toward the edge portion thereof in the state in which it is upwardly convexly bent, thereby preventing deformation of a mask caused by the amount of sag of the glass. In addition, the deposition apparatus enables rapid alignment of the glass and the mask because the glass and the mask are adhered to each other via measurement of respective alignment marks provided thereon after the glass is located as close as possible to the mask without coming into contact with the mask.

Abstract: A thin film deposition apparatus that can be simply applied to produce large-sized display devices on a mass scale and that improves manufacturing yield. The thin film deposition apparatus includes a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; and a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in a second direction that is perpendicular to the first direction. A deposition is performed while the substrate or the thin film deposition apparatus moves relative to each other in the first direction, and the deposition source, the deposition source nozzle unit, and the patterning slit sheet are formed integrally with each other.

Abstract: A thin film deposition apparatus that can be simply applied to produce large-sized display devices on a mass scale and that improves manufacturing yield. The thin film deposition apparatus includes a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; and a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in a second direction that is perpendicular to the first direction. A deposition is performed while the substrate or the thin film deposition apparatus moves relative to each other in the first direction, and the deposition source, the deposition source nozzle unit, and the patterning slit sheet are formed integrally with each other.

Abstract: A thin film deposition apparatus that can be simply applied to produce large-sized display devices on a mass scale and that improves manufacturing yield. The thin film deposition apparatus includes a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; and a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in a second direction that is perpendicular to the first direction. A deposition is performed while the substrate or the thin film deposition apparatus moves relative to each other in the first direction, and the deposition source, the deposition source nozzle unit, and the patterning slit sheet are formed integrally with each other.

Abstract: Disclosed herein is a method for acquiring and processing a medical image, comprising obtaining the first to n-th sectional images of the first to n-th regions through non-sequential sectional-image acquisition starting from one of the first to n-th regions and sequentially arranging the obtained first to n-th sectional images.

Abstract: Disclosed is a deposition apparatus for an organic light-emitting diode, which is capable of preventing a large piece of glass from sagging due to gravity. The deposition apparatus allows the glass to be adhered to the lower surface of a planar electrostatic chuck from the center portion toward the edge portion thereof in the state in which it is upwardly convexly bent, thereby preventing deformation of a mask caused by the amount of sag of the glass. In addition, the deposition apparatus enables rapid alignment of the glass and the mask because the glass and the mask are adhered to each other via measurement of respective alignment marks provided thereon after the glass is located as close as possible to the mask without coming into contact with the mask.

Abstract: A thin film deposition apparatus includes: a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in the first direction; a position detection member that detects a relative position of the substrate to the patterning slit sheet; and an alignment control member that controls a relative position of the patterning slit sheet to the substrate by using the relative position of the substrate detected by the position detection member, wherein the thin film deposition apparatus and the substrate are separated from each other, and the thin film deposition apparatus and the substrate are moved relative to each other.

Abstract: A thin film deposition apparatus that can be simply applied to produce large-sized display devices on a mass scale and that improves manufacturing yield. The thin film deposition apparatus includes a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; and a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in a second direction that is perpendicular to the first direction. A deposition is performed while the substrate or the thin film deposition apparatus moves relative to each other in the first direction, and the deposition source, the deposition source nozzle unit, and the patterning slit sheet are formed integrally with each other.

Abstract: Disclosed herein is a method for acquiring and processing a medical image, comprising obtaining the first to n-th sectional images of the first to n-th regions through non-sequential sectional-image acquisition starting from one of the first to n-th regions and sequentially arranging the obtained first to n-th sectional images.

Abstract: A thin film deposition apparatus includes: a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in the first direction; a position detection member that detects a relative position of the substrate to the patterning slit sheet; and an alignment control member that controls a relative position of the patterning slit sheet to the substrate by using the relative position of the substrate detected by the position detection member, wherein the thin film deposition apparatus and the substrate are separated from each other, and the thin film deposition apparatus and the substrate are moved relative to each other.

Abstract: A thin film deposition apparatus includes: a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in the first direction; a position detection member that detects a relative position of the substrate to the patterning slit sheet; and an alignment control member that controls a relative position of the patterning slit sheet to the substrate by using the relative position of the substrate detected by the position detection member, wherein the thin film deposition apparatus and the substrate are separated from each other, and the thin film deposition apparatus and the substrate are moved relative to each other.

Abstract: A thin film deposition apparatus that can be applied to manufacture large-sized display devices on a mass scale and that improves manufacturing yield, and a method of manufacturing an organic light-emitting display device by using the thin film deposition apparatus.

Abstract: An organic layer deposition apparatus that may be precisely aligned with a substrate during a deposition process. The apparatus includes: a deposition source; a deposition source nozzle unit; and a patterning slit sheet, which is spaced from and smaller than the substrate, and having a plurality of patterning slits arranged in a second direction perpendicular to the first direction. Deposition is performed while the substrate is moved relative to the deposition apparatus in the first direction. The patterning slit sheet includes first and second alignment marks that are spaced from each other. The substrate includes first and second alignment patterns that are spaced from each other. The deposition apparatus also includes first and second camera assemblies for respectively photographing the first alignment mark/pattern and the second alignment mark/pattern. A moving speed of the substrate is synchronized with shooting speeds of the first and second camera assemblies.

Abstract: A thin film deposition apparatus that includes a thin film deposition assembly incorporating: a deposition source that discharges a deposition material; a deposition source nozzle unit that is disposed at a side of the deposition source and includes a plurality of deposition source nozzles arranged in a first direction; a patterning slit sheet that is disposed opposite to the deposition source nozzle unit and includes a plurality of patterning slits arranged in the first direction; and a barrier plate assembly including a plurality of barrier plates that are disposed between the deposition source nozzle unit and the patterning slit sheet in the first direction, and partition a space between the deposition source nozzle unit and the patterning slit sheet into a plurality of sub-deposition spaces, wherein each of the barrier plates is separate from the patterning slit sheet.

Abstract: An organic layer deposition apparatus for forming an organic layer on a substrate includes: a deposition source configured to discharge a deposition material; a deposition source nozzle unit arranged at a side of the deposition source and including a plurality of deposition source nozzles; and a patterning slit sheet facing the deposition source nozzle unit and including a plurality of patterning slits and at least one spacer arranged between a pair of adjacent patterning slits of the plurality of patterning slits, the patterning slit sheet being smaller than the substrate in at least one of a first direction or a second direction perpendicular to the first direction, and the substrate is spaced apart from the organic layer deposition apparatus by a predetermined distance, and at least one of the substrate or the organic layer deposition apparatus is movable relative to the other.

Abstract: An organic layer deposition apparatus for forming an organic layer while a substrate is being moved, in which an interval between the substrate and the organic layer deposition apparatus can be measured at a vacuum condition.

Abstract: A thin film deposition apparatus and a method of manufacturing an organic light-emitting display device by using the same, and more particularly, to a thin film deposition apparatus that can remove a deposition material deposited on a patterning slit sheet without performing an additional cleaning process, and a method of manufacturing an organic light-emitting display device by using the thin film deposition apparatus.

Abstract: An organic layer deposition apparatus that may be precisely aligned with a substrate during a deposition process. The apparatus includes: a deposition source; a deposition source nozzle unit; and a patterning slit sheet, which is spaced from and smaller than the substrate, and having a plurality of patterning slits arranged in a second direction perpendicular to the first direction. Deposition is performed while the substrate is moved relative to the deposition apparatus in the first direction. The patterning slit sheet includes first and second alignment marks that are spaced from each other. The substrate includes first and second alignment patterns that are spaced from each other. The deposition apparatus also includes first and second camera assemblies for respectively photographing the first alignment mark/pattern and the second alignment mark/pattern. A moving speed of the substrate is synchronized with shooting speeds of the first and second camera assemblies.

Abstract: An organic layer deposition apparatus for forming an organic layer on a substrate includes: a deposition source configured to discharge a deposition material; a deposition source nozzle unit arranged at a side of the deposition source and including a plurality of deposition source nozzles; and a patterning slit sheet facing the deposition source nozzle unit and including a plurality of patterning slits and at least one spacer arranged between a pair of adjacent patterning slits of the plurality of patterning slits, the patterning slit sheet being smaller than the substrate in at least one of a first direction or a second direction perpendicular to the first direction, and the substrate is spaced apart from the organic layer deposition apparatus by a predetermined distance, and at least one of the substrate or the organic layer deposition apparatus is movable relative to the other.

Abstract: An organic layer deposition apparatus for forming an organic layer while a substrate is being moved, in which an interval between the substrate and the organic layer deposition apparatus can be measured at a vacuum condition.