Patents by Inventor Jae Kyeong YOO

Jae Kyeong YOO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Ammonia decomposition catalyst and method of decomposing ammonia using the catalyst
    Patent number: 11883795
    Abstract: Provided are an ammonia decomposition catalyst and a method of decomposing ammonia. The ammonia decomposition catalyst includes an activated carbon carrier and a metal loaded on the carrier, wherein a Brunauer, Emmett and Teller (BET) specific surface area of the carrier is about 850 m2/g or more, and the metal includes cerium (Ce).
    Type: Grant
    Filed: April 5, 2022
    Date of Patent: January 30, 2024
    Assignees: SAMSUNG ENGINEERING CO., LTD., EST CO., LTD.
    Inventors: Jae Rim Yi, Sung Soo Lee, Sung Hun Hong, Jae Hun Hong, Sang Youp Hwang, Jae Kyeong Yoo, Sung Eun Jeoung, Jae Hoon Choi, Sang Bock Lee, Jung Jae Kim
  • AMMONIA DECOMPOSITION CATALYST AND METHOD OF DECOMPOSING AMMONIA USING THE CATALYST
    Publication number: 20220323940
    Abstract: Provided are an ammonia decomposition catalyst and a method of decomposing ammonia. The ammonia decomposition catalyst includes an activated carbon carrier and a metal loaded on the carrier, wherein a Brunauer, Emmett and Teller (BET) specific surface area of the carrier is about 850 m2/g or more, and the metal includes cerium (Ce).
    Type: Application
    Filed: April 5, 2022
    Publication date: October 13, 2022
    Applicants: SAMSUNG ENGINEERING CO., LTD., EST CO., LTD.
    Inventors: Jae Rim YI, Sung Soo LEE, Sung Hun HONG, Jae Hun HONG, Sang Youp HWANG, Jae Kyeong YOO, Sung Eun JEOUNG, Jae Hoon CHOI, Sang Bock LEE, Jung Jae KIM
  • Substrate processing apparatus and method
    Patent number: 10964565
    Abstract: Disclosed is a substrate processing apparatus that includes an interference member for minimizing a collision between a descending flow of gas supplied by a fan unit and a gas flow directed toward a transfer space from the inside of a container.
    Type: Grant
    Filed: August 30, 2019
    Date of Patent: March 30, 2021
    Assignees: PSK INC., PSK HOLDINGS INC.
    Inventors: Je Hyeok Ryu, Jae Kyeong Yoo, Jung-Hyun Kang
  • SUBSTRATE PROCESSING APPARATUS AND METHOD
    Publication number: 20200211871
    Abstract: Disclosed is a substrate processing apparatus that includes an interference member for minimizing a collision between a descending flow of gas supplied by a fan unit and a gas flow directed toward a transfer space from the inside of a container.
    Type: Application
    Filed: August 30, 2019
    Publication date: July 2, 2020
    Inventors: Je Hyeok RYU, Jae Kyeong YOO, Jung-Hyun KANG