Abstract: A semiconductor device and a method of fabricating the same are provided. According to the present invention, a semiconductor device comprises an active region formed in a substrate, and including flat surfaces and hole-shaped recess portions; upper-level plugs disposed over the flat surfaces; a spacer disposed between the upper-level plugs and providing a trench exposing the hole-shaped recess portions; a lower-level plug filling the hole-shaped recess portions; and a buried conductive line disposed over the lower-level plug and partially filling the trench.

Abstract: A method for fabricating a semiconductor device includes forming a bit line contact hole in a substrate; forming a first spacer on a sidewall of the bit line contact hole; forming a sacrificial spacer over the first spacer; forming a first conductive material that fills the bit line contact hole over the sacrificial spacer; forming a second conductive material over the first conductive material; forming a bit line by etching the second conductive material; and forming a bit line contact plug and a gap between the bit line contact plug and the first spacer by partially etching the first conductive material and the sacrificial spacer to be aligned with the bit line.

Abstract: A semiconductor device and a method of fabricating the same are provided. According to the present invention, a semiconductor device comprises an active region formed in a substrate, and including flat surfaces and hole-shaped recess portions; upper-level plugs disposed over the flat surfaces; a spacer disposed between the upper-level plugs and providing a trench exposing the hole-shaped recess portions; a lower-level plug filling the hole-shaped recess portions; and a buried conductive line disposed over the lower-level plug and partially filling the trench.

Abstract: A method of manufacturing a semiconductor device includes: forming a trench in an insulating interlayer by etching the insulating interlayer; forming a conductive layer on bottom, side, and upper surfaces of the insulating interlayer where the trench is formed, using a first deposition process, the conductive layer on the bottom surface of the trench being thicker than the conductive layer on the side surface of the trench; forming a sacrificial layer in the trench covering the conductive layer formed on the bottom surface of the trench using a second deposition process different from the first deposition process; selectively removing the conductive layer formed on the upper surface of the insulating interlayer and formed on the side surface of the trench left exposed through the sacrificial layer; and selectively removing the sacrificial layer, to form a conductive line using the conductive layer remaining on the bottom surface of the trench.

Abstract: A semiconductor device and a method of fabricating the same are provided. According to the present invention, a semiconductor device comprises an active region formed in a substrate, and including flat surfaces and hole-shaped recess portions; upper-level plugs disposed over the flat surfaces; a spacer disposed between the upper-level plugs and providing a trench exposing the hole-shaped recess portions; a lower-level plug filling the hole-shaped recess portions; and a buried conductive line disposed over the lower-level plug and partially filling the trench.

Abstract: A semiconductor device and a method of fabricating the same are provided. According to the present invention, a semiconductor device comprises an active region formed in a substrate, and including flat surfaces and hole-shaped recess portions; upper-level plugs disposed over the flat surfaces; a spacer disposed between the upper-level plugs and providing a trench exposing the hole-shaped recess portions; a lower-level plug filling the hole-shaped recess portions; and a buried conductive line disposed over the lower-level plug and partially filling the trench.

Abstract: A method for fabricating a semiconductor device includes forming a bit line contact hole in a substrate; forming a first spacer on a sidewall of the bit line contact hole; forming a sacrificial spacer over the first spacer; forming a first conductive material that fills the bit line contact hole over the sacrificial spacer; forming a second conductive material over the first conductive material; forming a bit line by etching the second conductive material; and forming a bit line contact plug and a gap between the bit line contact plug and the first spacer by partially etching the first conductive material and the sacrificial spacer to be aligned with the bit line.

Abstract: A method for fabricating a semiconductor device includes forming a bit line contact hole in a substrate; forming a first spacer on a sidewall of the bit line contact hole; forming a sacrificial spacer over the first spacer; forming a first conductive material that fills the bit line contact hole over the sacrificial spacer; forming a second conductive material over the first conductive material; forming a bit line by etching the second conductive material; and forming a bit line contact plug and a gap between the bit line contact plug and the first spacer by partially etching the first conductive material and the sacrificial spacer to be aligned with the bit line.

Abstract: A method for fabricating a semiconductor device includes forming a bit line contact hole in a substrate; forming a first spacer on a sidewall of the bit line contact hole; forming a sacrificial spacer over the first spacer; forming a first conductive material that fills the bit line contact hole over the sacrificial spacer; forming a second conductive material over the first conductive material; forming a bit line by etching the second conductive material; and forming a bit line contact plug and a gap between the bit line contact plug and the first spacer by partially etching the first conductive material and the sacrificial spacer to be aligned with the bit line.

Abstract: A method for fabricating a semiconductor device includes: forming a plurality of bit line structures over a semiconductor substrate; forming a line-type opening between the bit line structures; forming a sacrificial spacer on both sidewalls of the line-type opening; forming a line-type plug filling the line-type opening over the sacrificial spacer; forming a plurality of plug isolation openings that expose the sacrificial spacer by etching a portion of the line-type plug in a direction crossing the bit line structures; forming a plurality of air gaps by removing the exposed sacrificial spacer; removing a remaining line-type plug below the plug isolation openings to form a plurality of island-type plugs; and forming a plug isolation layer inside the plug isolation openings to isolate neighboring island-type plugs from each other.

Abstract: A method for fabricating a semiconductor device includes: forming a plurality of bit line structures over a semiconductor substrate; forming a line-type opening between the bit line structures; forming a sacrificial spacer on both sidewalls of the line-type opening; forming a line-type plug filling the line-type opening over the sacrificial spacer; forming a plurality of plug isolation openings that expose the sacrificial spacer by etching a portion of the line-type plug in a direction crossing the bit line structures; forming a plurality of air gaps by removing the exposed sacrificial spacer; removing a remaining line-type plug below the plug isolation openings to form a plurality of island-type plugs; and forming a plug isolation layer inside the plug isolation openings to isolate neighboring island-type plugs from each other.

Abstract: A method for fabricating a semiconductor device includes: forming a plurality of bit line structures over a semiconductor substrate; forming a line-type opening between the bit line structures; forming a sacrificial spacer on both sidewalls of the line-type opening; forming a line-type plug filling the line-type opening over the sacrificial spacer; forming a plurality of plug isolation openings that expose the sacrificial spacer by etching a portion of the line-type plug in a direction crossing the bit line structures; forming a plurality of air gaps by removing the exposed sacrificial spacer; removing a remaining line-type plug below the plug isolation openings to form a plurality of island-type plugs; and forming a plug isolation layer inside the plug isolation openings to isolate neighboring island-type plugs from each other.

Abstract: A method for fabricating a semiconductor device includes: forming a plurality of bit line structures over a semiconductor substrate; forming a line-type opening between the bit line structures; forming a sacrificial spacer on both sidewalls of the line-type opening; forming a line-type plug filling the line-type opening over the sacrificial spacer; forming a plurality of plug isolation openings that expose the sacrificial spacer by etching a portion of the line-type plug in a direction crossing the bit line structures; forming a plurality of air gaps by removing the exposed sacrificial spacer; removing a remaining line-type plug below the plug isolation openings to form a plurality of island-type plugs; and forming a plug isolation layer inside the plug isolation openings to isolate neighboring island-type plugs from each other.

Abstract: A semiconductor device includes a bit line disposed over a semiconductor substrate, a supporting film being perpendicular to the bit line, a first storage node contact disposed at a lower part of a region disposed between the bit line and the supporting film, and a second storage node contact having a line shape, disposed over the first storage node contact and the bit line, isolated by the supporting film, and patterned in a diagonal direction across the bit line.

Abstract: A semiconductor device includes a bit line disposed over a semiconductor substrate, a supporting film being perpendicular to the bit line, a first storage node contact disposed at a lower part of a region disposed between the bit line and the supporting film, and a second storage node contact having a line shape, disposed over the first storage node contact and the bit line, isolated by the supporting film, and patterned in a diagonal direction across the bit line.

Abstract: A semiconductor device includes a bit line disposed over a semiconductor substrate, a supporting film being perpendicular to the bit line, a first storage node contact disposed at a lower part of a region disposed between the bit line and the supporting film, and a second storage node contact having a line shape, disposed over the first storage node contact and the bit line, isolated by the supporting film, and patterned in a diagonal direction across the bit line.

Abstract: A semiconductor memory device including a memory cell array including at least one word line, at least one cell bit line, and at least one memory cell that is disposed in a region where the at least one word line and the at least one cell bit line cross each other; at least one sense amplifier that is disposed above or below the memory cell array to be overlapped with the memory cell array in a planar fashion, connected to at least one bit line connected to the at least one cell bit line, and at least one complementary bit line corresponding to the at least one bit line, and senses data stored in the at least one memory cell; a decompression unit for decompressing a signal having a lower voltage level from among a signal of the at least one bit line and a signal of the at least one complementary bit line; a boosting unit for boosting a signal having a higher voltage level from among the signal of the at least one bit line and the signal of the at least one complementary bit line; and an equalizing unit for eq

Abstract: A vertical type integrated circuit device includes a substrate and a pillar vertically protruding from the substrate. The pillar includes a lower impurity region and an upper impurity region therein and a vertical channel region therebetween. A portion of the pillar including the lower impurity region therein includes a mesa laterally extending therefrom. The device further includes a first conductive line extending on a first sidewall of the pillar and electrically contacting the lower impurity region, and a second conductive line extending on a second sidewall of the pillar adjacent the vertical channel region. The second conductive line extends in a direction perpendicular to the first conductive line and is spaced apart from the mesa. Related devices and methods of fabrication are also discussed.

Abstract: A semiconductor device includes a first transistor, a second transistor, an insulation interlayer pattern and a capacitor. The first transistor is formed in a first region of a substrate. The first transistor has a pillar protruding upwardly from the substrate and an impurity region provided in an upper portion of the pillar. The second transistor is formed in a second region of the substrate. The insulation interlayer pattern is formed on the first region and the second region to cover the second transistor and expose an upper surface of the pillar. The insulation interlayer pattern has an upper surface substantially higher than the upper surface of the pillar in the first region. The capacitor is formed on the impurity region in the upper portion of the pillar and is electrically connected to the impurity region.

Abstract: A method of fabricating a semiconductor device using a recess channel array is disclosed. A substrate is provided having a first region and a second region, including a first transistor in the first region including a first gate electrode partially filling a trench, and source and drain regions that are formed at both sides of the trench, and covered by a first insulating layer. A first conductive layer is formed on the substrate. A contact hole through which the drain region is exposed is formed by patterning the first conductive layer and the first insulating layer. A contact plug is formed that fills the contact hole. A bit line is formed that is electrically connected to the drain region through the contact plug, and simultaneously a second gate electrode is formed in the second region by patterning the first conductive layer.