Abstract: Provided are a treating liquid supplying unit, and a substrate processing apparatus and method using the same. Temperature of treating liquid in a treating liquid pipe built into a nozzle arm can be maintained, through heat transfer between the nozzle arm and a standby port and heat transfer between the nozzle arm and a nozzle moving unit, while the nozzle arm is standing by in standby position, while processing is being performed at a processing position, and during movement between the standby position and a processing position. Thus, treating liquid supplied from a nozzle can be maintained at a predetermined temperature by the treating liquid supplying unit, and the substrate processing apparatus and method using the same.

Abstract: A substrate processing apparatus is provided. The substrate processing apparatus includes a substrate supporting member including a spin head on which a substrate is placed, a nozzle discharging processing liquid to the substrate placed on the spin head, and a processing liquid supplying source supplying the processing liquid to the nozzle. The nozzle includes a nozzle main body that has a plurality of discrete discharging openings and an integration discharging opening. The discrete discharging openings have a slit-shaped cross section having a first length and are arrayed in series in a predetermined direction. The integration discharging opening is formed by connecting the discrete discharging openings to each other in a single slot shape having a length greater than the first length, and finally discharges the processing liquid.

Abstract: Provided are a treating liquid supplying unit, and a substrate processing apparatus and method using the same. Temperature of treating liquid in a treating liquid pipe built into a nozzle arm can be maintained, through heat transfer between the nozzle arm and a standby port and heat transfer between the nozzle arm and a nozzle moving unit, while the nozzle arm is standing by in standby position, while processing is being performed at a processing position, and during movement between the standby position and a processing position. Thus, treating liquid supplied from a nozzle can be maintained at a predetermined temperature by the treating liquid supplying unit, and the substrate processing apparatus and method using the same.

Abstract: A substrate processing apparatus is provided. The substrate processing apparatus includes a substrate supporting member including a spin head on which a substrate is placed, a nozzle discharging processing liquid to the substrate placed on the spin head, and a processing liquid supplying source supplying the processing liquid to the nozzle. The nozzle includes a nozzle main body that has a plurality of discrete discharging openings and an integration discharging opening. The discrete discharging openings have a slit-shaped cross section having a first length and are arrayed in series in a predetermined direction. The integration discharging opening is formed by connecting the discrete discharging openings to each other in a single slot shape having a length greater than the first length, and finally discharges the processing liquid.

Abstract: A developer flow check system is capable of directly determining the actual amount of developer from a nozzle. The system includes: a pressure regulator; a reservoir connected to the pressure regulator; a valve connected to the reservoir; a developer nozzle connected to the valve; and a post nozzle developer flow check section connected to the developer nozzle, for adjusting the quantity of the developer actually injected to an wafer to conform to a preset quantity is developer. The post nozzle developer flow check section includes: a developer flow check tube arranged for receiving the developer delivered from said developer nozzle. A sensor detects movement of said display a developer flow controller connected to said sensor determines a time interval which developer flows through the tube and the quantity of developer is calculated thereby. a developer flow check system controller receiving a control signal from the developer flow controller, to control the actual developer flow.