Abstract: A light-transmissive multispectral stealth device is disclosed.

Abstract: Disclosed is a multi-spectral stealth device that generates a camouflage color in a visible ray region, has low reflectivity in near-infrared ray and short-wavelength infrared-ray regions, and has low emissivity in mid-wavelength and long-wavelength infrared-ray regions. The multi-spectral stealth device includes a metal layer made of a first metal having electrical conductivity; a semiconductor layer disposed on a top surface of the metal layer and made of a semiconductor material having a bandgap in which the semiconductor material is capable of absorbing a visible ray and a near-infrared ray; and a plurality of metal patterns regularly arranged on a top surface of the semiconductor layer and made of a second metal having electrical conductivity.

Abstract: Disclosed is a stealth device that has a double-band stealth function against millimeter-wavelength electromagnetic waves, has high absorption at a near-infrared laser wavelength, and has low emissivity of mid-infrared light and long-infrared light. The stealth device includes a wavelength-selective absorption pattern layer made of a material having electrical conductivity, wherein the wavelength-selective absorption pattern layer is composed of conductive thin-film patterns capable of causing plasmonic resonance at a first wavelength and a second wavelength different from the first wavelength; and a dielectric layer disposed below the wavelength-selective absorption pattern layer and made of a dielectric material.

Abstract: The present invention relates to an infrared stealth element using a dual band perfect absorption metamaterial. The infrared stealth element includes: a first metal layer; an insulator layer formed on an upper part of the first metal layer; and a second metal layer formed on an upper part of the insulator layer. The second metal layer includes at least one among a metal ring and a metal dot.

Abstract: The present invention relates to an infrared stealth element using a dual band perfect absorption metamaterial. The infrared stealth element includes: a first metal layer; an insulator layer formed on an upper part of the first metal layer; and a second metal layer formed on an upper part of the insulator layer. The second metal layer includes at least one among a metal ring and a metal dot.

Abstract: A device for a device for preventing the intensity reduction of an optical signal, an optical emission spectrometer, an optical instrument, and a mass spectrometer including the same are provided. The device for preventing the intensity reduction includes a shielding filter which has a mesh structure capable of blocking RF electromagnetic waves radiated from a plasma field for a wafer processing, is installed in the front of an optical window of an optical emission spectrometer for measuring the plasma field from an emission spectrum image of the plasma field, and collects charging particles passing through the mesh.

Abstract: A device for a device for preventing the intensity reduction of an optical signal, an optical emission spectrometer, an optical instrument, and a mass spectrometer including the same are provided. The device for preventing the intensity reduction includes a shielding filter which has a mesh structure capable of blocking RF electromagnetic waves radiated from a plasma field for a wafer processing, is installed in the front of an optical window of an optical emission spectrometer for measuring the plasma field from an emission spectrum image of the plasma field, and collects charging particles passing through the mesh.

Abstract: There is provided a method of manufacturing a stamp for a plasmonic nanolithography apparatus. The method includes forming metal patterns on a substrate, coating a hydrophobic thin film on external surfaces of the metal patterns to hydrophobic processing the external surfaces of the metal patterns, selectively hydrophilic processing only the external surfaces of the metal patterns, laminating a buffer layer on the substrate and the metal patterns, and transcribing the metal patterns and the buffer layer from the substrate to a base formed of light transmission material to be combined with the base.

Abstract: A device for a device for preventing the intensity reduction of an optical signal, an optical emission spectrometer, an optical instrument, and a mass spectrometer including the same are provided. The device for preventing the intensity reduction includes a shielding filter which has a mesh structure capable of blocking RF electromagnetic waves radiated from a plasma field for a wafer processing, is installed in the front of an optical window of an optical emission spectrometer for measuring the plasma field from an emission spectrum image of the plasma field, and collects charging particles passing through the mesh.

Abstract: A contact type plasmonic nano optical probe, a parallel probe constituted of the same, a plasmonic optical apparatus including the parallel probe, and a method of fabricating the parallel probe are disclosed. A contact type plasmonic nano optical probe includes a probe tip which protrudes in a truncated shape having a narrower plan surface and a wider plan surface relatively wider than the narrower plan surface, of which a metal thin film is coated on a surface, of and which an aperture of nm diameter included in a portion of the metal thin film on a central portion of the narrower plan surface, a spring structure disposed at a perimeter of the probe tip and configured to maintain a distance between the probe tip and a film to be exposed, a dielectric filled within the aperture, and a protection layer disposed on the narrower plan surface of the probe tip. Here, an optical transport path is included within the probe tip to be connected to the aperture.

Abstract: An optical apparatus for plasma includes a light collection lens provided to receive optical emission spectrum from plasma, a first aperture stop disposed between the light collection lens and the plasma to block out-focused light, a second aperture stop disposed between the light collection lens and an imaging area of the light collection lens to block in-focused light, and a pinhole disposed at the imaging area of the light collection lens to limit depth of focus.

Abstract: A device for a device for preventing the intensity reduction of an optical signal, an optical emission spectrometer, an optical instrument, and a mass spectrometer including the same are provided. The device for preventing the intensity reduction includes a shielding filter which has a mesh structure capable of blocking RF electromagnetic waves radiated from a plasma field for a wafer processing, is installed in the front of an optical window of an optical emission spectrometer for measuring the plasma field from an emission spectrum image of the plasma field, and collects charging particles passing through the mesh.

Abstract: A high density information storage medium includes a recording layer in which information is stored; a thin metal film placed on the recording layer and having a structure in which nano-apertures having a size of several nanometers to several hundred nanometers are defined at regular intervals; and a protective layer placed on the thin metal film. As light irradiated from above the protective layer passes through the nano-apertures, physical characteristics of the recording layer are changed, whereby information is stored.

Abstract: A contact type plasmonic nano optical probe, a parallel probe constituted of the same, a plasmonic optical apparatus including the parallel probe, and a method of fabricating the parallel probe are disclosed. A contact type plasmonic nano optical probe includes a probe tip which protrudes in a truncated shape having a narrower plan surface and a wider plan surface relatively wider than the narrower plan surface, of which a metal thin film is coated on a surface, of and which an aperture of nm diameter included in a portion of the metal thin film on a central portion of the narrower plan surface, a spring structure disposed at a perimeter of the probe tip and configured to maintain a distance between the probe tip and a film to be exposed, a dielectric filled within the aperture, and a protection layer disposed on the narrower plan surface of the probe tip. Here, an optical transport path is included within the probe tip to be connected to the aperture.

Abstract: Disclosed are a lens structure, an optical system including the same, and a lithography method using the optical system. The disclosed lens structure includes: a lens that has a substantially semispherical shape and includes a protruding portion having a truncated cone shape that is provided on its aspherical surface; a thin metal film that is formed on the surface of the protruding portion, and has an aperture formed at a position corresponding to the center of an upper surface of the protruding portion; and an immersion layer that is formed with a constant thickness on the upper surface of the protruding portion.

Abstract: An optical modulating fine aperture array device is provided. The device includes a spatial light modulation unit provided with at least one light capacity cell arranged in a shape of a matrix, wherein each of the light capacity control cells is capable of individually controlling a degree of an inputted light which passing therethrough. A micro-lens array is provided with at least one micro-lens arranged in a shape of a matrix, wherein each of the micro-lenses condenses the light passing through each of the light capacity control cells. A substrate is made of an optical transparent material. The micro-lens array is attached to one side of the substrate. An aperture array is arranged on other side surface of the substrate and provided with at least one fine aperture. An immersion thin film layer is made of an optically transparent dielectric, including and formed to have a predetermined thickness from the aperture array.

Abstract: An optical apparatus for plasma includes a light collection lens provided to receive optical emission spectrum from plasma, a first aperture stop disposed between the light collection lens and the plasma to block out-focused light, a second aperture stop disposed between the light collection lens and an imaging area of the light collection lens to block in-focused light, and a pinhole disposed at the imaging area of the light collection lens to limit depth of focus.

Abstract: A high density information storage medium includes a recording layer in which information is stored; a thin metal film placed on the recording layer and having a structure in which nano-apertures having a size of several nanometers to several hundred nanometers are defined at regular intervals; and a protective layer placed on the thin metal film. As light irradiated from above the protective layer passes through the nano-apertures, physical characteristics of the recording layer are changed, whereby information is stored.

Abstract: An apparatus for measuring light proceeding backward to which a plasmonic device is applied is disclosed. A disclosed optical apparatus according to the present invention includes: a plasmonic device including a thin metal film having apertures having a nano-sized diameter, disposed close to an object, and generating a near field in front of the apertures; a polarization modulation unit for adjusting the polarized state of light entering through the apertures of the plasmonic device, and making the light reflecting the strength of the near field proceed backward through the nano-apertures of the plasmonic device, and a measuring unit detecting properties of the object from the light proceeding backward from the polarization modulation unit.

Abstract: An optical modulating fine aperture array device is provided.