Abstract: An array substrate for a liquid crystal display device, including a substrate, at least one gate line and at least one gate electrode formed on the transparent substrate, a gate insulating layer formed over the at least one gate line and the at least one gate electrode, a silicon layer formed on the gate insulating layer, the silicon layer being positioned above the at least one gate electrode, a source electrode and a drain electrode formed on the silicon layer and spaced apart from each other with the silicon layer overlapped therebetween, wherein the at least one gate electrode, the source electrode, the drain electrode, and the silicon layer comprise a thin film transistor (TFT), at least one data line, a first passivation layer covering the at least one data line, a reflective electrode covering a portion of a pixel region defined by the at least one gate line and the at least one data line, a second passivation layer formed on the reflective electrode, and a transparent electrode formed on the second pa

Abstract: A method of fabricating a liquid crystal display device includes forming an embossed reflective electrode. In the method, the embossed reflective electrode is embossed via a dry-etching method with a mixture of SF6+O2 or CF4+O2 gases, or with oxygen gas, such that a plurality of small concave and convex portions are formed on the reflective electrode. Since the concave and convex portions of the reflective electrode diffuse light, high luminance and wide viewing angle can be achieved.

Abstract: An array substrate of the transflective LCD device that includes forming a reflective plate on the substrate at first.

Abstract: The present invention provides a transflective LCD device that has a common contrast ratio in both the transmissive mode and the reflective mode. It also discloses a transflective LCD device that has an equal luminance in both the transmissive mode and the reflective mode.