Patents by Inventor Jae Yun Ahn

Jae Yun Ahn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PHOTORESIST UNDERLAYER COMPOSITION
    Publication number: 20240201591
    Abstract: A composition comprising a polymer, the polymer comprising: repeating units derived from a monomer of Formula A1, Formula A2, or Formula A3, repeating units derived from a monomer of Formula B1, Formula B2, Formula B3, or Formula B4, and repeating units derived from a monomer of Formula C1 or Formula C2, the structures of each as described herein. A coated substrate including a substrate, a photoresist underlayer formed from composition above, and a photoresist layer on the photoresist underlayer.
    Type: Application
    Filed: November 28, 2022
    Publication date: June 20, 2024
    Inventors: Yoo-Jin GHANG, Jae-Yun AHN, You Rim SHIN, Jung-June LEE, Jae-Hwan SIM
  • Underlying coating compositions for use with photoresists
    Patent number: 11500291
    Abstract: New composition and methods are provided that include antireflective compositions that can exhibit enhanced etch rates in standard plasma etchants. Preferred antireflective coating compositions of the invention have decreased carbon content relative to prior compositions.
    Type: Grant
    Filed: October 31, 2017
    Date of Patent: November 15, 2022
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
    Inventors: Jung-June Lee, Jae-Yun Ahn, You-Rim Shin, Jin-Hong Park, Jae-Hwan Sim
  • Method for forming pattern using antireflective coating composition including photoacid generator
    Patent number: 11269252
    Abstract: An antireflective coating composition, including a polymer, a photoacid generator having a crosslinkable group, a compound capable of crosslinking the polymer and the photoacid generator, a thermal acid generator, and an organic solvent.
    Type: Grant
    Filed: July 22, 2019
    Date of Patent: March 8, 2022
    Assignees: ROHM AND HAAS ELECTRONIC MATERIALS LLC, ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
    Inventors: Jung-June Lee, Jae-Yun Ahn, Jae-Hwan Sim, Jae-Bong Lim, Emad Aqad, Myung-Yeol Kim
  • METHOD FOR FORMING PATTERN USING ANTIREFLECTIVE COATING COMPOSITION INCLUDING PHOTOACID GENERATOR
    Publication number: 20210026242
    Abstract: An antireflective coating composition, including a polymer, a photoacid generator having a crosslinkable group, a compound capable of crosslinking the polymer and the photoacid generator, a thermal acid generator, and an organic solvent.
    Type: Application
    Filed: July 22, 2019
    Publication date: January 28, 2021
    Inventors: Jung-June Lee, Jae-Yun Ahn, Jae-Hwan Sim, Jae-Bong Lim, Emad Aqad, Myung-Yeol Kim
  • Overcoat compositions and methods for photolithography
    Patent number: 10514604
    Abstract: Topcoat compositions are provided that are suitably applied above a photoresist composition. Preferred topcoat compositions comprise a first polymer that comprises (i) first units comprising a nitrogen-containing moiety that comprises an acid-labile group; and (ii) second units that (1) comprise one or more hydrophobic groups and (2) are distinct from the first units.
    Type: Grant
    Filed: April 29, 2016
    Date of Patent: December 24, 2019
    Assignee: Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Chang-Young Hong, Eui-Hyun Ryu, Min-Kyung Jang, Dong-Yong Kim, Jae Yun Ahn
  • UNDERLYING COATING COMPOSITIONS FOR USE WITH PHOTORESISTS
    Publication number: 20190129305
    Abstract: New composition and methods are provided that include antireflective compositions that can exhibit enhanced etch rates in standard plasma etchants. Preferred antireflective coating compositions of the invention have decreased carbon content relative to prior compositions.
    Type: Application
    Filed: October 31, 2017
    Publication date: May 2, 2019
    Inventors: Jung-June Lee, Jae-Yun Ahn, You-Rim Shin, Jin-Hong Park, Jae-Hwan Sim
  • Photobase generators and photoresist compositions comprising same
    Patent number: 10274824
    Abstract: New photobase generators suitable for use in photoresists are provided that correspond to Formula (I): X1—R1—O—C(?O)N(R2)R3??(I) wherein X1 is an optionally substituted aromatic group; R1 is a linker; and R2 and R3 are the same or different optionally substituted linear, branched or cyclic aliphatic group or an optionally substituted aromatic group, wherein at least one of R2 and R3 is an optionally substituted branched alkyl group having 4 or more carbon atoms.
    Type: Grant
    Filed: May 12, 2016
    Date of Patent: April 30, 2019
    Assignee: Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Min-Kyung Jang, Eui Hyun Ryu, Chang-Young Hong, Myung Yeol Kim, Jung-June Lee, Dong Je Hong, Dong-Yong Kim, Hae-Jin Lim, Jae Yun Ahn, Ohk-Min Jeon
  • COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
    Publication number: 20180364576
    Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise 1) one or more resins and 2) one or more PDQ compounds that are distinct from the 1) one or more resins.
    Type: Application
    Filed: June 19, 2017
    Publication date: December 20, 2018
    Inventors: Jung-June Lee, Jae Yun Ahn, Bon-Ki Ku, Jae Hwan Sim, Jae-Bong Lim
  • PHOTOBASE GENERATORS AND PHOTORESIST COMPOSITIONS COMPRISING SAME
    Publication number: 20160334703
    Abstract: New photobase generators suitable for use in photoresists are provided that correspond to Formula (I): X1—R1—O—C(?O)N(R2)R3??(I) wherein X1 is an optionally substituted aromatic group; R1 is a linker; and R2 and R3 are the same or different optionally substituted linear, branched or cyclic aliphatic group or an optionally substituted aromatic group, wherein at least one of R2 and R3 is an optionally substituted branched alkyl group having 4 or more carbon atoms.
    Type: Application
    Filed: May 12, 2016
    Publication date: November 17, 2016
    Inventors: Min-Kyung Jang, Eui-Hyun Ryu, Chang-Young Hong, Myung Yeol Kim, Jung-June Lee, Dong-Je Hong, Dong-Yong Kim, Hae-Jin Lim, Jae Yun Ahn, Ohk-Min Jeon
  • OVERCOAT COMPOSITIONS AND METHODS FOR PHOTOLITHOGRAPHY
    Publication number: 20160320703
    Abstract: Topcoat compositions are provided that are suitably applied above a photoresist composition. Preferred topcoat compositions comprise a first polymer that comprises (i) first units comprising a nitrogen-containing moiety that comprises an acid-labile group; and (ii) second units that (1) comprise one or more hydrophobic groups and (2) are distinct from the first units.
    Type: Application
    Filed: April 29, 2016
    Publication date: November 3, 2016
    Inventors: Chang-Young Hong, Eui-Hyun Ryu, Min-Kyung Jang, Dong-Yong Kim, Jae Yun Ahn