Patents by Inventor Jae Yun Ahn

Jae Yun Ahn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Bifunctional heterocyclic compound having BTK degradation function via ubiquitin proteasome pathway, and use thereof
    Patent number: 12161722
    Abstract: The present invention relates to a novel heterocyclic compound and a composition, for preventing or treating a cancer, an autoimmune disease, and an inflammatory disease, comprising same. The novel heterocyclic compound of the present invention is a bifunctional compound having a Bruton's tyrosine kinase (BTK) degradation function via a ubiquitin proteasome pathway, and may be utilized as a composition for preventing or treating a cancer, an autoimmune disease, and Parkinson's disease.
    Type: Grant
    Filed: June 24, 2022
    Date of Patent: December 10, 2024
    Assignees: KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY, UBIX THERAPEUTICS, INC.
    Inventors: Pil Ho Kim, Sung Yun Cho, Jae Du Ha, Chi Hoon Park, Jong Yeon Hwang, Hyun Jin Kim, Song Hee Lee, Ye Seul Lim, Han Wool Kim, Sun Mi Yoo, Beom Seon Suh, Ji Youn Park, Je Ho Ryu, Jung Min Ahn, Hee Jung Moon, Ho Hyun Lee
  • STEEL PIPE FOR LINE PIPE WITH EXCELLENT LOW TEMPERATURE TOUGHNESS OF WELDED ZONE AND METHOD FOR MANUFACTURING THE SAME
    Publication number: 20240390967
    Abstract: Disclosed are a steel pipe for a line pipe having excellent low temperature toughness in a welded zone thereof, and a method for manufacturing the same, in which alloy components and a ratio thereof are controlled, and high frequency heat-treatment is carried out on the welded zone, and immediately thereafter, a cooling process is performed thereon in a strictly controlled manner, thereby improving the low temperature toughness of the welded zone, such that a resulting steel pipe is suitable for use in a pipeline and an offshore structure.
    Type: Application
    Filed: July 13, 2023
    Publication date: November 28, 2024
    Inventors: Yi-Yong KIM, Kwang-Jin CHOI, Dong-Jik KUM, Chang-Ki AN, Si-Yun CHOI, Young-Cheul AHN, Jae-Yeon CHO
  • Sealing assembly for twin swing gate
    Patent number: 12145429
    Abstract: An embodiment is a sealing assembly for a twin swing gate of a vehicle, the sealing assembly including a first gate of which an outside end portion is hinge-connected to a vehicle, a second gate of which an outside end portion is hinge-connected to the vehicle and configured to be rotated in a direction opposite to rotation of the first gate, and a center bar unit along a height direction of the vehicle on an inside end portion of the first gate, the center bar being configured to rotate in conjunction with opening or closing the first gate.
    Type: Grant
    Filed: May 24, 2023
    Date of Patent: November 19, 2024
    Assignees: Hyundai Motor Company, Kia Corporation
    Inventors: Je-Yeon Kim, Jang-Hoon Kim, Jae-Yun Lee, Dong-Hee Ma, Min-Hyoung Ahn
  • SEMICONDUCTOR PACKAGE AND FABRICATING METHOD THEREOF
    Publication number: 20240347442
    Abstract: A semiconductor device structure, for example a 3D structure, and a method for fabricating a semiconductor device. As non-limiting examples, various aspects of this disclosure provide various semiconductor package structures, and methods for manufacturing thereof, that comprise interposer, interlayer, and/or heat dissipater configurations that provide for low cost, increased manufacturability, and high reliability.
    Type: Application
    Filed: April 12, 2024
    Publication date: October 17, 2024
    Inventors: Keun Soo Kim, Jae Yun Kim, Byoung Jun Ahn, Dong Soo Ryu, Dae Byoung Kang, Chel Woo Park
  • NOVEL BIFUNCTIONAL HETEROCYCLIC COMPOUND HAVING BTK DEGRADATION FUNCTION VIA UBIQUITIN PROTEASOME PATHWAY, AND USE THEREOF
    Publication number: 20240285778
    Abstract: The present invention relates to a novel heterocyclic compound and a composition, for preventing or treating a cancer, an autoimmune disease, and an inflammatory disease, comprising same. The novel heterocyclic compound of the present invention is a bifunctional compound having a Bruton's tyrosine kinase (BTK) degradation function via a ubiquitin proteasome pathway, and may be utilized as a composition for preventing or treating a cancer, an autoimmune disease, and Parkinson's disease.
    Type: Application
    Filed: June 24, 2022
    Publication date: August 29, 2024
    Applicants: KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY, UBIX THERAPEUTICS, INC.
    Inventors: Pil Ho KIM, Sung Yun CHO, Jae Du HA, Chi Hoon PARK, Jong Yeon HWANG, Hyun Jin KIM, Song Hee LEE, Ye Seul LIM, Han Wool KIM, Sun Mi YOO, Beom Seon SUH, Ji Youn PARK, Je Ho RYU, Jung Min AHN, Hee Jung MOON, Ho Hyun LEE
  • PHOTORESIST UNDERLAYER COMPOSITION
    Publication number: 20240201591
    Abstract: A composition comprising a polymer, the polymer comprising: repeating units derived from a monomer of Formula A1, Formula A2, or Formula A3, repeating units derived from a monomer of Formula B1, Formula B2, Formula B3, or Formula B4, and repeating units derived from a monomer of Formula C1 or Formula C2, the structures of each as described herein. A coated substrate including a substrate, a photoresist underlayer formed from composition above, and a photoresist layer on the photoresist underlayer.
    Type: Application
    Filed: November 28, 2022
    Publication date: June 20, 2024
    Inventors: Yoo-Jin GHANG, Jae-Yun AHN, You Rim SHIN, Jung-June LEE, Jae-Hwan SIM
  • Underlying coating compositions for use with photoresists
    Patent number: 11500291
    Abstract: New composition and methods are provided that include antireflective compositions that can exhibit enhanced etch rates in standard plasma etchants. Preferred antireflective coating compositions of the invention have decreased carbon content relative to prior compositions.
    Type: Grant
    Filed: October 31, 2017
    Date of Patent: November 15, 2022
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
    Inventors: Jung-June Lee, Jae-Yun Ahn, You-Rim Shin, Jin-Hong Park, Jae-Hwan Sim
  • Method for forming pattern using antireflective coating composition including photoacid generator
    Patent number: 11269252
    Abstract: An antireflective coating composition, including a polymer, a photoacid generator having a crosslinkable group, a compound capable of crosslinking the polymer and the photoacid generator, a thermal acid generator, and an organic solvent.
    Type: Grant
    Filed: July 22, 2019
    Date of Patent: March 8, 2022
    Assignees: ROHM AND HAAS ELECTRONIC MATERIALS LLC, ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
    Inventors: Jung-June Lee, Jae-Yun Ahn, Jae-Hwan Sim, Jae-Bong Lim, Emad Aqad, Myung-Yeol Kim
  • METHOD FOR FORMING PATTERN USING ANTIREFLECTIVE COATING COMPOSITION INCLUDING PHOTOACID GENERATOR
    Publication number: 20210026242
    Abstract: An antireflective coating composition, including a polymer, a photoacid generator having a crosslinkable group, a compound capable of crosslinking the polymer and the photoacid generator, a thermal acid generator, and an organic solvent.
    Type: Application
    Filed: July 22, 2019
    Publication date: January 28, 2021
    Inventors: Jung-June Lee, Jae-Yun Ahn, Jae-Hwan Sim, Jae-Bong Lim, Emad Aqad, Myung-Yeol Kim
  • Overcoat compositions and methods for photolithography
    Patent number: 10514604
    Abstract: Topcoat compositions are provided that are suitably applied above a photoresist composition. Preferred topcoat compositions comprise a first polymer that comprises (i) first units comprising a nitrogen-containing moiety that comprises an acid-labile group; and (ii) second units that (1) comprise one or more hydrophobic groups and (2) are distinct from the first units.
    Type: Grant
    Filed: April 29, 2016
    Date of Patent: December 24, 2019
    Assignee: Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Chang-Young Hong, Eui-Hyun Ryu, Min-Kyung Jang, Dong-Yong Kim, Jae Yun Ahn
  • UNDERLYING COATING COMPOSITIONS FOR USE WITH PHOTORESISTS
    Publication number: 20190129305
    Abstract: New composition and methods are provided that include antireflective compositions that can exhibit enhanced etch rates in standard plasma etchants. Preferred antireflective coating compositions of the invention have decreased carbon content relative to prior compositions.
    Type: Application
    Filed: October 31, 2017
    Publication date: May 2, 2019
    Inventors: Jung-June Lee, Jae-Yun Ahn, You-Rim Shin, Jin-Hong Park, Jae-Hwan Sim
  • Photobase generators and photoresist compositions comprising same
    Patent number: 10274824
    Abstract: New photobase generators suitable for use in photoresists are provided that correspond to Formula (I): X1—R1—O—C(?O)N(R2)R3??(I) wherein X1 is an optionally substituted aromatic group; R1 is a linker; and R2 and R3 are the same or different optionally substituted linear, branched or cyclic aliphatic group or an optionally substituted aromatic group, wherein at least one of R2 and R3 is an optionally substituted branched alkyl group having 4 or more carbon atoms.
    Type: Grant
    Filed: May 12, 2016
    Date of Patent: April 30, 2019
    Assignee: Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Min-Kyung Jang, Eui Hyun Ryu, Chang-Young Hong, Myung Yeol Kim, Jung-June Lee, Dong Je Hong, Dong-Yong Kim, Hae-Jin Lim, Jae Yun Ahn, Ohk-Min Jeon
  • COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
    Publication number: 20180364576
    Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise 1) one or more resins and 2) one or more PDQ compounds that are distinct from the 1) one or more resins.
    Type: Application
    Filed: June 19, 2017
    Publication date: December 20, 2018
    Inventors: Jung-June Lee, Jae Yun Ahn, Bon-Ki Ku, Jae Hwan Sim, Jae-Bong Lim
  • PHOTOBASE GENERATORS AND PHOTORESIST COMPOSITIONS COMPRISING SAME
    Publication number: 20160334703
    Abstract: New photobase generators suitable for use in photoresists are provided that correspond to Formula (I): X1—R1—O—C(?O)N(R2)R3??(I) wherein X1 is an optionally substituted aromatic group; R1 is a linker; and R2 and R3 are the same or different optionally substituted linear, branched or cyclic aliphatic group or an optionally substituted aromatic group, wherein at least one of R2 and R3 is an optionally substituted branched alkyl group having 4 or more carbon atoms.
    Type: Application
    Filed: May 12, 2016
    Publication date: November 17, 2016
    Inventors: Min-Kyung Jang, Eui-Hyun Ryu, Chang-Young Hong, Myung Yeol Kim, Jung-June Lee, Dong-Je Hong, Dong-Yong Kim, Hae-Jin Lim, Jae Yun Ahn, Ohk-Min Jeon
  • OVERCOAT COMPOSITIONS AND METHODS FOR PHOTOLITHOGRAPHY
    Publication number: 20160320703
    Abstract: Topcoat compositions are provided that are suitably applied above a photoresist composition. Preferred topcoat compositions comprise a first polymer that comprises (i) first units comprising a nitrogen-containing moiety that comprises an acid-labile group; and (ii) second units that (1) comprise one or more hydrophobic groups and (2) are distinct from the first units.
    Type: Application
    Filed: April 29, 2016
    Publication date: November 3, 2016
    Inventors: Chang-Young Hong, Eui-Hyun Ryu, Min-Kyung Jang, Dong-Yong Kim, Jae Yun Ahn