Patents by Inventor Jaehee CHANG

Jaehee CHANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20260197928
    Abstract: A gas reforming apparatus includes a plasma reactor for converting processing target gas into reformed gas. The plasma reactor includes a ground electrode forming an inner wall of a reaction space and a high-voltage electrode facing the ground electrode inside the reaction space and generating arc discharging. The high-voltage electrode has a cone shape including an enlargement portion, a reduction portion, and a boundary portion between the enlargement portion and the reduction portion. The reaction space includes a gas supply region between the enlargement portion and the inner wall, a discharging region between the reduction portion and the inner wall where the discharging occurs, and a connection region between the boundary portion and the inner wall and connecting the gas supply region to the discharging region. The processing target gas, plasma driving gas, and auxiliary gas are supplied to the gas supply region through at least one gas inlet.
    Type: Application
    Filed: June 10, 2025
    Publication date: July 9, 2026
    Inventors: Jinwoo Kim, Dongwook Kim, Jaehee Chang
  • Publication number: 20260017440
    Abstract: An apparatus for estimating a location of a contamination source in a designated space includes a processor, and a memory operatively connected to the processor and storing instructions that, when executed by the processor, cause the apparatus to measure a concentration of a contaminant diffusing from the contamination source within the designated space by using at least one sensor and estimate the location of the contamination source based on the measured concentration, where the instructions cause the processor to estimate the location of the contamination source by using a neural network trained to output the location of the contamination source when the measured concentration is input.
    Type: Application
    Filed: July 9, 2025
    Publication date: January 15, 2026
    Inventors: Jaehee Chang, Haecheon Choi, Sehyeong Oh, Changbeom Kim, Hyun Chul Lee, Joonseon Jeong
  • Publication number: 20250223157
    Abstract: An arc plasma reactor includes a cylindrical surface, a gas inlet, an arc generation part, a catalyst filling part, and a gas outlet. The gas inlet is formed on the cylindrical surface and injects gas at an angle of 30 degrees (°) to 90° with respect to a long axis of the arc plasma reactor. The arc generation part includes a high voltage electrode disposed inside the arc plasma reactor and a ground electrode disposed on an inner wall of the arc plasma reactor. The catalyst filling part is disposed in an area outside the arc generating part, on an opposite side of the gas inlet, and an inside diameter of the arc plasma reactor in an area where the high voltage electrode is disposed is less than an inside diameter of the arc plasma reactor in an area where the catalyst filling part is disposed.
    Type: Application
    Filed: January 2, 2025
    Publication date: July 10, 2025
    Inventors: Jinwoo KIM, Hyukjae KWON, Dongwook KIM, Jongmin LEE, Junkyu KIM, Jaehee CHANG, Sungwoo KANG, Hyunah KIM
  • Publication number: 20250223159
    Abstract: A method for reforming carbon dioxide and methane by using a catalyzed plasma reactor, the method includes providing a dielectric barrier discharge plasma reactor including a catalyst bed in a plasma discharge zone, injecting a reaction gas into the plasma reactor, generating plasma within the plasma discharge zone of the plasma reactor, generating a reformed gas by interaction between the plasma and the catalyst bed, and separating the reformed gas. The reaction gas includes methane, carbon dioxide, oxygen, and inert gas, the reformed gas includes carbon monoxide and hydrogen, and the oxygen is about 2 volume percent to about 15 volume percent of a total volume of the reaction gas.
    Type: Application
    Filed: December 27, 2024
    Publication date: July 10, 2025
    Inventors: Jongmin Lee, Junkyu Kim, Jinwoo Kim, Sungwoo Kang, Dongwook Kim, Hyunah Kim, Jaehee Chang, Hyukjae Kwon, Youhwan Son
  • Publication number: 20240216858
    Abstract: An air purifier includes an air inlet through which contaminated air is introduced, a plasma reaction unit connected in fluid communication with the air inlet and including a predetermined discharge region generating discharge plasma, and a dust collector that is connected in fluid communication with the plasma reaction unit and collects and removes contaminants from first purified air discharged from the plasma reaction unit.
    Type: Application
    Filed: June 21, 2023
    Publication date: July 4, 2024
    Inventors: Jaiyoung CHUNG, Dongwook KIM, Joonseon JEONG, Jinkyu KANG, Dongjin LEE, Jaehee CHANG