Abstract: Disclosed is a method for manufacturing a circuit board, including preparing a substrate having a resin layer and a stop layer, forming at least one conduction hole penetrating the resin layer and stopping at the stop layer, forming a first metal layer through a sputtering process, forming a second metal layer on the first metal layer through a chemical plating process, forming a third metal layer having a circuit pattern, exposing part of the second metal layer and filling up the conduction hole through an electroplating process, and etching the second metal layer and the first metal layer under the second metal layer to expose the resin layer under the first metal layer. Since the first metal layer provides excellent surface properties, the second and third metal layers are well fixed and stable. The etched circuit pattern has a line width/pitch less than 10 ?m for fine line width/pitch.

Abstract: Disclosed is a method for manufacturing a circuit board, including preparing a substrate having a resin layer and a stop layer, forming at least one conduction hole penetrating the resin layer and stopping at the stop layer, forming a first metal layer through a sputtering process, forming a second metal layer on the first metal layer through a chemical plating process, forming a third metal layer having a circuit pattern, exposing part of the second metal layer and filling up the conduction hole through an electroplating process, and etching the second metal layer and the first metal layer under the second metal layer to expose the resin layer under the first metal layer. Since the first metal layer provides excellent surface properties, the second and third metal layers are well fixed and stable. The etched circuit pattern has a line width/pitch less than 10 ?m for fine line width/pitch.

Abstract: Disclosed is a circuit board structure, including the first, second and third metal layers sequentially stacked on the substrate from bottom to top and formed by the sputtering process, the chemical plating process and the electroplating process, respectively. The substrate includes the stop layer and the resin layer stacked on the stop layer. The stop layer includes a pattern having at least one contact region, which is not covered by the resin layer. The first, second and third metal layers have an etched circuit pattern, respectively, and each of the etched circuit patterns is provided out of the corresponding contact region and aligned to each other to expose part of the resin layer. The etched circuit pattern is used for electrical connection. Since the first metal layer provides excellent surface properties, the second and third metal layers are well fixed and more stable.

Abstract: A method for manufacturing a circuit board with a buried element having high density pin count, wherein a micro copper window formed in a first circuit by patterned dry film electroplating is easily controlled less than 50 ?m so that the micro conduction holes formed after the laser drilling each has a diameter greatly shrunk less than 50 ?m so as to highly increase density of the micro conduction holes, thereby facilitating in burial of the buried element with the high density pin count. Additionally, by disposing the micro conduction holes in the same elevation, optically aligning a fixing position for the buried element can be controlled precisely.

Abstract: A method for manufacturing a circuit board with a buried element having high density pin count, wherein a micro copper window formed in a first circuit by patterned dry film electroplating is easily controlled less than 50 ?m so that the micro conduction holes formed after the laser drilling each has a diameter greatly shrunk less than 50 ?m so as to highly increase density of the micro conduction holes, thereby facilitating in burial of the buried element with the high density pin count. Additionally, by disposing the micro conduction holes in the same elevation, optically aligning a fixing position for the buried element can be controlled precisely.

Abstract: A method for manufacturing microthrough-hole includes electroplating a metal layer on a carrier plate, patterning the metal layer to form a first circuit having copper pads, covering the first circuit with a photoresist layer and not covering the copper window between two of the copper pads, etching the metal layer beneath the copper window and removing the photoresist layer, sequentially forming an insulation layer and a second circuit on the first circuit and the copper window, the second circuit layer having a stop pad corresponding to the copper window, removing the carrier plate, upward drilling through the insulation layer between the stop pad and the copper window to form a microthrough-hole beneath the stop pad, and forming a conductive layer in the microthrough-hole to form the microthrough-hole connecting the first and second circuits. The microthrough-hole and its occupied area is greatly reduced, thereby achieving high circuit density.

Abstract: The present invention discloses a flip-chip package assembly. The flip-chip package assembly includes a flipped IC chip having a plurality of input/output terminals mounted onto a substrate wherein the substrate includes a plurality of conductive columns disposed on top the substrate with each of the conductive columns disposed at a location corresponding to a location of one of the input/output terminals on the IC chip. The substrate further includes a layer of low-modulus polymer layer disposed on top of the substrate surrounding and bonding to the conductive columns to flexibly yield to bending of the conductive columns.