Patents by Inventor Jagannadha R. Bontha

Jagannadha R. Bontha has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11896947
    Abstract: A MOF production system and method of making are detailed for continuous and controlled synthesis of MOFs and MOF composites. The system can provide optimized yields of MOFs and MOF composites greater than or equal to 95%.
    Type: Grant
    Filed: June 30, 2020
    Date of Patent: February 13, 2024
    Assignee: Battelle Memorial Institute
    Inventors: Radha Kishan Motkuri, Jagannadha R. Bontha, B. Peter McGrail
  • Publication number: 20200391174
    Abstract: A MOF production system and method of making are detailed for continuous and controlled synthesis of MOFs and MOF composites. The system can provide optimized yields of MOFs and MOF composites greater than or equal to 95%.
    Type: Application
    Filed: June 30, 2020
    Publication date: December 17, 2020
    Applicant: Battelle Memorial Institute
    Inventors: Radha Kishan Motkuri, Jagannadha R. Bontha, B. Peter McGrail
  • Patent number: 10695741
    Abstract: A MOF production system and method of making are detailed for continuous and controlled synthesis of MOFs and MOF composites. The system can provide optimized yields of MOFs and MOF composites greater than or equal to 95%.
    Type: Grant
    Filed: June 17, 2016
    Date of Patent: June 30, 2020
    Assignee: Battelle Memorial Institute
    Inventors: Radha Kishan Motkuri, Jagannadha R. Bontha, B. Peter McGrail
  • Publication number: 20170361300
    Abstract: A MOF production system and method of making are detailed for continuous and controlled synthesis of MOFs and MOF composites. The system can provide optimized yields of MOFs and MOF composites greater than or equal to 95%.
    Type: Application
    Filed: June 17, 2016
    Publication date: December 21, 2017
    Applicant: BATTELLE MEMORIAL INSTITUTE
    Inventors: Radha Kishan Motkuri, Jagannadha R. Bontha, B. Peter McGrail
  • Patent number: 5922299
    Abstract: This invention pertains to surfactant-templated nanometer-scale porosity of a silica precursor solution and forming a mesoporous material by first forming the silica precursor solution into a preform having a high surface area to volume ratio, then rapid drying or evaporating a solvent from the silica precursor solution. The mesoporous material may be in any geometric form, but is preferably in the form of a film, fiber, powder or combinations thereof. The rapid drying or evaporation of solvent from the solution is accomplished by layer thinning, for example spin casting, liquid drawing, and liquid spraying respectively. Production of a film is by layer thinning, wherein a layer of the silica precursor solution is formed on a surface followed by removal of an amount of the silica precursor solution and leaving a geometrically thinner layer of the silica precursor solution from which the solvent quickly escapes via evaporation.
    Type: Grant
    Filed: August 26, 1997
    Date of Patent: July 13, 1999
    Assignee: Battelle Memorial Institute
    Inventors: Paul J. Bruinsma, Suresh Baskaran, Jagannadha R. Bontha, Jun Liu
  • Patent number: RE40299
    Abstract: This invention pertains to surfactant-templated nanometer-scale porosity of a silica precursor solution and forming a mesoporous material by first forming the silica precursor solution into a preform having a high surface area to volume ratio, then rapid drying or evaporating a solvent from the silica precursor solution. The mesoporous material may be in any geometric form, but is preferably in the form of a film, fiber, powder or combinations thereof. The rapid drying or evaporation of solvent from the solution is accomplished by layer thinning, for example spin casting, liquid drawing, and liquid spraying respectively. Production of a film is by layer thinning, wherein a layer of the silica precursor solution is formed on a surface followed by removal of an amount of the silica precursor solution and leaving a geometrically thinner layer of the silica precursor solution from which the solvent quickly escapes via evaporation.
    Type: Grant
    Filed: January 11, 2000
    Date of Patent: May 6, 2008
    Assignee: Battelle Memorial Institute
    Inventors: Paul J. Bruinsma, Suresh Baskaran, Jagannadha R. Bontha, Jun Liu