Abstract: A gas delivery system for providing a gas to manufacturing equipment includes a gas supply unit for providing the gas to the manufacturing equipment including devices to regulate the supply of gas from the gas supply unit to the manufacturing equipment. The system includes a main control unit for regulating the supply of the gas to the manufacturing equipment. The gas delivery system includes a supplemental control unit which receives an emergency shutdown signal from the main control unit for closing off the supply of gas in response to a malfunction of the main control unit and generates a signal for maintaining a gas flow to operate the manufacturing equipment until the cause of the malfunction has been determined. With the system, an unnecessary emergency shutdown of gas supply to semiconductor manufacturing equipment in response to a malfunction of a main controller can be prevented.

Abstract: A gas delivery system for providing a gas to manufacturing equipment includes a gas supply unit for providing the gas to the manufacturing equipment including devices to regulate the supply of gas from the gas supply unit to the manufacturing equipment. The system includes a main control unit for regulating the supply of the gas to the manufacturing equipment. The gas delivery system includes a supplemental control unit which receives an emergency shutdown signal from the main control unit for closing off the supply of gas in response to a malfunction of the main control unit and generates a signal for maintaining a gas flow to operate the manufacturing equipment until the cause of the malfunction has been determined. With the system, an unnecessary emergency shutdown of gas supply to semiconductor manufacturing equipment in response to a malfunction of a main controller can be prevented.

Abstract: A dry cleaner easily and rapidly eliminates particles and dirt adhered to interior surfaces of the wafer carrier. The dry cleaner has a housing with a table mounted thereon, and an assembly for cleaning the wafer carriers disposed on the table. The cleaning assembly sprays a cleaning gas simultaneously into the carrier box and the cover of the wafer carrier. Dirt and particles separated from the carrier box and the cover are collected, by vacuum pressure through openings in the table, into a dirt-collector disposed in the housing, and then discharged through an exhaust tube. A controller controls a quantity of cleaning gas supplied and a time of cleaning by the cleaning assembly.