Patents by Inventor Jain-Fa Lin

Jain-Fa Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Pressure differential measuring tool
    Patent number: 6820491
    Abstract: A pressure differential measuring tool which includes a wafer container having a pressure difference meter provided in fluid communication therewith. In use, the wafer container is placed in the indexer of the process tool, which is operated according to normal operational parameters. The pressure difference meter measures the difference in pressure between the air in the indexer, which equalizes with pressure in the wafer container, and the ambient or atmospheric air surrounding the chamber, which equalizes with the pressure of the air in the process chamber. The air pressure in the indexer can then be adjusted to a value higher than the ambient or atmospheric air pressure to prevent influx of air and particles from the process chamber into the indexer and wafer container.
    Type: Grant
    Filed: October 5, 2002
    Date of Patent: November 23, 2004
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Jain-Fa Lin, Shih-Chang Shih
  • Pressure differential measuring tool
    Publication number: 20040065153
    Abstract: A pressure differential measuring tool which includes a wafer container having a pressure difference meter provided in fluid communication therewith. In use, the wafer container is placed in the indexer of the process tool, which is operated according to normal operational parameters. The pressure difference meter measures the difference in pressure between the air in the indexer, which equalizes with pressure in the wafer container, and the ambient or atmospheric air surrounding the chamber, which equalizes with the pressure of the air in the process chamber. The air pressure in the indexer can then be adjusted to a value higher than the ambient or atmospheric air pressure to prevent influx of air and particles from the process chamber into the indexer and wafer container.
    Type: Application
    Filed: October 5, 2002
    Publication date: April 8, 2004
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Jain-Fa Lin, Shih-Chang Shih