Patents by Inventor Jaishankar Kasthuri

Jaishankar Kasthuri has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • CMP porous pad with particles in a polymeric matrix
    Patent number: 9951054
    Abstract: The invention provides a chemical-mechanical polishing pad comprising a polymeric matrix and 0.1-15 wt. % of metal oxide particles. The polymeric matrix has pores, the metal oxide particles are uniformly distributed throughout the pores, and the metal oxide particles have a specific surface area of about 25 m2/g to about 450 m2/g. The invention further provides a method of polishing a substrate with the polishing pad.
    Type: Grant
    Filed: April 15, 2010
    Date of Patent: April 24, 2018
    Assignee: Cabot Microelectronics Corporation
    Inventors: Shoutian Li, Robert Vacassy, Jaishankar Kasthuri
  • CMP POROUS PAD WITH PARTICLES IN A POLYMERIC MATRIX
    Publication number: 20100273399
    Abstract: The invention provides a chemical-mechanical polishing pad comprising a polymeric matrix and 0.1-15 wt. % of metal oxide particles. The polymeric matrix has pores, the metal oxide particles are uniformly distributed throughout the pores, and the metal oxide particles have a specific surface area of about 25 m2/g to about 450 m2/g. The invention further provides a method of polishing a substrate with the polishing pad.
    Type: Application
    Filed: April 15, 2010
    Publication date: October 28, 2010
    Inventors: Shoutian Li, Robert Vacassy, Jaishankar Kasthuri