Patents by Inventor Jakob A. Van der Berg

Jakob A. Van der Berg has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5384465
    Abstract: An ion implanter for implanting ions into a semiconductor wafer comprises means for generating an ion beam, means for receiving charged particles ejected from the ion beam, first means for rejecting those of the received charged particles below a first predetermined energy, second means for rejecting those of the received charged particles above a second predetermined energy, the first predetermined energy being lower than the second predetermined energy. The ion implanter further comprises means to count the number of received charged particles between the first and second predetermined energies, and scanning means for scanning the first and second predetermined energies to determine the energy at which the number of received charged particles between the first and second predetermined energies is a maximum.
    Type: Grant
    Filed: September 17, 1993
    Date of Patent: January 24, 1995
    Assignee: Applied Materials, Inc.
    Inventors: David G. Armour, Johnathan G. England, Neil Bryan, Jakob A. Van der Berg