Patents by Inventor Jakob Willi
Jakob Willi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8519368Abstract: The present invention relates to a method and device for generating optical radiation, in particular EUV radiation or soft x-rays, by means of an electrically operated discharge. A plasma (15) is ignited in a gaseous medium between at least two electrodes (1, 2), wherein said gaseous medium is produced at least partly from a liquid material (6) which is applied to a surface moving in the discharge space and is at least partially evaporated by one or several pulsed energy beams. In the proposed method and device the pulses (9) of said pulsed energy beams are directed to at least two different lateral locations with respect to a moving direction of said surface. With this measure, the radiation emission volume is expanded, less sensitive to spatial fluctuations and can be adapted better to the requirements of optical systems of any applications. Furthermore, the optical output power can be increased by this measure.Type: GrantFiled: July 21, 2009Date of Patent: August 27, 2013Assignee: Koninklijke Philips N.V.Inventors: Jakob Willi Neff, Dominik Marcel Vaudrevange, Peter Zink
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Patent number: 8227779Abstract: The present invention relates to a gas discharge source, for generating EUV radiation and/or soft X-radiation, comprising at least two electrode bodies (110,120), of which a first electrode body (110) comprises a rotatably mounted electrode disk (100). The source further comprises a rotary drive (130) for the electrode disk, a device for applying a liquid film of a target material (140) onto a radial outer surface of the electrode disk (100), and a laser that is focussed, within a discharge area (240), onto the radial outer surface of the electrode disk (100) to evaporate target material. The source is characterized by an intermediate space (160) is formed between the electrode bodies, which intermediate space has a reduced width of <5 mm outside the discharge area (240), which is smaller than the intermediate space in the discharge area. The source enables the generated radiation to be emitted in a simple manner through a larger solid angle, without being shadowed by the electrodes.Type: GrantFiled: December 16, 2008Date of Patent: July 24, 2012Assignee: Koninklijke Philips Electronics N.V.Inventor: Jakob Willi Neff
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Patent number: 8227777Abstract: The present invention relates to a method of operating an electrical discharge device (12) comprising at least one first electrode (14) and at least one second electrode (16) at a distance therefrom, which electrodes are electrically connected to a power supply (18) and, upon ignition of a first gas discharge (22) between the electrodes (14, 16), transmit an electrical current (I), as a result of which a plasma (24) is produced in a working gas (26), which plasma emits radiation (28), in particular extreme ultraviolet and/or soft X-ray radiation, which is passed via a solid angle (30) into a chamber (32) outside the electrodes (14, 16). In order to prevent erosion at the electrodes (14, 16), it is proposed that the formation of a secondary plasma (34) in the chamber (32) is suppressed by a device (42).Type: GrantFiled: November 29, 2005Date of Patent: July 24, 2012Assignee: Koninklijke Philips Electronics N.V.Inventors: Michael Loeken, Jakob Willi Neff, Juergen Klein, Sven Probst
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Publication number: 20110248192Abstract: The present invention relates to a method and device for generating optical radiation, in particular EUV radiation or soft x-rays, by means of an electrically operated discharge. A plasma (15) is ignited in a gaseous medium between at least two electrodes (1, 2), wherein said gaseous medium is produced at least partly from a liquid material (6) which is applied to one or several surface(s) moving in the discharge space and is at least partially evaporated by one or several pulsed energy beams. In the proposed method and device at least two consecutive pulses (9, 18) are applied within a time interval of each electrical discharge onto said surface(s). With this measure, the collectable conversion efficiency is increased compared to the use of only one single energy pulse within each electrical discharge.Type: ApplicationFiled: December 9, 2009Publication date: October 13, 2011Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.Inventors: Jeroen Jonkers, Felix Alexander Krepper, Harald Ernest Verbraak, Jakob Willi Neff
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Publication number: 20110127442Abstract: The present invention relates to a method and device for generating optical radiation, in particular EUV radiation or soft x-rays, by means of an electrically operated discharge. A plasma (15) is ignited in a gaseous medium between at least two electrodes (1, 2), wherein said gaseous medium is produced at least partly from a liquid material (6) which is applied to a surface moving in the discharge space and is at least partially evaporated by one or several pulsed energy beams. In the proposed method and device the pulses (9) of said pulsed energy beams are directed to at least two different lateral locations with respect to a moving direction of said surface. With this measure, the radiation emission volume is expanded, less sensitive to spatial fluctuations and can be adapted better to the requirements of optical systems of any applications. Furthermore, the optical output power can be increased by this measure.Type: ApplicationFiled: July 21, 2009Publication date: June 2, 2011Applicant: Koninklijke Philips Electronics N.V.Inventors: Jakob Willi Neff, Dominik Marcel Vaudrevange, Peter Zink
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Patent number: 7897948Abstract: The present invention relates to a plasma discharge lamp for generating EUV radiation and/or soft X-rays by means of an electrically operated discharge. The proposed lamp comprises at least two electrodes arranged in a discharge space at a distance from one another to form a gap which allows the ignition of a plasma (14) in a gaseous medium between said electrodes. A metal applying device applies a metal to a surface of said electrodes. The electrodes are formed of conveyer belts (15) driven to transport the metal to said gap, wherein for each of the electrodes a shaper element (13) is provided at the gap to ensure a proper form and distance of the electrodes at the gap. An energy beam device (4) is adapted to direct an energy beam onto at least one of said surfaces in the gap evaporating said applied metal at least partially thereby producing said gaseous medium. With the proposed plasma discharge lamp high input powers can be achieved at a compact design of the lamp.Type: GrantFiled: August 29, 2007Date of Patent: March 1, 2011Assignee: Koninklijke Philips Electronics N.V.Inventors: Jeroen Jonkers, Jakob Willi Neff, Ralf Pruemmer
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Publication number: 20100264336Abstract: The present invention relates to a gas discharge source, for generating EUV radiation and/or soft X-radiation, comprising at least two electrode bodies (110,120), of which a first electrode body (110) comprises a rotatably mounted electrode disk (100). The source further comprises a rotary drive (130) for the electrode disk, a device for applying a liquid film of a target material (140) onto a radial outer surface of the electrode disk (100), and a laser that is focussed, within a discharge area (240), onto the radial outer surface of the electrode disk (100) to evaporate target material. The source is characterized by an intermediate space (160) is formed between the electrode bodies, which intermediate space has a reduced width of <5 mm outside the discharge area (240), which is smaller than the intermediate space in the discharge area. The source enables the generated radiation to be emitted in a simple manner through a larger solid angle, without being shadowed by the electrodes.Type: ApplicationFiled: December 16, 2008Publication date: October 21, 2010Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.Inventor: Jakob Willi Neff
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Publication number: 20100194313Abstract: The present invention relates to a high voltage electrical connection line (11), in particular for electrically connecting a gas discharge source (10) to a high voltage power source (9). The connection line is formed of a stack of two electrically conductive plates (2) separated by an electrically isolating layer (1). An electrically conductive layer (8) of a material having a higher electrical resistivity than the material of the conductive plates (2) is arranged between said isolating layer (1) and said conductive plates (2). The proposed connection line provides a higher life time when used for connecting a high voltage power source and a pulsed discharge lamp.Type: ApplicationFiled: September 25, 2008Publication date: August 5, 2010Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.Inventors: Dominik Marcel Vaudrevange, Jakob Willi Neff, Christof Metzmacher
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Patent number: 7630475Abstract: A gas discharge source for EUV radiation and/or soft X-ray radiation is arranged in a vacuum chamber and includes at least two electrodes, each with a circular periphery and rotatably mounted for rotation. At one spatial position, the electrodes have a small spacing for the ignition of a gas discharge and are each connected to a reservoir for a liquid, electrically conductive material. During rotation, a liquid film of the electrically conductive material forms over the circular periphery of the electrodes and a flow of current to the electrodes is made possible. The electrodes connect to the reservoirs via a respective connecting element, wherein a gap is formed between electrode and connecting element over a partial section of the circular periphery of each electrode. The liquid material can penetrate from the reservoir and into the gap during rotation of the electrode via a feed channel formed in the connecting element.Type: GrantFiled: May 8, 2006Date of Patent: December 8, 2009Assignee: Koninklijke Philips Electronics N.V.Inventors: Jakob Willi Neff, Ralf Pruemmer
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Publication number: 20090173896Abstract: The present invention relates to a method of operating an electrical discharge device (12) comprising at least one first electrode (14) and at least one second electrode (16) at a distance therefrom, which electrodes are electrically connected to a power supply (18) and, upon ignition of a first gas discharge (22) between the electrodes (14, 16), transmit an electrical current (1), as a result of which a plasma (24) is produced in a working gas (26), which plasma emits radiation (28), in particular extreme ultraviolet and/or soft X-ray radiation, which is passed via a solid angle (30) into a chamber (32) outside the electrodes (14, 16). In order to prevent erosion at the electrodes (14, 16), it is proposed that the formation of a secondary plasma (34) in the chamber (32) is suppressed by a device (42).Type: ApplicationFiled: November 29, 2005Publication date: July 9, 2009Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.Inventors: Michael Loeken, Jakob Willi Neff, Juergen Klen, Sven Probst
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Publication number: 20080187105Abstract: The present invention relates to a gas discharge source, in particular for EUV radiation and/or soft X-ray radiation, in which, in a vacuum chamber, at least two electrodes with an at least approximately circular periphery are rotatably mounted for rotation, wherein the electrodes at one spatial position have a small spacing for the ignition of a gas discharge and are in each case connected to a reservoir for a liquid, electrically conductive material in such a way that, during rotation, a liquid film of the electrically conductive material can form over the circular periphery of the electrodes and a flow of current to the electrodes is made possible via the reservoirs.Type: ApplicationFiled: May 8, 2006Publication date: August 7, 2008Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.Inventors: Jakob Willi Neff, Ralf Pruemmer
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Patent number: 5951496Abstract: The guide wire serves in particular for the percutaneous introduction of a balloon dilation catheter into a blood vessel and has a flexible coil which surrounds a likewise flexible shaft and is produced from at least two coil springs, which are rotated together at a connection location over a plurality of turns and are soldered to one another. For the purpose of connection, at the end to be connected, the two coil springs are each slid onto a centering mold, rotated together and soldered. The centering mold is then removed. The connection location is tubular and internally hollow, so that the flexible shaft can be inserted subsequently.Type: GrantFiled: April 15, 1997Date of Patent: September 14, 1999Assignee: Schneider (Europe) GmbhInventor: Jakob Willi
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Patent number: 5843092Abstract: The balloon catheter comprises a shaft with an elongated dilatation balloon mounted in the vicinity of the distal end thereof. Member for preventing expansion of balloon segments are mounted on shaft proximally of the balloon and comprise an armature enclosed in a sleeve moveable over a proximal portion of the balloon.Type: GrantFiled: May 7, 1997Date of Patent: December 1, 1998Assignee: Schneider (Europe) A.G.Inventors: Mathias Heller, Alfonso Medina Fernandez-Aceytuno, Rainer Amann, Roland Hirt, Jakob Willi
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Patent number: 5628755Abstract: The balloon catheter comprises a shaft with an elongated dilatation balloon mounted in the vicinity of the distal end thereof. Armature for preventing expansion of balloon segments are mounted on shaft proximally of the balloon and include an armature enclosed in a sleeve moveable over a proximal portion of the balloon.Type: GrantFiled: October 24, 1995Date of Patent: May 13, 1997Assignee: Schneider (Europe) A.G.Inventors: Mathias Heller, Alfonso M. Fernandez-Aceytuno, Rainer Amann, Roland Hirt, Jakob Willi